Thin-film transistor substrate and method for fabricating the same, display
View Patent ↗The invention provides a thin-film transistor substrate, including: a substrate; a metal lead structure formed on the substrate, wherein the metal lead structure includes: a main conductor layer formed on the substrate, wherein the main conductor has a sidewall; a top conductor layer having a first portion, second portion and third portion, wherein the first portion is formed on the main conductor layer, the second portion is formed on the sidewall of the main conductor layer, and the third portion is formed on the substrate, and a continuous structure is formed by the first portion, the second portion and the third portion.
1. A thin-film transistor substrate, comprising:
a first substrate; and
a metal lead structure formed on the first substrate, wherein the metal lead structure comprises:
a main conductor layer formed on the first substrate, wherein the main conductor has a sidewall; and
a top conductor layer having a first portion, a second portion and a third portion,
wherein
the first portion is formed on the main conductor layer,
the second portion is formed on the sidewall of the main conductor layer,
the third portion is formed on the first substrate,
a continuous structure is made by the first portion, the second portion and the third portion, and
the second portion of the top conductor layer is separated from the main conductor layer by an air-gap between the second portion of the top conductor layer and the sidewall of the main conductor layer.
2. The thin-film transistor substrate as claimed in claim 1 , wherein the top conductor layer has a uniform thickness.
3. The thin-film transistor substrate as claimed in claim 1 , wherein the top conductor layer is a non-conformal layer.
4. The thin-film transistor substrate as claimed in claim 1 , wherein a sum of the length (d 2 ) of the second portion of the top conductor layer and the length (d 3 ) of the third portion of the top conductor layer is greater than the length (d 4 ) of the sidewall of the main conductor layer ((d 2 +d 3 )>d 4 ).
5. The thin-film transistor substrate as claimed in claim 1 , further comprising:
a bottom conductor layer formed between the substrate and the main conductor layer.
6. The thin-film transistor substrate as claimed in claim 5 , wherein the bottom conductor layer comprises molybdenum (Mo), titanium (Ti), tantalum (Ta), Chromium (Cr) or combinations thereof.
7. The thin-film transistor substrate as claimed in claim 1 , wherein the main conductor layer comprises aluminum (Al), copper (Cu) or combinations thereof.
8. The thin-film transistor substrate as claimed in claim 1 , wherein the top conductor layer comprises molybdenum (Mo), titanium (Ti), tantalum (Ta), Chromium (Cr) or combinations thereof.
9. The thin-film transistor substrate as claimed in claim 1 , wherein the metal lead structure is a gate line.
10. The thin-film transistor substrate as claimed in claim 1 , wherein the metal lead structure is a data line.
11. The thin-film transistor substrate as claimed in claim 1 , wherein the metal lead structure is a gate electrode.
12. The thin-film transistor substrate as claimed in claim 1 , wherein the metal lead structure is a source/drain electrode.
13. A display, comprising:
a thin-film transistor substrate as claimed in claim 1 ;
a second substrate disposed oppositely to the thin-film transistor substrate; and
a display media formed between the thin-film transistor substrate and the substrate.
14. The display as claimed in claim 13 , wherein the display media is a liquid crystal layer or an organic emitting layer.
15. A method for fabricating a thin-film transistor substrate, comprising:
providing a substrate;
sequentially forming a main conductor layer and a top conductor layer on the substrate;
forming a patterned photoresist layer on the top conductor layer;
performing a first etching step to remove a portion of the main conductor layer and a portion of the top conductor layer and to expose sidewall of the main conductor layer and the substrate;
performing a second etching step, wherein
an etching rate of the main conductor layer is larger than that of the top conductor layer to make the top conductor layer extend downward to cover the main conductor layer,
the top conductor layer has a first portion formed on the main conductor layer, a second portion formed on the sidewall of the main conductor layer, and a third portion formed on the substrate,
a continuous structure is made by the first portion, the second portion and the third portion, and
the second portion of the top conductor layer is separated from the main conductor layer by an air-gap between the second portion of the top conductor layer and the sidewall of the main conductor layer; and
removing the patterned photoresist layer.
16. The method for fabricating a thin-film transistor substrate as claimed in claim 15 , before forming the main conductor layer, further comprising forming a bottom conductor layer on the substrate.
17. The method for fabricating a thin-film transistor substrate as claimed in claim 15 , wherein the first etching step is performed by using an acid solution as etchant.
18. The method for fabricating a thin-film transistor substrate as claimed in claim 15 , wherein the second etching step is performed by using an acid solution as etchant with a spraying etching mode or a dip etching mode.
19. The method for fabricating a thin-film transistor substrate as claimed in claim 15 , wherein the second etching step is performed by using a base solution as etchant.