Lean electrolyte for biocompatible plasmaelectrolytic coatings on magnesium implant material
View Patent ↗The present disclosure is directed, at least in part, to a method of producing ceramic layers on magnesium and its alloys, a magnesium implant with a ceramic layer made by the method, and a magnesium implant having a biocompatible ceramic layer substantially free of material which impairs the biocompatibility of said biocompatible ceramic layer. In an exemplary embodiment, the method of producing ceramic layers on magnesium and its alloys, includes (a) immersing an implant and a metal sheet into the aqueous electrolyte bath, said aqueous electrolyte bath including: ammoniac, diammonium hydrogen phosphate and urea, and wherein the implant is made of magnesium or its alloy; (b) performing a anodic oxidation by passing a current between the implant, the metal sheet and through the aqueous electrolyte bath, wherein the implant is connected to a positive pole of a current source and the metal sheet is connected to a negative pole of the current source; (c) applying a current density selected to form sparks on said implant, to thereby form a ceramic layer on said implant.
1. A method of producing ceramic layers on magnesium and its alloys, comprising the steps of:
immersing an implant and a metal sheet into an aqueous electrolyte bath, said aqueous electrolyte bath consisting essentially of: ammoniac, diammonium hydrogen phosphate and urea, and wherein the implant is made of magnesium or its alloy;
performing an anodic oxidation by passing a current between the implant, the metal sheet and through the aqueous electrolyte bath, wherein the implant is connected to a positive pole of a current source and the metal sheet is connected to a negative pole of the current source;
applying a current density selected to form sparks on said implant, to thereby form a ceramic layer on said implant.
2. The method according to claim 1 , wherein the ammoniac concentration at 25 vol. % ranges from 1.0 mol/L to 6.0 mol/L, the diammonium hydrogen phosphate concentration ranges from 0.05 mol/L to 0.2 mol/L; and the urea concentration ranges from 0.01 mol/L to 1.0 mol/L.
3. The method according to claim 1 , wherein the aqueous electrolyte bath has a pH value ranging from 10.3 to 11.6 and a temperature ranging from 18° C. to 22° C.
4. The method according to claim 1 , wherein the current density is at least 1 A/dm 2 .
5. The method according to claim 1 , wherein the current density ranges from 1 A/dm 2 to 3 A/dm 2 .
6. The method according to claim 1 , further comprising electrically insulating areas of a surface of the implant which are not to be coated such that a coating of the ceramic layer is selectively applied to the implant.
7. The method according to claim 6 , wherein electrically insulating the areas which are not to be coated is achieved by applying a lacquer, film, or foil to the areas of the surface of the implant which are not to be coated prior to immersing the implant into said aqueous electrolyte bath.