Target for spark vaporization with physical limiting of the propagation of the spark

1. A target for an arc source having a first body ( 3 ) of a material to be vaporized, the first body ( 3 ) comprising substantially in one plane a vaporizable surface, wherein the surface surrounds in this plane a central area, characterized in that in the central area a second body ( 7 ) is provided as a shutter, that is in the form of a disk permanently electrically isolated from the first body ( 3 ) and the second body ( 7 ) is arranged on an electrically floating potential, in such a way that the second body ( 7 ) provides substantially no electrons for maintaining a spark,

wherein the shutter is positioned to mitigate collapse of a cathode spot in the central area.

2. The target according to claim 1 , characterized in that the first body ( 3 ) in the central area comprises a recess ( 5 ) into which the second body ( 7 ) is lowered and fastened by means of an isolator pin ( 9 ), wherein the distance between the first body ( 3 ) and the second body ( 7 ) is one or several values between and including 1.5 mm and 3.5 mm.

3. The target according to claim 2 , characterized in that the second body ( 7 ) comprises, at least at the surface that protrudes from the recess ( 5 ), material that corresponds to the material of the first body ( 3 ).

4. The target according to claim 2 , characterized in that the second body ( 7 ) comprises at least one recess ( 13 ) designed in such a way that the center of gravity of the second body ( 7 ) is shifted to a point where the second body ( 7 ) comes to rest perpendicular to the isolator pin ( 9 ).

5. The target according to claim 1 , characterized in that the second body is made of a magnetically soft material.

6. A target for an arc source comprising:

a first body ( 3 ) of a material to be vaporized by a cathode spot during a coating process including a vaporizable surface, wherein the surface generally defines a plane and the surface surrounds a central area substantially in the plane; and

a second body ( 7 ) disposed in the central area, wherein the second body ( 7 ) is provided as a shutter, that is in the form of a disk permanently electrically isolated from the first body ( 3 ) and the second body ( 7 ) is arranged on an electrically floating potential in such a way that the second body ( 7 ) provides substantially no electrons for maintaining a spark during the coating process,

wherein the shutter is positioned to mitigate collapse of a cathode spot in the central area.

7. A target for an arc source comprising:

a first body ( 3 ) of a material to be vaporized by a cathode spot during a coating process including a vaporizable surface, wherein the surface generally defines a plane and the surface surrounds a recessed central area substantially in the central region of the plane; and

a second body ( 7 ) disposed in the central area, wherein the second body ( 7 ) comprising an upper surface and a lower surface is provided as a shutter, that is in the form of a disk permanently electrically isolated from the first body ( 3 ) and the second body ( 7 ) being arranged on an electrically floating potential in such a way that the second body ( 7 ) provides substantially no electrons for maintaining a spark during the coating process,

wherein the shutter is positioned to mitigate collapse of a cathode spot in the central area.

8. The target according to claim 7 , wherein at least a portion of the upper surface of the second body ( 7 ) is positioned lower than the plane of the first body ( 3 ).

9. The target according to claim 7 , wherein at least a portion of the upper surface of the second body ( 7 ) is in the plane of the first body ( 3 ).

10. The target according to claim 7 , wherein a first portion of the upper surface of the second body ( 7 ) is in the plane of the first body ( 3 ) and a second portion of the upper surface of the second body ( 7 ) is lower than the plane of the first body ( 3 ).

11. The target according to claim 7 , wherein the second body ( 7 ) comprises one of one and plurality of recesses on the upper surface of the second body ( 7 ).

12. The target according to claim 2 , wherein the second body ( 7 ) comprises one of one and plurality of recesses on an upper surface of the second body ( 7 ).

13. The target according to claim 1 , characterized in that the second body ( 7 ) is made of a material identical to the material forming the first body ( 3 ).

14. A target for an spark source to be arc evaporated, the target having a first body ( 3 ) of a material to be vaporized, the first body ( 3 ) comprising substantially in one plane a vaporizable surface, wherein the surface surrounds in this plane a central area, characterized in that in the central area a second body ( 7 ) is provided as a shutter, that is in the form of a disk permanently electrically isolated from the first body ( 3 ) and the second body ( 7 ) is arranged on an electrically floating potential, in such a way that the second body ( 7 ) provides substantially no electrons for maintaining a spark,

wherein the shutter is positioned to mitigate collapse of a cathode spot in the central area.

15. The target according to claim 1 , wherein a portion of an exterior surface of the second body ( 7 ) is in contact with an atmosphere.

16. The target according to claim 2 , wherein the second body ( 7 ) is coupled to the isolator pin ( 9 ) by means of a circlip ( 11 ).

17. The target according to claim 1 , wherein at least a first two-dimensional surface portion of the upper surface of the second body ( 7 ) is in a co-planar relationship with the vaporizable surface of the first body ( 3 ).

18. The target according to claim 17 , wherein a second two-dimensional surface portion of the upper surface of the second body ( 7 ) is lower than the vaporizable surface of the first body ( 3 ).