Laser source and laser beam machine
View Patent ↗The present application discloses a laser source for emitting laser light onto a work-piece. The laser source includes a generator configured to generate the laser light, and an adjuster configured to adjust an output of the laser light. The adjuster situated between the generator and the work-piece reduces output density of the laser light on the work-piece.
1. A laser source for emitting laser light onto a work-piece, comprising:
a generator configured to generate the laser light; and
an adjuster configured to adjust an output of the laser light, wherein
the adjuster situated between the generator and the work-piece reduces output density of the laser light on the work-piece, the adjuster including an NA converting portion situated in an optical path of the laser light emitted from the generator,
the NA converting portion converts an NA of the laser light in response to the output of the laser light, and changes a beam diameter over time in response to a pulse waveform within one pulse of the laser light.
2. The laser source according to claim 1 , wherein
a non-linear optical crystal is used as the NA converter.
3. The laser source according to claim 1 , wherein
the generator includes a resonator with at least two reflectors, a laser medium situated inside the resonator, and an excitation element configured to excite the laser medium; and
the excitation element modulates energy for exciting the laser medium to cause pulse-oscillation by means of a gain switching method.
4. The laser source according to claim 1 , further comprising a wavelength convertor configured to convert a wavelength of the laser light generated by the generator, wherein
the generator includes a double-clad fiber doped with the laser medium; and
the wavelength convertor shortens the wavelength of the laser light generated inside the double-clad fiber.
5. A laser source for emitting laser light onto a work-piece, comprising:
a generator configured to generate a fundamental light wave as the laser light; and
a wavelength convertor configured to convert the fundamental light to converted light of a different wavelength; and
a thermal sensing portion configured to measure a temperature of the wavelength convertor,
a first thermal adjuster configured to adjust a temperature of the wavelength convertor, and
a thermal insulator configured to reduce an output of the converted light, wherein
the wavelength convertor reduces a wavelength conversion efficiency if an output of the fundamental light wave incident on the wavelength convertor is increased from a first output to a second output which is higher than the first output,
the thermal insulator reduces the output of the converted light as the output of the fundamental light wave increases if the temperature of the wavelength convertor exceeds a designated threshold value associated with the temperature, and gives the wavelength converter output characteristics under which the output of the converted light increases as the output of the fundamental light wave increases if the temperature of the wavelength convertor is in a first temperature range whereas the output of the converted light decreases as the output of the fundamental light wave increases if the temperature of the wavelength convertor is in a second temperature range which is different from the first temperature range, and
the first thermal adjuster sets the temperature of the wavelength convertor to a temperature between the first and second temperature ranges.
6. The laser source according to claim 1 , wherein
the NA converting portion causes a thermal lens effect by means of the laser light emitted from the generator.
7. The laser source according to claim 2 , further comprising a second thermal adjuster configured to adjust a temperature of the NA converting portion, wherein
the non-linear optical crystal is formed mainly of LiTaO 3 or LiNbO 3 .
8. The laser source according to claim 2 , further comprising an ultraviolet light source configured to irradiate ultraviolet light onto the NA converting portion, wherein
the non-linear optical crystal is formed mainly of LiNbO 3 ; and
a wavelength of the ultraviolet light is no more than 380 nm.
9. A laser beam machine, comprising:
the laser source according to claim 1 ;
a scanning optical system which moves an irradiation position of the laser light emitted from the laser source to scan a surface of the work-piece; and
a stage on which the work-piece is placed, the stage moving the work-piece, wherein
the laser source causes pulse-oscillation.
10. A laser beam machine, comprising:
the laser source according to claim 1 ;
a smoothing element configured to make a light intensity distribution smooth in a plane perpendicular to a direction of propagation of the laser light emitted from the laser source;
a spatial modulator configured to change the light intensity distribution in the perpendicular plane; and
an optical system configured to guide the laser light, which has the light intensity distribution changed by the spatial modulator, to the work-piece, wherein
the laser source causes pulse-oscillation.
11. A laser beam machine, comprising:
the laser source according to claim 1 ;
a smoothing element configured to make a light intensity distribution smooth in a perpendicular plane to a propagation direction of the laser light emitted from the laser source;
a spatial modulator configured to change the light intensity distribution in the perpendicular plane; and
an optical system configured to guide the laser light, which has the light intensity distribution changed by the spatial modulator, to the work-piece;
an aperture element on which an aperture is formed, wherein
the laser source causes pulse-oscillation; and
the aperture element is situated between the laser source and the smoothing element.
12. The laser beam machine according to claim 9 , wherein
the work-piece is silicon;
the laser light is visible light having a wavelength of no less than 520 nm and no more than 560 nm; and
the adjuster adjusts the output density of the laser light on the work surface of the work-piece to no more than 8.0×10 7 W/cm 2 .
13. The laser beam machine according to claim 9 , wherein
a fall time during which the output of the laser light falls from a maximum value to 10% of the maximum value is no less than 80 ns.
14. A laser beam machine for machining a work-piece by means of laser light, comprising:
a resonator with at least two reflecting surfaces;
a laser crystal configured to cause laser oscillation by means of stimulated emission; and
a displacement mechanism configured to relatively displace the work-piece situated inside the resonator with respect to the resonator, wherein
the work-piece is placed obliquely with respect to the optical path of the laser light so that the laser light is incident on the work-piece at Brewster's angle.