IP Library Granted Patent US 9,061,916
Granted Patent B2
US 9,061,916 · App. 13/709,318 · Granted Jun 23, 2015

Processes and systems for purifying silane

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Quick Facts
Patent No.
US 9,061,916
App. No.
13/709,318
Granted
Jun 23, 2015
Kind
B2
Abstract

Processes and systems for purifying silane-containing streams and, in particular, for purifying silane-containing streams that also contain ethylene are disclosed. The processes and systems may be arranged such that one or more ethylene reactors are downstream of light-end distillation operations.

Claims (16)

1. A process for purifying a silane-containing stream, the stream comprising silane, ethylene and one or more compounds having a boiling point less than silane, the process comprising:

introducing the silane-containing stream into a reactor to convert ethylene to at least one of ethylsilane and ethane and to produce an ethylene-depleted stream relative to the silane-containing stream; and

introducing the ethylene-depleted stream into a light-ends distillation column to produce a silane-depleted overhead fraction and a silane-enriched bottoms fraction relative to the ethylene-depleted stream, the silane-enriched bottoms fraction comprising silane and at least one of ethylsilane and ethane.

2. The process as set forth in claim 1 wherein the silane-enriched bottoms fraction produced from the light-ends distillation column is introduced into a heavy-ends distillation column to produce a silane-enriched overhead fraction and a silane-depleted bottoms fraction relative to the silane-enriched bottoms fraction produced from the light-ends distillation column, the silane-depleted bottoms fraction being enriched in at least one of ethylsilane and ethane.

3. The process as set forth in claim 2 wherein the silane-containing stream comprises compounds having a boiling point greater than silane other than ethylsilane and ethane, wherein the silane-depleted bottoms fraction produced from the heavy-ends distillation column is enriched in such compounds.

4. The process as set forth in claim 3 wherein the one or more compounds having a boiling point greater than silane are selected from the group consisting of diethyl silane, toluene, dimethoxyethane and mixtures thereof.

5. The process as set forth in claim 1 wherein the silane-containing stream is heated to a temperature of at least about 25° C. prior to entry into the reactor.

6. The process as set forth in claim 1 wherein the silane-containing stream is pressurized to a pressure of at least about 2000 kPa prior to introduction into the reactor.

7. The process as set forth in claim 1 wherein the silane-containing stream is contacted with a zeolite catalyst in the reactor.

8. The process as set forth in claim 7 wherein the zeolite catalyst is in the form of a molecular sieve.

9. The process as set forth in claim 1 wherein the reactor comprises a zeolite-supported platinum, palladium or nickel catalyst.

10. The process as set forth in claim 1 wherein the ethylene-depleted stream is cooled to a temperature less than about 35° C. before introduction into the light-ends distillation column.

11. The process as set forth in claim 1 wherein the one or more compounds having a boiling point less than silane are selected from the group consisting of hydrogen, nitrogen, and methane.

12. The process as set forth in claim 1 wherein there is a unit operation directly upstream of the reactor and the difference in temperature between the stream discharged from the upstream unit operation and the silane-containing stream introduced into the reactor is less than about 125° C.

13. The process as set forth in claim 1 wherein the difference in temperature between the stream discharged from the reactor and the ethylene-depleted stream introduced into the light-ends distillation column is less than about 300° C.

14. The process as set forth in claim 1 wherein at least about 75% of the ethylene introduced into the reactor in the silane-containing stream is converted to at least one of ethylsilane and ethane.

Assignments (10)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 27, 2017
From: SUNEDISON, INC.; SUNEDISON PRODUCTS SINGAPORE PTE. LTD.; MEMC PASADENA, INC.; SOLAICX
To: CORNER STAR LIMITED
Reel/Frame 042351/0659 →
PATENT SECURITY AGREEMENT Recorded Apr 28, 2016
From: SUNEDISON, INC.
To: DEUTSCHE BANK AG NEW YORK BRANCH, AS ADMINISTRATIVE AGENT
Reel/Frame 038557/0472 →
SECURITY INTEREST Recorded Jan 13, 2016
From: SUNEDISON, INC.; SUN EDISON LLC; SOLAICX; NVT, LLC
To: WILMINGTON TRUST, NATIONAL ASSOCIATION, SOLELY IN ITS CAPACITY AS COLLATERAL TRUSTEE
Reel/Frame 037508/0606 →
RELEASE OF SECURITY INTEREST Recorded Jan 13, 2016
From: GOLDMAN SACHS BANK USA, AS ADMINISTRATIVE AGENT
To: SUNEDISON, INC.; SUN EDISON LLC; SOLAICX; NVT, LLC
Reel/Frame 037508/0884 →
SECURITY INTEREST Recorded Aug 11, 2015
From: SUNEDISON, INC.; SUN EDISON LLC; SOLAICX; NVT, LLC
To: GOLDMAN SACHS BANK USA, AS ADMINISTRATIVE AGENT
Reel/Frame 036329/0470 →
CHANGE OF NAME Recorded Apr 27, 2015
From: MEMC ELECTRONIC MATERIALS, INC.
To: SUNEDISON, INC.
Reel/Frame 035506/0695 →
RELEASE OF SECURITY INTEREST Recorded Mar 3, 2014
From: DEUTSCHE BANK AG NEW YORK BRANCH
To: NVT, LLC; SUN EDISON LLC; SOLAICX; SUNEDISON, INC.
Reel/Frame 032382/0724 →
SECURITY AGREEMENT Recorded Feb 28, 2014
From: SUNEDISON, INC.; SUN EDISON LLC; SOLAICX; NVT, LLC; ENFLEX CORPORATION
To: WELLS FARGO BANK, NATIONAL ASSOCIATION, AS ADMINISTRATIVE AGENT
Reel/Frame 032372/0610 →
SECURITY AGREEMENT Recorded Jan 30, 2014
From: SUNEDISON, INC.; SOLAICX; SUN EDISON, LLC; NVT, LLC
To: DEUTSCHE BANK AG NEW YORK BRANCH
Reel/Frame 032177/0359 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 28, 2013
From: ZOU, BAISHENG; GU, ZHIHUI
To: MEMC ELECTRONIC MATERIALS, INC.
Reel/Frame 029700/0845 →