Electro-wetting display substrate and method of manufacturing the same

1. An electro-wetting display substrate comprising:

a base substrate including a gate line extending in a first direction and a data line extending in a second direction, wherein the first direction is different from the second direction;

a switching element electrically connected to the gate line and the data line;

a pixel electrode electrically connected to the switching element;

a notch electrode disposed adjacent to the switching element and overlapping the pixel electrode; and

a water-repellent layer disposed over the pixel electrode.

2. The electro-wetting display substrate of claim 1 , wherein

the notch electrode overlaps a contact electrode extending from a drain electrode of the switching element.

3. The electro-wetting display substrate of claim 2 , further comprising:

a storage line spaced apart from a gate electrode of the switching element and overlapping the pixel electrode,

wherein the contact electrode extends along the storage line.

4. The electro-wetting display substrate of claim 3 , further comprising:

a first insulating layer disposed between the storage line and the contact electrode;

a second insulating layer disposed between the contact electrode and the pixel electrode; and

a third insulating layer disposed between the pixel electrode and the notch electrode,

wherein the storage line, the contact electrode and the first insulating layer define a first capacitor, and

wherein the pixel electrode, the notch electrode and the third insulating layer define a second capacitor.

5. The electro-wetting display substrate of claim 4 , wherein the second insulating layer includes a color filter pattern.

6. The electro-wetting display substrate of claim 4 , wherein the water-repellent layer is disposed between the third insulating layer and the notch electrode.

7. The electro-wetting display substrate of claim 6 , further comprising:

a common pad extending from the notch electrode, wherein a common voltage is applied to the common pad;

a data pad extending from the data line; and

a transparent electrode electrically connected to the data pad, wherein a data signal is applied to the transparent electrode,

wherein a hole is formed through a portion of the third insulating layer and the water-repellent layer such that the transparent electrode is connected to an external device through the hole.

8. The electro-wetting display substrate of claim 4 , wherein the water-repellent layer is disposed on the notch electrode.

9. The electro-wetting display substrate of claim 8 , further comprising:

a common pad extending from the notch electrode,

wherein a common voltage is applied to the common pad, and

wherein a hole is formed through a portion of the water-repellent layer such that the common pad is connected to a short point through the hole.

10. The electro-wetting display substrate of claim 4 , further comprising:

a filling member disposed in a contact hole, which is formed through the second and third insulating layers and partially exposes the contact electrode,

wherein the filling member includes a conductive material.

11. The electro-wetting display substrate of claim 10 , wherein the pixel electrode is disposed between the contact hole and the filling member.

12. The electro-wetting display substrate of claim 1 , further comprising:

a storage line spaced apart from a gate electrode of the switching element, and overlapping the pixel electrode.

wherein the storage line is spaced apart from a contact electrode extending from a drain electrode of the switching element, and

wherein the notch electrode overlaps the storage line.

13. A method of manufacturing an electro-wetting display substrate, the method comprising:

forming a gate pattern on a base substrate, wherein the gate pattern includes a gate line and a gate electrode extending from the gate line;

forming a data pattern on the base substrate, on which the gate pattern is disposed, wherein the data pattern includes a data line extending in a direction different from the gate line, a source electrode extending from the data line, and a drain electrode spaced apart from the source electrode;

forming a pixel electrode on the base substrate, on which the data pattern is formed, wherein the pixel electrode is electrically connected to the drain electrode;

forming a notch electrode on the base substrate, on which the pixel electrode is disposed, wherein the notch electrode is adjacent to the switching element, and the notch electrode overlaps the pixel electrode; and

forming a water-repellent layer over the pixel electrode.

14. The method of claim 13 , wherein the forming the data pattern on the base substrate, on which the gate pattern is disposed, comprises:

forming a contact electrode extending from the drain electrode,

wherein the notch electrode overlaps the contact electrode.

15. The method of claim 14 , wherein the forming the gate pattern on a base substrate comprises:

forming a storage line spaced apart from the gate electrode, wherein the storage line overlaps the pixel electrode,

wherein the contact electrode extends along the storage line.

16. The method of claim 13 , further comprising:

forming a color filter pattern on the base substrate, on which the data pattern is formed; and

removing a portion of the color filter pattern such that a contact hole is formed therein,

wherein the contact hole exposes a contact electrode extending from a drain electrode of the switching element, and

wherein the pixel electrode is connected to the contact electrode through the contact hole.

17. The method of claim 16 , further comprising:

forming a filling member by filling a conductive filling material in the contact hole.

18. The method of claim 16 , further comprising:

forming a filling member by filling a conductive filling material in the contact hole, in which the pixel electrode is disposed.

19. The method of claim 13 , further comprising:

forming an insulating layer on the base substrate, on which the pixel electrode is formed,

wherein the water-repellent layer is formed on the insulating layer, and

wherein the notch electrode is formed on the water-repellent layer.

20. The method of claim 19 , further comprising:

removing a portion of the insulating layer and the water-repellent layer using a shadow mask,

wherein the forming the pixel electrode on the base substrate, on which the data pattern is formed, comprises forming a transparent electrode connected to a data pad extending from the data line,

wherein a data signal is applied to the transparent electrode, and

wherein the transparent electrode is exposed through the removed portion of the insulating layer and the water-repellent layer.

21. The method of claim 13 , further comprising:

forming an insulating layer on the base substrate, on which the pixel electrode is formed,

wherein the water-repellent layer is formed on the notch electrode.

22. The method of claim 21 , further comprising:

removing a portion of the water-repellent layer using a shadow mask,

wherein the forming the notch electrode on the base substrate, on which the pixel electrode is disposed, comprises forming a common pad extending from the notch electrode,

wherein a common voltage provided from outside is applied to the common pad, and

wherein the common pad is exposed by the removed portion of water-repellent layer.

23. The method of claim 22 , further comprising:

removing a portion of the insulating layer using a shadow mask,

wherein the forming the pixel electrode on the base substrate, on which the data pattern is formed, comprises forming a transparent electrode connected to a data pad extending from the data line,

wherein a data signal from outside is applied to the transparent electrode, and

wherein the transparent electrode is exposed through the removed portion of the insulating layer.

24. The method of claim 13 , wherein

the forming the gate pattern on a base substrate comprises forming a storage line spaced apart from the gate electrode and overlapping the pixel electrode,

the forming the data pattern on the base substrate, on which the gate pattern is disposed, comprises forming a contact electrode extending from the drain electrode and spaced apart from the storage line, and

the notch electrode overlaps the storage line.