IP Library Granted Patent US 9,227,220
Granted Patent B1
US 9,227,220 · App. 13/684,266 · Granted Jan 5, 2016

Method for patterning materials on a substrate

Inventor: Peter C. Salmon (Mountain View, CA)
Assignee: I-BLADES, INC.
B05D3/145
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Quick Facts
Patent No.
US 9,227,220
App. No.
13/684,266
Granted
Jan 5, 2016
Kind
B1
Abstract

A patterning method involves providing a flexible web comprising embedded electrical charges, deposition material having polar properties, a substrate, and a transfer electrode, wherein the flexible web is passed through the deposition material and accumulates material in accordance with the embedded electrical charges, and the accumulated material is transferred to the substrate at the transfer electrode. A production line may be configured in a reel-to-reel implementation. Each station may include finishing operations on the deposited material, including but not limited to heating, annealing, curing, fusing, surface-treating, laser-processing, charge neutralizing, barrier processing, etching, electroplating, and passivating.

Claims (20)

1. A method of patterning a substrate, the method comprising:

passing a patterning web through a deposition material having polar properties, the patterning web comprising an electrically-charged pattern embedded therein; and

transferring material to the substrate at a transfer electrode,

wherein the material accumulates in accordance with the electrically-charged pattern.

2. The method of claim 1 wherein the patterning is performed at standard room pressure.

3. The method of claim 1 wherein the patterning web comprises embedded charges at multiple depths.

4. The method of claim 1 further comprising fusing or curing the material transferred to the substrate.

5. The method of claim 1 further comprising neutralizing electrical charge in the material transferred to the substrate.

6. The method of claim 1 further comprising providing a surface treatment to the material transferred to the substrate.

7. The method of claim 1 further comprising laser processing the material transferred to the substrate.

8. The method of claim 1 further comprising the step of providing corresponding alignment marks on the substrate and on the patterning web.

9. The method of claim 8 wherein the corresponding alignment marks comprise electrical charges.

10. The method of claim 1 wherein the patterning web moves continuously through deposition material such that the deposition material is continuously accumulated.

11. The method of claim 10 wherein the accumulated patterned material is continuously transferred to the substrate.

12. The method of claim 1 wherein a plurality of independent charge patterns are provided on the patterning web, and a corresponding plurality of independent circuits are patterned on the substrate.

13. The method of claim 1 wherein the deposition material having polar properties comprises ions.

14. The method of claim 1 wherein the deposition material having polar properties comprises polar molecules.

15. The method of claim 1 wherein the deposition material having polar properties comprises nano-particulates.

16. The method of claim 1 wherein the substrate is fed past the transfer electrode using a plurality of rollers.

17. The method of claim 1 further comprising electroplating the transferred deposition material.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 4, 2015
From: IBLAIDZ, INC.
To: SALMON, PETER C.
Reel/Frame 035554/0523 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 11, 2014
From: SALMON, PETER C.
To: IBLAIDZ, INC.
Reel/Frame 034476/0627 →
Continuity (1)
Provisional Application 61563504 · Nov 23, 2011