Process equipment contaminant removal
View Patent ↗A method and system remove contaminants from a vapor. In one embodiment, the system includes a contaminant removal system having a vacuum box. A contaminated vapor from process equipment is introduced to the vacuum box. The contaminated vapor includes steam and hydrocarbons. The vacuum box includes a water removal device. The water removal device removes water from the contaminated vapor to provide water and a reduced water vapor. The water and the reduced water vapor are removed from the vacuum box.
1. A contaminant removal system, comprising:
a vacuum box, wherein a contaminated vapor from process equipment is introduced to the vacuum box, and wherein the contaminated vapor comprises steam and hydrocarbons, and further wherein the vacuum box comprises a water removal device, and wherein the water removal device removes water from the contaminated vapor to provide water and a reduced water vapor, and wherein the water and the reduced water vapor are removed from the vacuum box.
2. The contaminant removal system of claim 1 , wherein the reduced water vapor is introduced to a thermal destruction device.
3. The contaminant removal system of claim 2 , wherein the thermal destruction device comprises a thermal oxidizer.
4. The contaminant removal system of claim 1 , further comprising a process equipment, wherein steam is introduced to the process equipment, and wherein the contaminated vapor exits the process equipment.
5. The contaminant removal system of claim 1 , wherein the water removal device comprises a demister pad.
6. The contaminant removal system of claim 1 , wherein the reduced water vapor is introduced to a second vacuum box, and wherein water is removed from the reduced water vapor in the second vacuum box to provide a second water and a further reduced water vapor.
7. The contaminant removal system of claim 6 , wherein the further reduced water vapor is introduced to a thermal destruction device.
8. The contaminant removal system of claim 1 , further comprising a second vacuum box, wherein a portion of the contaminated vapor is introduced to the second vacuum box and another portion of the contaminated vapor is introduced to the vacuum box, and wherein water is removed from the portion of the contaminated vapor in the second vacuum box to provide a second water and a second reduced water vapor.
9. The contaminant removal system of claim 8 , wherein the reduced water vapor and the second reduced water vapor are introduced to a thermal destruction device.
10. The contaminant removal system of claim 8 , wherein the reduced water vapor is introduced to another vacuum box and wherein water is removed from the reduced water vapor in the another vacuum box to provide another water and a further reduced water vapor, and wherein the second reduced water vapor is introduced to a further vacuum box and wherein water is removed from the second reduced water vapor in the further vacuum box to provide a further water and a second further reduced water vapor.
11. A method for removing contaminants from process equipment, comprising:
(A) introducing steam to the process equipment to provide a contaminated vapor;
(B) introducing the contaminated vapor to a vacuum box, wherein the contaminated vapor comprises steam and hydrocarbons;
(C) removing water from the contaminated vapor, wherein the vacuum box comprises a water removal device, and wherein the water removal device removes water from the contaminated vapor to provide water and a reduced water vapor; and
(D) removing the water and the reduced water vapor from the vacuum box.
12. The method of claim 11 , further comprising introducing the reduced water vapor to a thermal destruction device.
13. The method of claim 12 , wherein the thermal destruction device comprises a thermal oxidizer.
14. The method of claim 11 , further comprising introducing an oxidizer to the process equipment.
15. The method of claim 11 , wherein the water removal device comprises a demister pad.
16. The method of claim 15 , further comprising introducing the reduced water vapor to a second vacuum box, and further comprising removing water from the reduced water vapor in the second vacuum box to provide a second water and a further reduced water vapor.
17. The method of claim 16 , further comprising introducing the further reduced water vapor to a thermal destruction device.
18. The method of claim 11 , further comprising introducing a portion of the contaminated vapor to a second vacuum box and another portion of the contaminated vapor to the vacuum box, and further comprising removing water from the portion of the contaminated vapor in the second vacuum box to provide a second water and a second reduced water vapor.
19. The method of claim 18 , further comprising introducing the reduced water vapor and the second reduced water vapor to a thermal destruction device.
20. The method of claim 18 , further comprising introducing the reduced water vapor to another vacuum box, and further comprising removing water from the reduced water vapor in the another vacuum box to provide another water and a further reduced water vapor, and comprising introducing the second reduced water vapor to a further vacuum box, and further comprising removing water from the second reduced water vapor in the further vacuum box to provide a further water and a second further reduced water vapor.