IP Library Granted Patent US 8,669,662
Granted Patent B2
US 8,669,662 · App. 13/691,827 · Granted Mar 11, 2014

Fastening device

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Quick Facts
Patent No.
US 8,669,662
App. No.
13/691,827
Granted
Mar 11, 2014
Kind
B2
Abstract

A fastening device is provided that includes a semiconductor body with an integrated circuit, and a dielectric passivation layer formed on the surface of the semiconductor body, and a trace formed underneath the passivation layer, and an oxide layer formed beneath the trace, and a connecting component that forms a frictional connection between a component formed above the passivation layer and the semiconductor body, wherein a formation passing through the passivation layer and the oxide layer and having a bottom surface is formed, and a conductive layer is formed on the bottom surface and the connecting component forms an electrical connection between the conductive layer and the component.

Claims (21)

1. A fastening device comprising:

a semiconductor body with an integrated circuit;

a dielectric passivation layer provided on the surface of the semiconductor body;

a trace provided underneath the passivation layer;

an oxide layer provided beneath the trace;

a connecting component that forms a frictional connection between a component arranged above the passivation layer and the semiconductor body;

a formation passing through the passivation layer and the oxide layer, the formation having a bottom surface; and

a conductive layer provided on the bottom surface and/or on a lateral surface of the formation, the connecting component having an organic polymer and forms an electrical connection between the conductive layer and the component,

wherein the component is provided as a first part and the connecting component is provided as a second part of an integrated component formed underneath the passivation layer.

2. The fastening device according to claim 1 , wherein one elevation is formed on the bottom surface.

3. The fastening device according to claim 2 , wherein a plurality of elevations are formed on the bottom surface.

4. The fastening device according to claim 2 , wherein the elevation is implemented as a tungsten plug.

5. The fastening device according to claim 2 , wherein the elevation is completely enclosed by the connecting component.

6. The fastening device according to claim 2 , wherein the elevation forms a material-to-material connection with the connecting component.

7. The fastening device according to claim 1 , wherein the conductive layer contains silicon.

8. The fastening device according to claim 1 , wherein the conductive layer is made of a doped polysilicon layer and a silicide layer.

9. The fastening device according to claim 1 , wherein the conductive layer is composed of a metallic trace.

10. The fastening device according to claim 1 , wherein the connecting component completely fills the formation.

11. The fastening device according to claim 1 , wherein the connecting component contains a conductive adhesive.

12. The fastening device according to claim 1 , wherein the component is a control electrode of a gas sensor transistor.

13. The fastening device according to claim 1 , wherein the passivation layer forms a plateau, and the component rests on the plateau, or wherein the connecting component outside of the formation forms a large bearing region on the passivation layer, and the component rests on the bearing region.

Assignments (2)
CHANGE OF NAME Recorded Mar 7, 2017
From: MICRONAS GMBH
To: TDK-MICRONAS GMBH
Reel/Frame 041901/0191 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 2, 2013
From: WILBERTZ, CHRISTOPH; FRERICHS, HEINZ-PETER; KOLLETH, TOBIAS
To: MICRONAS GMBH
Reel/Frame 029555/0150 →