CYCLOALIPHATIC MONOMER, POLYMER COMPRISING THE SAME, AND PHOTORESIST COMPOSITION COMPRISING THE POLYMER
A monomer has the Formula I: wherein R 1 , R 2 , and R 3 are each independently a C 1-30 monovalent organic group, and R 1 , R 2 , and R 3 are each independently unsubstituted or include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; R 4 includes H, F, C 1-4 alkyl, or C 1-4 fluoroalkyl; A is a single bond or a divalent linker group, wherein A is unsubstituted or substituted to include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups; m and n are each independently an integer of 1 to 8; and x is 0 to 2n+2, and y is 0 to 2m+2.
1 . A monomer, having the Formula I:
wherein R 1 , R 2 , and R 3 are each independently a C 1-30 monovalent organic group, and R 1 , R 2 , and R 3 are each independently unsubstituted or include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups;
R 4 includes H, F, C 1-4 alkyl, or C 1-4 fluoroalkyl;
A is a single bond or a divalent linker group, wherein A is unsubstituted or substituted to include a halogen, nitrile, ether, ester, ketone, alcohol, or a combination comprising at least one of the foregoing functional groups;
m and n are each independently an integer of 1 to 8; and
x is 0 to 2n+2, and y is 0 to 2m+2.
2 . The monomer of claim 1 , wherein R 4 is H, F, methyl, or trifluoromethyl.
3 . The monomer of claim 1 , wherein R 1 , R 2 , and R 3 are each independently C 1-10 alkyl, C 1-10 fluoroalkyl, C 1-10 alkoxy, C 1-10 fluoroalkoxy, C 1-10 alkanol, or a combination comprising at least one of the foregoing.
4 . The monomer of claim 1 , wherein R 1 , R 2 , and R 3 are each independently H, methyl, ethyl, trifluoromethyl, 2,2,2-trifluoroethyl, 2-hydroxyethyl, or a combination comprising at least one of the foregoing.
5 . The monomer of claim 1 , wherein m and n are independently 3 or 4, and x and y are independently an integer of from 0 to 2.
6 . The monomer of claim 1 , wherein R 1 is methyl or ethyl, m and n are each 3, and x and y are each 0.
7 . The monomer of claim 1 , wherein A is —O—CH 2 (C═O)—.
8 . A polymer, comprising the monomer of claim 1 .
9 . A photoresist composition, comprising the polymer of claim 8 and a photoacid generator.
10 . A coated substrate, comprising: (a) a substrate having one or more layers to be patterned on a surface thereof; and (b) a layer of a photoresist composition of claim 9 over the one or more layers to be patterned.
11 . A patterned layer, formed by patternwise imaging the coated substrate of claim 10 using actinic radiation at 193 nm.