Organic electronic devices
View Patent ↗A technique comprising: mounting a device substrate on a processing support, forming one or more electronic elements on the device substrate with the device substrate thus mounted on the processing support; wherein the device substrate comprises an organic support structure, and provides primary protection for the overlying electronic elements against the ingress of a degrading species from a side of the device substrate opposite to the one or more electronic elements.
1. A method, comprising:
mounting a device substrate on a processing support,
forming a planarisation layer over the device substrate,
forming a plurality of electronic elements on the device substrate with the device substrate thus mounted on the processing support,
wherein the device substrate comprises a multilayer structure, the multilayer structure comprising a support portion and a barrier portion having a lower water vapour transmission rate than the support portion and located between the support portion and the planarisation layer; and
wherein the multilayer structure does not include any further support portion between said support portion and the planarisation layer.
2. A method, according to claim 1 , wherein the processing support is a planar carrier, said method further comprising:
securing said device substrate to said carrier using one or more adhesive layers; and
wherein the device substrate provides primary protection for the overlying electronic elements against the ingress of a degrading species via the one or more adhesive layers and/or otherwise via the surface of the device substrate adjacent to said one or more adhesive layers.
3. A method according to claim 2 , wherein the device substrate has a smaller water vapour transmission rate than any layer between the carrier and the device substrate.
4. A method according to claim 3 , comprising forming the device substrate directly on an adhesive unit provided on the carrier.
5. A method according to claim 4 , wherein the adhesive unit comprises adhesive layers on opposite sides of a support layer.
6. A method according to claim 2 , wherein the degrading species is moisture and/or oxygen.
7. A method according to claim 1 , wherein the device substrate has a water vapour transmission rate of between about 10 −1 and 10 −7 g/m 2 /24 hours.
8. A method according to claim 1 , wherein said support portion is an organic support portion, and said multilayer structure does not include any further organic support portion between said organic support portion and said planarisation layer.
9. A method according to claim 1 , wherein said support portion is a plastic film, and said multilayer structure does not include any further plastic film between said plastic film and said planarisation layer.
10. A method according to claim 1 , comprising forming the planarisation layer in direct contact with the barrier portion.
11. A device including an organic support portion supporting an array of electronic elements via a planarisation layer, and an inorganic moisture barrier layer between the organic support portion and the planarisation layer, wherein the device does not include any further organic support portion between said organic support portion and said planarisation layer.
12. A device according to claim 11 , wherein the inorganic moisture barrier layer has a water vapour transmission rate of no more than 0.1 times that of the organic support structure.
13. A device according to claim 11 , wherein the inorganic moisture barrier layer has a water vapour transmission rate of between about 10-1 and 10-7 g/m2/24 hours.
14. A device according to claim 11 , wherein said support portion is a plastic film, and the device does not include any further plastic film between said plastic film and said planarisation layer.
15. A device according to claim 11 , wherein the planarisation layer is in direct contact with the inorganic moisture barrier layer.
16. A method according to claim 1 , wherein said device substrate is mounted on the processing support as part of a sheet that provides a plurality of device substrates.
17. A method, comprising:
mounting a device substrate on a processing support,
forming a planarisation layer over the device substrate,
forming an array of transistors on the device substrate with the device substrate thus mounted on the processing support,
wherein the device substrate comprises a multilayer structure, the multilayer structure comprising a support portion and a barrier portion having a lower water vapour transmission rate than the support portion and located between the support portion and the planarisation layer;
wherein the multilayer structure does not include any further support portion between said support portion and the planarisation layer; and
wherein the device substrate has a water vapour transmission rate of between 0.05 and 0.1 g/m 2 /24 hours.
18. A method according to claim 1 , wherein the device substrate includes an ultraviolet radiation barrier.
19. A method according to claim 1 , wherein the multilayer structure does not include any further support portion between said support portion and said plurality of electronic elements.
20. A device according to claim 1 , wherein the multilayer structure does not include any further organic support portion between said organic support portion and said array of electronic elements.