Block copolymer for manufacturing nanowire and method for manufacturing thereof
View Patent ↗A block copolymer for manufacturing a nanowire and a method of manufacturing the same are disclosed. The block copolymer and the method of manufacturing a nanowire using the same are used to fabricate a nanowire having a diameter of less than or equal to 30 nm and a porous nanowire having a diameter within the same range and pores with a diameter of less than or equal to 10 nm.
1. A method of manufacturing a nanowire, comprising:
(a) preparing a substrate for manufacturing a nanowire;
(b) preparing a block copolymer for manufacturing a nanowire;
(c) mixing the block copolymer prepared in the step (b) with a solvent and adding a metal salt thereto to prepare a mixed solution;
(d) applying the mixed solution prepared in the step (c) on the substrate prepared in the step (a) to form a metal salt-block copolymer layer;
(e) plasma-treating the metal salt-block copolymer layer to form a metal oxide pattern;
(f) forming a metal coating layer on the substrate on which the pattern is formed in the step (e); and
(g) reacting a solution including acid and peroxide with the metal coating layer in the step (f).
2. The method of manufacturing a nanowire of claim 1 , wherein the block copolymer and solvent of the step (c) are mixed at a mixed ratio where the block copolymer is mixed at 0.1 to 1.0 wt % based on the total amount, 100 wt %, of the block copolymer and solvent.
3. The method of manufacturing a nanowire of claim 1 , wherein the metal salt of the step (c) is at least one selected from the group consisting of FeCl 2 , FeCl 3 , K 3 [Fe(CN) 6 ], and FeSO 4 .
4. The method of manufacturing a nanowire of claim 1 , wherein the metal oxide of the step (e) is an iron oxide.