Programmable Radio Frequency Waveform Generator for a Synchocyclotron
A synchrocyclotron includes a resonant circuit that includes electrodes having a gap there between across the magnetic field. An oscillating voltage input, having a variable amplitude and frequency determined by a programmable digital waveform generator generates an oscillating electric field across the gap. The synchrocyclotron can include a variable capacitor in circuit with the electrodes to vary the resonant frequency. The synchrocyclotron can further include an injection electrode and an extraction electrode having voltages controlled by the programmable digital waveform generator.
1 . A synchrocyclotron comprising:
a magnetic field generator;
a resonant circuit, comprising:
electrodes, disposed between magnetic poles, having a gap therebetween across the magnetic field; and
a variable reactive element in circuit with the electrodes to vary the resonant frequency of the resonant circuit; and
a voltage input to the resonant circuit, the voltage input being an oscillating voltage that varies in frequency over the time of acceleration of charged particles.
2 . The synchrocyclotron as claimed in claim 1 wherein the amplitude of the voltage input is varied.
3 . The synchrocyclotron of claim 1 further including an ion source for injecting charged particles into the synchrocyclotron.
4 . The synchrocyclotron of claim 1 further including an extraction electrode disposed between the magnetic poles for extracting a particle beam from the synchrocyclotron.
5 . The synchrocyclotron of claim 1 further including a sensor for detecting resonant conditions in the resonant circuit.
6 . The synchrocyclotron of claim 5 further including means for adjusting at least one of the frequency of the voltage input, reactance of the variable reactive element, and resonant frequency of the resonant circuit based on the resonant conditions.
7 . The synchrocyclotron of claim 1 further including a beam monitor for detecting a particle beam extracted from the synchrocyclotron.
8 . The synchrocyclotron of claim 7 wherein the beam monitor measures at least one of particle beam intensity, particle beam timing, and spatial distribution of the particle beam.
9 . The synchrocyclotron as claimed in claim 1 further including a programmable digital waveform generator for generating the oscillating voltage input.
10 . The synchrocyclotron of claim 9 wherein the programmable waveform generator is configured to compensate for at least one of variations in resonant conditions of the resonant circuit and variations in a particle beam extracted from the synchrocyclotron.
11 . A method of accelerating particles in a synchrocyclotron, comprising:
providing particles in the synchrocyclotron;
providing a resonant circuit, the resonant circuit comprising accelerating electrodes having a gap therebetween across a magnetic field; and
applying an oscillating voltage input that varies in frequency during acceleration of the particles to the resonant circuit, the oscillating voltage input creating an oscillating electric field across the gap that accelerates the particles in the synchrocyclotron.
12 . The method as in claim 11 , further including generating the oscillating voltage input.
13 . The method of claim 11 , further including varying the amplitude of the oscillating voltage input.
14 . The method of claim 11 , wherein providing particles includes injecting particles into the synchrocyclotron.
15 . The method of claim 11 , further including detecting resonant conditions in the resonant circuit.
16 . The method of claim 15 , further including adjusting at least one of the frequency of the voltage input, the reactance of the variable reactive element, and the resonant frequency of the resonant circuit based on the resonant conditions.
17 . The method of claim 11 , further including extracting the accelerated particles from the synchrocyclotron to form a particle beam.
18 . The method as in claim 17 , further including detecting variations in the particle beam.
19 . The method as in claim 18 , wherein the variations include variations in at least one of particle beam intensity, particle beam tinning, and spatial distribution of the particle beam.
20 . The method as in claim 18 , further including compensating for the detected variations in the particle beam.