IP Library Granted Patent US 8,786,655
Granted Patent B2
US 8,786,655 · App. 13/627,245 · Granted Jul 22, 2014

Marking material for laser glossing systems and methods

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,786,655
App. No.
13/627,245
Granted
Jul 22, 2014
Kind
B2
Abstract

A system for generating a differential gloss image includes a marking material having absorbing elements useful for absorbing electromagnetic radiation emitted by a laser glossing imager, and accommodating heating and resultant melting of the marking material for altering a surface of the marking material image. The absorbing element is a pigment or dye. The absorbing element is carbon black, or a pigment capable of absorbing IR light, while being transparent to visible light.

Claims (27)

1. A marking material system for generating a differential gloss image using a laser glossing imager configured to expose a portion of a printed image to electromagnetic radiation, comprising:

a marking material for forming the printed image; and

an absorbing element configured to absorb the electromagnetic radiation, the absorbing element being a component of the marking material,

wherein the absorbing element being disposed in the marking material in a concentration sufficient to impart an attenuation length of 0.5 to 10 micrometers in the marking material.

2. The system of claim 1 , the marking material further comprising:

a resin or binder, the resin or binder being a resin or binder that melts at a temperature of less than 250 degrees Celsius.

3. The system of claim 1 , the marking material further comprising:

a resin or binder, the resin or binder being a resin or binder that melts at a temperature of less than 150 degrees Celsius.

4. The system of claim 1 , the marking material further comprising a thermal plastic or wax the thermal plastic or wax being a thermal plastic or wax that melts at a temperature of less than 250 degrees Celsius.

5. The system of claim 1 , the marking material comprising at least one colorant component, the absorbing element comprising at least one of the at least one colorant component.

6. The system of claim 5 , the absorbing element further comprising:

a pigment.

7. The system of claim 5 , the absorbing element further comprising:

a dye.

8. The system of claim 5 , the absorbing element further comprising:

carbon black.

9. The system of claim 1 , the laser glossing imager comprising an IR laser, the absorbing element being IR light absorptive.

10. The system of claim 9 , the IR light absorptive absorbing element being transparent to visible light.

11. The system of claim 1 , the absorbing element having an un-even distribution in the marking material for enabling uneven heating of portions of the marking material when exposed to electromagnetic radiation from the laser glossing imager.

12. The system of claim 1 , the absorbing element being disposed in the marking material in a concentration of 0.1 to 5%.

13. A marking material system for generating a differential gloss image, comprising:

a marking material for forming the printed image, the marking material comprising an IR light absorptive absorbing element, the absorbing element being transparent to visible light; and

a laser glossing imager configured to expose a portion of the printed image to IR light for absorption by the absorbing element,

wherein the absorbing element being disposed in the marking material in a concentration sufficient to impart an attenuation length of 0.5 to 10 micrometers in the marking material.

14. The system of claim 13 , the absorbing element being a pigment.

15. The system of claim 13 , the absorbing element being a dye.

16. The system of claim 13 , comprising the absorbing element having a grainy distribution in the marking material.

Assignments (10)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 6, 2025
From: XEROX CORPORATION
To: GENESEE VALLEY INNOVATIONS, LLC
Reel/Frame 073842/0479 →
SECOND LIEN NOTES PATENT SECURITY AGREEMENT Recorded Jul 2, 2025
From: XEROX CORPORATION
To: U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 071785/0550 →
FIRST LIEN NOTES PATENT SECURITY AGREEMENT Recorded Apr 11, 2025
From: XEROX CORPORATION
To: U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 070824/0001 →
SECURITY INTEREST Recorded Feb 13, 2024
From: XEROX CORPORATION
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 066741/0001 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENTS RECORDED AT RF 064760/0389 Recorded Feb 13, 2024
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: XEROX CORPORATION
Reel/Frame 068261/0001 →
SECURITY INTEREST Recorded Nov 20, 2023
From: XEROX CORPORATION
To: JEFFERIES FINANCE LLC, AS COLLATERAL AGENT
Reel/Frame 065628/0019 →
SECURITY INTEREST Recorded Jun 22, 2023
From: XEROX CORPORATION
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 064760/0389 →
RELEASE OF SECURITY INTEREST IN PATENTS AT R/F 062740/0214 Recorded May 18, 2023
From: CITIBANK, N.A., AS AGENT
To: XEROX CORPORATION
Reel/Frame 063694/0122 →
SECURITY INTEREST Recorded Nov 10, 2022
From: XEROX CORPORATION
To: CITIBANK, N.A., AS AGENT
Reel/Frame 062740/0214 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 1, 2013
From: LIU, CHU-HENG; JIA, NANCY; ZHOU, JING
To: XEROX CORPORATION
Reel/Frame 030719/0707 →