Semiconductor device and manufacturing method of the same
Disclosed herein is a semiconductor device including: a substrate having a first conductive layer and a second conductive layer arranged deeper than the first conductive layer; a large-diameter concave portion having, on a main side of a substrate, an opening sized to overlap the first and second conductive layers, with the first conductive layer exposed in part of the bottom of the large-diameter concave portion; a small-diameter concave portion extended from the large-diameter concave portion and formed by digging into the bottom of the large-diameter concave portion, with the second conductive layer exposed at the bottom of the small-diameter concave portion; and a conductive member provided in a connection hole made up of the large- and small-diameter concave portions to connect the first and second conductive layers.
1. A manufacturing method of a semiconductor device comprising:
forming a first conductive layer and a second conductive layer that is below the first conductive layer;
forming a large-diameter concave portion configured to expose solely the top surface of the first conductive layer; and
forming a small-diameter concave portion configured to pass through the bottom of the large-diameter concave portion and expose solely the top surface of the second conductive layer.
2. The manufacturing method of the semiconductor device of claim 1 , further comprising:
forming the large-diameter concave portion, wherein solely the top surface of the first conductive layer is exposed at the bottom the large-diameter concave portion, and
forming the small-diameter concave portion, wherein solely the top surface of the second conductive layer is exposed at the bottom of the small-diameter concave portion.
3. The manufacturing method of the semiconductor device of claim 2 , further comprising:
forming a large-diameter resist pattern having an opening that exposes solely the tops of the first and second conductive layers, wherein the large-diameter concave portion is formed using the large-diameter resist pattern as a mask.
4. The manufacturing method of the semiconductor device of claim 3 , further comprising:
forming a small-diameter resist pattern having an opening that exposes solely the top of the second conductive layer within the area where the large diameter concave portion is formed, wherein the small-diameter concave portion is formed using the small-diameter resist pattern as a mask.
5. The manufacturing method of the semiconductor device of claim 4 , wherein
after the formation of the large-diameter concave portion, the small-diameter resist pattern is formed in such a manner as to cover the first conductive layer, and
the small-diameter concave portion is formed by etching using the small-diameter resist pattern as a mask.
6. The manufacturing method of the semiconductor device of claim 4 , wherein
the large-diameter resist pattern is formed above the substrate with a hard mask layer sandwiched therebetween,
before the formation of the large-diameter concave portion, a hard mask is formed by patterning the hard mask layer through etching using the large-diameter resist pattern as a mask, and
next, the small-diameter concave portion is formed by etching the substrate using the small-diameter resist pattern as a mask to a depth not exposing the second conductive layer, followed by removal of the small diameter resist pattern and etching from above the hard mask so as to expose the second conductive layer, and at the same time, the large-diameter concave portion is formed with the first conductive layer exposed therein.
7. The manufacturing method of the semiconductor device of claim 4 , wherein
an unetched thickness of the small-diameter concave portion on top of the second conductive layer agrees with an unetched thickness of the large-diameter concave portion on top of the first conductive layer during etching of the substrate using the small-diameter resist pattern as a mask.
8. The manufacturing method of the semiconductor device of claim 4 , wherein
after the formation of the hard mask by patterning the hard mask layer through etching using the large diameter resist pattern as a mask, the substrate is etched to a depth not exposing the first conductive layer.
9. The manufacturing method of the semiconductor device of claim 4 , wherein
the substrate includes an interlayer insulating film and semiconductor layer on the first conductive layer, and
after the formation of the hard mask by patterning the hard mask layer through etching using the large diameter resist pattern as a mask, the semiconductor layer is etched using the interlayer insulating film as an etching stopper.
10. The manufacturing method of the semiconductor device of claim 4 , wherein
the large-diameter resist pattern is formed above the substrate with a hard mask layer sandwiched therebetween,
before the formation of the large-diameter concave portion, a hard mask is formed by patterning the hard mask layer through etching using the large-diameter resist pattern as a mask, followed further by the etching of the substrate to a depth not exposing the first conductive layer,
the large-diameter resist pattern is removed, and a filling member is filled into the concave portion of the substrate for planarization followed by the formation of the small-diameter resist pattern, and
the small-diameter concave portion is formed by etching the substrate using the small-diameter resist pattern as a mask to a depth not exposing the second conductive layer, followed by removal of the small-diameter resist pattern and etching from above the hard mask so as to expose the second conductive layer at the bottom of the small-diameter concave portion, and at the same time, the large-diameter concave portion is formed with the first conductive layer exposed therein.
11. The manufacturing method of the semiconductor device of claim 4 , wherein
before the formation of the large-diameter resist pattern, the small-diameter concave portion is formed by etching using the small-diameter resist pattern as a mask, and
a resist material is left unremoved in the small-diameter concave portion in such a manner as to cover the second conductive layer during the formation of the large-diameter resist pattern.
12. The manufacturing method of the semiconductor device of claim 4 , wherein
before the formation of the large-diameter resist pattern, the substrate is etched using the small-diameter resist pattern as a mask to a depth not exposing the second conductive layer, and
then, the large-diameter concave portion is formed by etching using the large-diameter resist pattern as a mask with the first conductive layer exposed therein, and at the same time, the small-diameter concave portion is formed with the second conductive layer exposed therein.
13. The manufacturing method of the semiconductor device of claim 12 , wherein
the unetched thickness of the small-diameter concave portion on top of the second conductive layer agrees with the unetched thickness of the large-diameter concave portion on top of the first conductive layer during etching of the substrate using the small-diameter resist pattern as a mask.
14. The manufacturing method of the semiconductor device of claim 12 , wherein
the substrate includes the interlayer insulating film and semiconductor layer on the first conductive layer, and
the semiconductor layer is etched using the interlayer insulating film as an etching stopper during etching of the substrate using the small-diameter resist pattern as a mask.
15. The manufacturing method of the semiconductor device of claim 4 , wherein after the formation of the large- and small-diameter concave portions, the conductive member connected to solely the top surface of the first and second conductive layers is formed in a connection hole made up of the large- and small-diameter concave portions.