Low-melting lead-free bismuth sealing glasses
View Patent ↗Glasses comprising Bi203, ZnO B203 and optionally a colorant including an oxide of a metal such as iron, cobalt, manganese, nickel, copper and chromium are suitable to form hermetic seals in solar cell modules, architectural glass windows and MEMS devices. Glass frit and paste compositions suitable for flow and bonding to various substrates—glass, metal, silicon, in the temperature range of 400-500 degrees Centigrade. The broad compositional range in mole % is 25-70% Bi203, up to 65% ZnO, and 1-70% B203. Such glasses do not have batched in alumina or silica. Such glasses lack alumina and silica.
1. A method of bonding first and second substrates to one another, so as to hermetically seal and isolate a cavity defined therebetween, the method comprising,
a. providing a first glass frit, wherein the first glass frit is prepared by blending first starting materials, heating the first starting material to form a first molten glass, and quenching the first molten glass to form the first glass frit comprising:
i. 25-65 mol % Bi 2 O 3 ,
ii. 3-60 mol % ZnO,
iii. 4-65 mol % B 2 O 3 ,
iv. no intentionally added oxides of silicon, and
v. no intentionally added oxides of aluminum,
vi. no intentionally added oxides of zirconium,
vii. no intentionally added refractory oxides,
viii. no intentionally added oxides of lead, and
ix. no intentionally added oxides of cadmium,
b. providing a second glass frit wherein the second glass frit is prepared by blending second starting materials, heating the second starting material to form a second molten glass, and quenching the second molten glass to form the second glass frit comprising:
i. 25-65 mol % Bi 2 O 3 ,
ii. 3-60 mol % ZnO,
iii. 4-65 mol % B 2 O 3 ,
iv. 0.1-25 mol % of at least one colorant selected from the group consisting of CuO, Fe 2 O 3 , Co 2 O 3 , MnO, NiO, Cr 2 O 3 ,
v. no intentionally added oxides of silicon, and
vi. no intentionally added oxides of aluminum,
vii. no intentionally added oxides of zirconium,
viii. no intentionally added refractory oxides,
ix. no intentionally added oxides of lead, and
x. no intentionally added oxides of cadmium,
c. mixing the first and second glass frits to form a homogeneous mixture,
d. applying the homogeneous mixture to at least one of the first and second substrates,
e. positioning the first and second substrates such that the first and second glass frits come into contact with both substrates,
f. firing at a temperature of 300-600° C. to sinter and flow the first and second glass frits thereby forming a hermetic seal defining a cavity between the first and second substrates,
wherein the one of the first and second substrates is glass and the other substrate is selected from the group consisting of glass, metal and silicon; and
wherein the first glass frit has a lower melting point than the second glass frit.
2. The method of claim 1 , wherein at least one solar cell is contained in the cavity defined between the first and second substrates.
3. The method of claim 1 , wherein at least one MEMS device is contained in the cavity defined between the first and second substrates.
4. The method of claim 1 , wherein both substrates are glass panels and the glass panels are architectural window glass panels.
5. The method of claim 1 , wherein the colorant is selected from the group consisting of Fe 2 O 3 , Co 2 O 3 , and MnO.
6. The method of claim 1 , wherein the colorant is CuO.
7. The method of claim 1 , wherein at least one of the first and second glass frits further comprises 0.1-20 wt % alkali oxide.
8. The method of claim 1 , wherein the first substrate is a cap wafer and the second substrate is a device wafer, and wherein a MEMS device is sealed in the cavity isolated between the cap wafer and substrate wafer.
9. The method of claim 1 , wherein
a. the first glass frit comprises:
i. 30-60 mol % Bi 2 O 3 ,
ii. 10-50 mol % ZnO,
iii. 7-60 mol % B 2 O 3 ,
iv. no intentionally added oxides of silicon, and
v. no intentionally added oxides of aluminum,
vi. no intentionally added oxides of zirconium,
vii. no intentionally added refractory oxides,
viii. no intentionally added oxides of lead, and
ix. no intentionally added oxides of cadmium,
b. the second glass frit comprises:
i. 35-50 mol % Bi 2 O 3 ,
ii. 20-40 mol % ZnO,
iii. 15-40 mol % B 2 O 3 ,
iv. 0.1-25 mol % of at least one colorant selected from the group consisting of CuO, Fe 2 O 3 , Co 2 O 3 , MnO, NiO, Cr 2 O 3 ,
v. no intentionally added oxides of silicon, and
vi. no intentionally added oxides of aluminum,
vii. no intentionally added oxides of zirconium,
viii. no intentionally added refractory oxides,
ix. no intentionally added oxides of lead, and
x. no intentionally added oxides of cadmium.
10. The method of claim 1 , wherein
a. the first glass frit comprises:
i. 37-45 mol % Bi 2 O 3 ,
ii. 30-40 mol % ZnO,
iii. 18-35 mol % B 2 O 3 ,
iv. no intentionally added oxides of silicon, and
v. no intentionally added oxides of aluminum,
vi. no intentionally added oxides of zirconium,
vii. no intentionally added refractory oxides,
viii. no intentionally added oxides of lead, and
ix. no intentionally added oxides of cadmium,
b. the second glass frit comprises:
i. 35-50 mol % Bi 2 O 3 ,
ii. 20-40 mol % ZnO,
iii. 15-40 mol % B 2 O 3 ,
iv. 0.1-25 mol % of at least one colorant selected from the group consisting of CuO, Fe 2 O 3 , Co 2 O 3 , MnO, NiO, Cr 2 O 3 ,
v. no intentionally added oxides of silicon, and
vi. no intentionally added oxides of aluminum,
vii. no intentionally added oxides of zirconium,
viii. no intentionally added refractory oxides,
ix. no intentionally added oxides of lead, and
x. no intentionally added oxides of cadmium.
11. The method of claim 1 , wherein both of the first and second glass frits include no intentional additions of at least one selected from the group consisting of MgO, ZrO 2 , CeO 2 , refractory oxides, PbO and CdO.
12. The method of claim 1 , wherein both of the first and second glass frits include no intentional additions of at least two selected from the group consisting of MgO, ZrO 2 , CeO 2 , refractory oxides, PbO and CdO.
13. The method of claim 1 , wherein both of the first and second glass frits include no intentional additions of MgO, ZrO 2 , CeO 2 , refractory oxides, PbO and CdO.
14. The method of claim 1 , wherein both of the first and second glass frits include no intentional additions of at least one selected from the group consisting of MgO, ZrO 2 , CeO 2 , refractory oxides, PbO and CdO.
15. The method of claim 1 , wherein both of the first and second glass frits include no intentional additions of at least one selected from the group consisting of MgO, ZrO 2 , CeO 2 , refractory oxides, PbO and CdO.
16. The method of claim 1 , wherein the first glass frit crystallizes during firing and the second glass frit does not crystallize during firing.
17. The method of claim 1 , wherein the amount of Bi 2 O 3 in the first glass frit is 55-60 mol %.
18. The method of claim 1 , wherein the amount of ZnO in the first glass frit is 3-20 mol %.
19. The method of claim 1 , wherein the amount of ZnO in the first glass frit is 36-50 mol %.
20. The method of claim 1 , wherein the amount of B 2 O 3 in the first glass frit is 26-60 mol %.
21. A method of sealing a solar cell module in a glass cylinder comprising:
a. positioning a plurality of solar cells in electrical contact with one another inside a glass cylinder,
b. applying a homogeneous mixture to at least one of the glass cylinder and a conductive metal endcap designed to fit over the end of the cylinder
c. bringing the cylinder end, homogeneous mixture and endcap into physical contact with one another, and
d. induction heating the homogeneous mixture to a temperature of 400-600° C. to provide a hermetic seal between the endcap and cylinder,
wherein the homogeneous mixture comprises
i. a first glass frit mixture, wherein the first glass frit is prepared by blending first starting materials, heating the first starting material to form a first molten glass, and quenching the first molten glass to form the first glass frit comprising:
1. 25-65 mol % Bi 2 O 3 ,
2. 3-60 mol % ZnO,
3. 4-65 mol % B 2 O 3 ,
4. no intentionally added oxides of silicon, and
5. no intentionally added oxides of aluminum, and
ii. a second glass frit, wherein the second glass frit is prepared by blending second starting materials, heating the second starting material to form a second molten glass, and quenching the second molten glass to form the second glass frit comprising:
1. 25-65 mol % Bi 2 O 3 ,
2. 3-60 mol % ZnO,
3. 4-65 mol % B 2 O 3 ,
4. 0.1-25 mol % of at least one colorant selected from the group consisting of CuO, Fe 2 O 3 , Co 2 O 3 , MnO, NiO, and Cr 2 O 3
5. no intentionally added oxides of silicon, and
6. no intentionally added oxides of aluminum, and
wherein the first glass frit has a lower melting point than the second glass frit.
22. The method of claim 21 , wherein the colorant is selected from the group consisting of Fe 2 O 3 , Co 2 O 3 , and MnO.
23. The method of claim 21 , wherein the colorant is CuO.
24. The method of claim 21 , wherein at least one of the first and second glass frits further comprises 0.1-20 wt % alkali oxide.