IP Library Patent Application 13719858
Patent Application
App. No. 13/719,858

Microphone with Irregular Diaphragm

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Quick Facts
Patent No.
US None
App. No.
13/719,858
Abstract

A microphone is formed to have a diaphragm that is configured to improve signal to noise ratio. To that end, the microphone has a backplate having a hole therethrough, and a diaphragm movably coupled with the backplate. The diaphragm has a bottom surface (facing the backplate) with a convex portion aligned with the hole in the backplate.

Claims (31)

1 . A method of forming a MEMS device, the method comprising:

providing a backplate having a hole;

depositing a filler material within the hole to form an uneven top surface;

forming a diaphragm above the uneven top surface so that the diaphragm has a protruding portion on a bottom surface, the diaphragm being formed to be coupled with the backplate; and

forming a space between the diaphragm and the backplate, the diaphragm bottom surface facing the backplate, the protruding portion being substantially aligned with the hole in the backplate.

2 . The method as defined by claim 1 wherein the diaphragm has a top surface that opposes the bottom surface, the protruding portion of the diaphragm forming a depression in the top surface.

3 . The method as defined by claim 1 wherein the backplate has a plurality of holes therethrough, the diaphragm having a plurality of protruding portions that each share a vertical plane with one of the plurality of holes.

4 . The method as defined by claim 1 wherein coupling comprises forming an insulator layer between the backplate and the diaphragm.

5 . The method as defined by claim 1 wherein forming a diaphragm and forming a space comprises using micromachining techniques.

6 . The method as defined by claim 1 wherein forming a diaphragm comprises:

adding a spacer layer to the uneven top surface of filler material;

adding diaphragm material to a surface of the spacer layer; and

removing at least a portion of the filler material.

7 . The method as defined by claim 1 wherein the backplate is formed from an SOI wafer.

8 . The method as defined by claim 1 wherein at least a portion of the filler material is between the backplate and the diaphragm.

9 . The method as defined by claim 1 wherein the diaphragm has a bottom surface shape that is substantially the same as the surface shape of the uneven top surface of the filler material.

10 . The method as defined by claim 1 wherein the protruding portion on the bottom of the diaphragm extends toward and does not extend into the hole in the backplate when at rest.

11 . The method as defined by claim 1 wherein the diaphragm comprises a plurality of dimples, at least one of the dimples forming the protruding portion.

12 . The method as defined by claim 1 further comprising forming a backside cavity under the backplate, the backplate being between the backside cavity and the diaphragm.

13 . A method of forming a MEMS device, the method comprising:

forming a hole in a backplate;

depositing a filler material within the hole to form an uneven top surface;

forming a diaphragm above the uneven top surface so that the diaphragm has a protruding portion on a bottom surface, the diaphragm being formed to be coupled with the backplate; and

forming a space between the diaphragm and the backplate, the diaphragm bottom surface facing the backplate, the protruding portion being substantially aligned with the hole in the backplate.

14 . The method as defined by claim 13 wherein the diaphragm has a top surface that opposes the bottom surface, the protruding portion of the diaphragm forming a depression in the top surface.

15 . The method as defined by claim 13 wherein the backplate has a plurality of holes therethrough, the diaphragm having a plurality of protruding portions that each share a vertical plane with one of the plurality of holes.

16 . The method as defined by claim 13 wherein coupling comprises forming an insulator layer between the backplate and the diaphragm.

17 . The method as defined by claim 13 wherein forming a diaphragm comprises forming a diaphragm on the uneven top surface so that the diaphragm has a protruding portion on a bottom surface.

18 . The method as defined by claim 13 wherein the diaphragm comprises a plurality of dimples, at least one of the dimples forming the protruding portion.

19 . The method as defined by claim 13 further comprising forming a backside cavity under the backplate, the backplate being between the backside cavity and the diaphragm.

20 . The method as defined by claim 13 wherein at least a portion of the filler material is between the backplate and the diaphragm.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 25, 2013
From: ANALOG DEVICES, INC.
To: INVENSENSE, INC.
Reel/Frame 031721/0683 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 19, 2012
From: WEIGOLD, JASON W.
To: ANALOG DEVICES, INC.
Reel/Frame 029501/0866 →