IP Library Granted Patent US 9,691,668
Granted Patent B2
US 9,691,668 · App. 13/649,445 · Granted Jun 27, 2017

Wafer carrier

Inventors: Chung-Ying Chang (Hsinchu, TW); Yun-Ming Lo (Hsinchu, TW); Chi Shen (Hsinchu, TW); Ying-Chan Tseng (Hsinchu, TW)
Assignee: EPISTAR CORPORATION
H01L22/12C23C16/4585H01L21/683H01L21/67
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,691,668
App. No.
13/649,445
Granted
Jun 27, 2017
Kind
B2
Abstract

A wafer carrier comprises a supporting body having an opening therein, wherein said opening in said supporting body has a concave sidewall and a bottom surface in said supporting body which is curved in cross section; a plurality of vertical supporting rods configured to support and contact a wafer received in said opening and to displace said wafer from the bottom surface of the opening in said supporting body; wherein one of said supporting rods has an end for contacting and supporting said wafer; and wherein when viewing from a top view of the wafer carrier, one of said supporting rods has a base lining on the concave sidewall of said opening in said supporting body, a first concave side opposite to the base and two second concave sides connecting the base and the first concave side.

Claims (22)

1. A wafer carrier comprising:

a supporting body having an opening therein, wherein

said opening in said supporting body has a concave sidewall and a bottom surface in said supporting body which is curved in cross section;

a plurality of supporting rods configured to support and contact a wafer received in said opening and to displace said wafer from the bottom surface of the opening in said supporting body; wherein one of said supporting rods has an end for contacting and supporting said wafer; and wherein when viewing from a top view of the wafer carrier, one of said supporting rods has a base lining on the concave sidewall of said opening in said supporting body, a first concave side opposite to the base and two second concave sides connecting the base and the first concave side.

2. The wafer carrier of claim 1 , wherein the plurality of supporting rods are in contact with the concave sidewall of the opening for receiving a semiconductor wafer in the supporting body and supporting the semiconductor wafer on its outer periphery.

3. The wafer carrier as claimed in claim 1 , wherein the shape of the opening is approximately circular from a top view.

4. The wafer carrier as claimed in claim 3 , wherein the shape of the opening further comprises a flat edge from a top view.

5. The wafer carrier as claimed in claim 1 , wherein the bottom surface comprises an edge and a center.

6. The wafer carrier as claimed in claim 5 , wherein the center of the bottom surface has a height greater than a height of the edge of the bottom surface.

7. The wafer carrier as claimed in claim 5 , wherein the center of the bottom surface has a height smaller than a height of the edge of the bottom surface.

8. The wafer carrier as claimed in claim 5 , wherein a height difference between heights of the center and the edge of the bottom surface is between 15 μm and 1000 μm.

9. The wafer carrier as claimed in claim 8 , wherein the opening can accommodate the wafer having a diameter between 2 inches and 8 inches.

10. The wafer carrier as claimed in claim 9 , wherein the height difference is proportional to a diameter of the wafer.

11. The wafer carrier as claimed in claim 1 , wherein one of the plurality of supporting rods comprises two different arcs with two different curvatures.

12. The wafer carrier as claimed in claim 1 , wherein the plurality of supporting rods comprises at least three supporting rods.

13. The wafer carrier as claimed in claim 1 , wherein each of the plurality of supporting rods comprises a height smaller than the height of the supporting body.

14. The wafer carrier as claimed in claim 13 , wherein the plurality of supporting rods is above the bottom surface.

15. The wafer carrier as claimed in claim 1 , wherein the material of the supporting body or the supporting rod comprises composite material, semiconductor material, conductive material or non-conductive material.

16. A manufacturing method of a wafer carrier, comprising:

forming an epitaxial layer on a wafer to form a wafer structure;

measuring a curvature radius of the wafer structure; and

providing the wafer carrier as claimed in claim 1 in accordance with the curvature radius of the wafer structure.

Assignments (2)
CHANGE OF NAME Recorded Feb 18, 2026
From: EPISTAR CORPORATION
To: ENNOSTAR CORPORATION
Reel/Frame 075171/0402 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 20, 2012
From: CHANG, CHUNG-YING; LO, YUN-MING; SHEN, CHI; TSENG, YING-CHAN
To: EPISTAR CORPORATION
Reel/Frame 029512/0487 →
Priority Claims (1)
TW 100137510 A · Oct 14, 2011 · national
Continuity (1)
Related Publication 20130092595A1 · Apr 18, 2013