IP Library Granted Patent US 8,941,201
Granted Patent B2
US 8,941,201 · App. 13/708,225 · Granted Jan 27, 2015

Display panel and display device

Inventor: Kazuo Kita (Osaka, JP)
Assignee: Panasonic Liquid Crystal Display Co., Ltd.
H01L29/786H01L29/78633H01L29/7869H01L27/1225
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Quick Facts
Patent No.
US 8,941,201
App. No.
13/708,225
Granted
Jan 27, 2015
Kind
B2
Abstract

In a transparent substrate ( 10 ), there are formed a semiconductor layer ( 14 ) formed of an oxide semiconductor, the semiconductor layer ( 14 ) functioning as a channel portion of a TFT ( 2 ); an electrode ( 16 ) formed of a transparent conductive material and located over the semiconductor layer ( 14 ), and a light-shielding conductor ( 17 ) formed on the electrode ( 16 ), the light-shielding conductor being formed of a material which has a conductivity higher than that of the transparent conductive material and which has light-shielding property, the light-shielding conductor covering the semiconductor layer ( 14 ). This structure can inhibit exposure of the oxide semiconductor which forms the channel portion toward a light, and can lower the resistance of the electrode formed of the transparent conductive material.

Claims (47)

1. A display panel, comprising:

a transparent substrate having a thin film transistor formed therein;

a semiconductor layer formed of an oxide semiconductor, the semiconductor layer functioning as a channel portion of the thin film transistor;

an electrode formed of a transparent conductive material, the electrode being provided to the transparent substrate and located over the semiconductor layer; and

a light-shielding conductor formed on the electrode and covering the semiconductor layer, the light-shielding conductor being formed of a material which has a conductivity higher than a conductivity of the transparent conductive material and has a light-shielding property, wherein

the transparent substrate has a pixel electrode formed therein; and

the light-shielding conductor and the common electrode are formed in a layer which is lower than the pixel electrode.

2. A display device comprising the display panel according to claim 1 .

3. The display panel according to claim 1 , wherein:

the thin film transistor is employed as a transistor provided in a pixel of the transparent substrate; and

the electrode is employed as a common electrode.

4. The display panel according to claim 3 , wherein:

the transparent substrate has an alignment film formed by photo-alignment treatment; and

the light-shielding conductor is formed in a layer which is lower than the alignment film.

5. The display panel according to claim 3 , wherein:

the transparent substrate has a gate electrode line formed therein, the gate electrode line being connected to the thin film transistor; and

the light-shielding conductor extends along the gate electrode line.

6. The display panel according to claim 5 , wherein the entirety of the semiconductor layer is covered by the light-shielding conductor and the gate electrode line.

7. A display panel, comprising:

a transparent substrate having a thin film transistor formed therein;

a semiconductor layer formed of an oxide semiconductor, the semiconductor layer functioning as a channel portion of the thin film transistor;

an electrode formed of a transparent conductive material, the electrode being provided to the transparent substrate and located over the semiconductor layer; and

a light-shielding conductor formed on the electrode and covering the semiconductor layer, the light-shielding conductor being formed of a material which has a conductivity higher than a conductivity of the transparent conductive material and has a light-shielding property, wherein:

the transparent substrate has an electrode line formed in a display region thereof;

the thin film transistor is employed as a transistor which is formed in a peripheral region outside the display region and which is connected to an end of the electrode line; and

the light-shielding conductor and the electrode on which the light-shielding conductor is formed cover the semiconductor layer of the thin film transistor formed in the peripheral region.

8. The display panel according to claim 7 , wherein:

the transparent substrate has a common electrode formed in the display region thereof; and

the electrode on which the light-shielding conductor is formed is formed in the peripheral region of the transparent substrate and is connected to the common electrode.

9. The display panel according to claim 8 , further comprising:

a first thin film transistor provided in a pixel in the display region of the transparent substrate;

a semiconductor layer formed of an oxide semiconductor, the semiconductor layer functioning as a channel portion of the first thin film transistor;

a first light-shielding conductor formed on the common electrode, for covering the semiconductor layer of the first thin film transistor;

a second thin film transistor which functions as the thin film transistor formed in the peripheral region of the transparent substrate; and

a second light-shielding conductor which functions as the light-shielding conductor that covers the semiconductor layer forming the second thin film transistor, the second light-shielding conductor being connected to the first light-shielding conductor.

10. The display panel according to claim 9 , wherein:

the first light-shielding conductor extends in a direction of extension of the electrode line; and

the second light-shielding conductor extends in a direction orthogonal to the direction of extension of the electrode line.

11. The display panel according to claim 7 , wherein:

the peripheral region of the transparent substrate has a first gate electrode line formed in a layer which is lower than the semiconductor layer; and a second gate electrode line which faces the first gate electrode line in a thickness direction of the transparent substrate and which functions as the electrode on which the light-shielding conductor is formed.

12. The display panel according to claim 11 , further comprising:

a first thin film transistor provided in a pixel in the display region of the transparent substrate;

a semiconductor layer formed of an oxide semiconductor, the semiconductor layer functioning as forming a channel portion of the first thin film transistor;

an electrode formed in the display region of the transparent substrate;

a first light-shielding conductor formed on the electrode in the display region, for covering the semiconductor layer of the first thin film transistor;

a second thin film transistor which functions as the thin film transistor formed in the peripheral region of the transparent substrate; and

a second light-shielding conductor formed on the second gate electrode line, for covering the semiconductor layer forming the second thin film transistor.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 18, 2023
From: PANASONIC LIQUID CRYSTAL DISPLAY CO., LTD.
To: PANASONIC INTELLECTUAL PROPERTY CORPORATION OF AMERICA
Reel/Frame 064292/0775 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 17, 2014
From: KITA, KAZUO
To: PANASONIC LIQUID CRYSTAL DISPLAY CO., LTD.
Reel/Frame 031990/0630 →
Priority Claims (1)
JP 2011-271138 · Dec 12, 2011 · national
Continuity (1)
Related Publication 20130146867A1 · Jun 13, 2013