Solar cell emitter region fabrication using silicon nano-particles
View Patent ↗Methods of fabricating solar cell emitter regions using silicon nano-particles and the resulting solar cells are described. In an example, a method of fabricating an emitter region of a solar cell includes forming a region of doped silicon nano-particles above a dielectric layer disposed above a surface of a substrate of the solar cell. A layer of silicon is formed on the region of doped silicon nano-particles. At least a portion of the layer of silicon is mixed with at least a portion of the region of doped silicon nano-particles to form a doped polycrystalline silicon layer disposed on the dielectric layer.
1. A method of fabricating an emitter region of a solar cell, the method comprising:
forming a region of doped silicon nano-particles above a dielectric layer disposed above a surface of a substrate of the solar cell;
forming a layer of silicon on the region of doped silicon nano-particles; and
mixing at least a portion of the layer of silicon with at least a portion of the region of doped silicon nano-particles to form a doped polycrystalline silicon layer disposed on the dielectric layer.
2. The method of claim 1 , wherein forming the region of doped silicon nano-particles comprises printing or spin-on coating a region of doped silicon nano-particles having an average particles size approximately in the range of 5-100 nanometers and a porosity approximately in the range of 10-50%, with at least some open pores.
3. The method of claim 1 , wherein forming the layer of silicon comprises forming a layer of un-doped, intrinsic, or lightly doped amorphous silicon from silane (SiH 4 ) in a low pressure chemical vapor deposition (LPCVD) chamber at a temperature approximately in the range of 525-565 degrees Celsius.
4. The method of claim 1 , wherein forming the layer of silicon comprises forming a portion of the silicon layer within the region of doped silicon nano-particles and closing one or more open pores of the region of doped silicon nano-particles with a portion of the layer of silicon.
5. The method of claim 4 , wherein closing the one or more open pores of the region of doped silicon nano-particles with the portion of the layer of silicon comprises forming closed pores having angular edges, and wherein mixing the portion of the layer of silicon with the portion of the region of doped silicon nano-particles to form the doped polycrystalline silicon layer comprises modifying the closed pores having angular edges to form rounded closed pores.
6. The method of claim 1 , wherein mixing the portion of the layer of silicon with the portion of the region of doped silicon nano-particles to form the doped polycrystalline silicon layer comprises heating the substrate to a temperature approximately in the range of 700-1100 degrees Celsius.
7. The method of claim 1 , wherein mixing the portion of the layer of silicon with the portion of the region of doped silicon nano-particles to form the doped polycrystalline silicon layer comprises reducing a combined thickness of the layer of silicon and the region of doped silicon nano-particles by an amount approximately in the range of 20-50%.
8. The method of claim 1 , wherein the region of doped silicon nano-particles is formed to a thickness approximately in the range of 0.2-3 microns, and the layer of silicon is formed to an absolute thickness approximately in the range of 200-2000 Angstroms.
9. The method of claim 1 , wherein the doped silicon nano-particles are P-type doped silicon nano-particles, and the doped polycrystalline silicon layer is a P-type doped polycrystalline silicon layer.
10. The method of claim 9 , further comprising:
forming a region of N-type doped silicon nano-particles above the dielectric layer, adjacent to but not in contact with the region of P-type doped silicon nano-particles;
forming the layer of silicon on the region of N-type doped silicon nano-particles; and
mixing at least a portion of the layer of silicon with at least a portion of the region of N-type doped silicon nano-particles to form an N-type doped polycrystalline silicon layer disposed on the dielectric layer.
11. The method of claim 1 , wherein the doped silicon nano-particles are N-type doped silicon nano-particles, and the doped polycrystalline silicon layer is an N-type doped polycrystalline silicon layer.
12. The method of claim 1 , wherein the dielectric layer is formed on the substrate and is a tunnel dielectric layer for the emitter region.
13. The method of claim 1 , wherein the surface of the substrate is a back surface of the substrate, opposite a light receiving surface of the substrate, the method further comprising:
forming a metal contact on the doped polycrystalline silicon layer.
14. A method of fabricating an emitter region of a solar cell, the method comprising:
forming a region of doped silicon nano-particles above a dielectric layer disposed above a back surface of a substrate of the solar cell, the back surface opposite a light-receiving surface of the solar cell;
forming a layer of silicon on both the light-receiving surface and above the back surface of the substrate, including a portion on the region of doped silicon nano-particles and a portion on the dielectric layer;
mixing the portion of the layer of silicon formed on the region of doped silicon nano-particles with at least a portion of the region of doped silicon nano-particles to form a doped polycrystalline silicon layer disposed on the dielectric layer;
oxidizing the layer of silicon on the light-receiving surface of the substrate, the portion of the layer of silicon on the dielectric layer, and an outermost region of the doped polycrystalline silicon layer to form a silicon oxide layer on the light receiving surface and above the back surface of the substrate;
and forming an anti-reflective coating layer on the silicon oxide layer on the light receiving surface and on the silicon oxide layer above the back surface of the substrate.
15. The method of claim 14 , wherein forming the silicon oxide layer on the light receiving surface and above the back surface of the substrate comprises heating the substrate in the presence of oxygen (O 2 ), water vapor (H 2 ), or nitrous oxide (N 2 O) in a low pressure chemical vapor deposition (LPCVD) chamber.
16. The method of claim 14 , wherein forming the anti-reflective coating layer on the silicon oxide layer comprises forming a silicon nitride layer in a low pressure chemical vapor deposition (LPCVD) chamber.
17. The method of claim 14 , further comprising:
forming a metal contact to the doped polycrystalline silicon layer.
18. A method of fabricating an emitter region of a solar cell, the method comprising:
forming a region of N-Type doped silicon nano-particles and a region of P-type doped silicon nano-particles above a dielectric layer disposed above a back surface of a substrate of the solar cell, the back surface opposite a light-receiving surface of the solar cell, and the region of N-Type doped silicon nano-particles adjacent to but not in contact with the region of P-type doped silicon nano-particles;
forming a layer of silicon at least above the back surface of the substrate, including a portion on the regions of N-type and P-type doped silicon nano-particles and a portion on the dielectric layer;
mixing the portion of the layer of silicon formed on the regions of N-type and P-type doped silicon nano-particles with at least a portion of each of the regions of N-type and P-type doped silicon nano-particles to form an N-type doped polycrystalline silicon layer and a P-type doped polycrystalline silicon layer, respectively, each disposed on the dielectric layer;
oxidizing the portion of the layer of silicon on the dielectric layer, and an outermost region of the each of the N-type and P-type doped polycrystalline silicon layers to form a silicon oxide layer above the back surface of the substrate;
masking and etching the silicon oxide layer above the back surface of the substrate to provide an N-type doped polysilicon region and a P-type doped polycrystalline silicon region separated by a trench formed in the back surface of the substrate, each of the N-type doped polysilicon region and the P-type doped polycrystalline silicon region retaining a portion of the silicon oxide layer thereon; and
forming an anti-reflective coating layer on the N-type doped polysilicon region and the P-type doped polycrystalline silicon region and in the trench.
19. The method of claim 18 , further comprising:
prior to forming the anti-reflective coating layer, texturizing the light-receiving surface.
20. The method of claim 18 , further comprising:
subsequent to masking and etching the silicon oxide layer and prior to forming the anti-reflective coating layer, diffusing N-type dopants into the substrate.