Diffractive MEMS device
View Patent ↗A diffractive MEMS device has an in-plane binary reflective diffraction pattern formed in an outer surface of a tiltable platform. The binary reflective diffraction pattern includes rectangular or trapezoidal ridges and valleys, or grooves, of a same depth. The binary reflective diffractive pattern has a high diffraction efficiency even though the surfaces of the “grooves” or “ridges” are not perpendicular to the incoming optical beam. The diffractive pattern is supported by a pair of torsional hinges and is tiltable by an electrostatic actuator. The electrostatic actuator can include at least one side electrode for linearization of dependence of tilt angle on the voltage applied to the actuator.
1. A diffractive MEMS device comprising:
a substrate;
a platform hingedly supported over the substrate and tiltable about a first axis;
an electrostatic actuator comprising a stator and a rotor for tilting the platform about the first axis when a first control voltage is applied between the stator and the rotor, wherein
the stator comprises a first stator side electrode extending into a horizontal plane of the platform, upwardly from the substrate, and adjacent to and along a first edge of the platform for an electrostatic interaction with the platform, and
the stator and the rotor are located above the substrate, and
the platform is substantially parallel to the substrate when no voltage is applied between the stator and the rotor,
the platform comprises a binary diffractive surface relief pattern, comprising a binary diffraction grating therein, and a conforming reflective metal layer disposed over the binary diffractive surface relief pattern, and
the binary diffractive surface relief pattern comprises a plurality of ridges comprising sidewalls and separated by trenches,
the ridges having rectangular or trapezoidal cross-sections,
the ridges have a height and top width,
the trenches have a trench top width,
the ridge height and the trench top widths add up to a pitch parameter.
2. The diffractive MEMS device of claim 1 , wherein the sidewalls of the ridges have a slant angle of at least two degrees away from perpendicular with respect to the platform.
3. The diffractive MEMS device of claim 1 , wherein the conforming reflective metal layer is disposed on the sidewalls of the ridges and in the trenches there between.
4. The diffractive MEMS device of claim 1 , wherein the platform comprises single-crystal silicon.
5. The diffractive MEMS device of claim 1 , wherein the platform is at least 10 micrometers thick.
6. The diffractive MEMS device of claim 1 , wherein the conforming reflective metal layer comprises gold or aluminum.
7. The diffractive MEMS device of claim 1 , wherein the binary diffractive surface relief pattern is substantially photoresist free.
8. The diffractive MEMS device of claim 1 , wherein a thickness of the conforming reflective metal layer on the sidewalls is at least 20 nm.
9. The diffractive MEMS device of claim 1 , wherein
the trench top width is between 0.9 and 1.2 micrometers,
a height of the ridges is between 0.5 and 0.8 micrometers,
a slant angle is less than 8 degrees, and
the pitch parameter is 1.55+−0.1 micrometers, whereby a diffraction efficiency of the binary diffraction grating for TE polarized light at 1.55+−0.05 micrometers is at least 85%.
10. The diffractive MEMS device of claim 1 , wherein
the trench top width is between 0.5 and 0.9 micrometers,
a height of the ridges is between 0.2 and 0.5 micrometers,
a slant angle is less than 12 degrees, and
the pitch parameter is 1.55+−0.1 micrometers, whereby a diffraction efficiency of the binary diffraction grating for TM polarized light at 1.55+−0.05 micrometers is at least 85%.
11. The diffractive MEMS device of claim 1 , wherein
the trench top width is between 0.7 and 1.0 micrometers,
a height of the ridges is between 1.1 and 1.3 micrometers,
a slant angle is less than 12 degrees, and
the pitch parameter is 1.55+−0.1 micrometers, whereby diffraction efficiencies of the binary diffraction grating for TE or TM polarized light are within 10% of each other.
12. The diffractive MEMS device of claim 1 , wherein the binary diffractive surface relief pattern further comprises a wavefront-correcting diffractive optical element and/or a diffractive optical element having a magnifying or demagnifying power.
13. The diffractive MEMS device of claim 1 , wherein
the stator further comprises a second stator side electrode extending upwardly from the substrate adjacent to and along a second edge of the platform for an electrostatic interaction therewith, and
the first and second stator side electrodes extend to at least 75% to 125% of a distance between the substrate and the platform when no voltage is applied between the stator and the rotor.
14. The diffractive MEMS device of claim 13 , wherein
the stator further comprises a first stator comb extending from the substrate towards the platform,
the rotor comprises a first rotor comb extending from the platform towards the substrate,
the first rotor comb is interdigitated with the first stator comb, and
the platform comprises first and second flanges extending laterally therefrom and surrounding the first and second stator side electrodes, respectively.
15. The diffractive MEMS device of claim 14 , wherein the stator further comprises third and fourth stator side electrodes extending from the substrate on opposite sides of the platform for an electrostatic interaction therewith, so that the first flange is at least partially disposed between the first and third stator side electrodes, and the second flange is at least partially disposed between the second and fourth stator side electrodes.
16. The diffractive MEMS device of claim 15 , wherein
the stator further comprises a second stator comb extending from the substrate towards the platform,
the rotor further comprises a second rotor comb extending from the platform towards the substrate,
the second rotor comb is interdigitated with the second stator comb and is configured to tilt the platform about the first axis in a second direction of tilt opposite to a first direction, when a second control voltage is applied between the platform and the second stator comb,
the stator further comprises fifth and sixth stator side electrodes extending upwardly from the substrate on opposite sides of the platform for an electrostatic interaction therewith,
the fifth and sixth stator side electrodes extend to at least 75% to 125% of a distance between the substrate and the platform when no voltage is applied between the stator and the rotor, and
the platform comprises flanges extending laterally therefrom and surrounding the fifth and sixth stator side electrodes, respectively.
17. An array of the diffractive MEMS devices of claim 1 disposed on the substrate.
18. A tunable semiconductor laser comprising:
a semiconductor chip for providing optical gain at a lasing wavelength; and
the diffractive MEMS device of claim 1 optically coupled to the semiconductor chip, for providing a wavelength selective optical feedback for tuning the lasing wavelength.
19. The tunable semiconductor laser of claim 18 , wherein the pitch parameter is between 75% and 125% of the lasing wavelength.
20. The diffractive MEMS device of claim 1 , wherein the platform further includes a flange that surrounds at least some of the first stator side electrode.
21. A method of manufacturing a diffractive MEMS device, the method comprising:
providing a semiconductor wafer comprising a platform;
etching, after providing the semiconductor wafer, a binary diffractive surface relief pattern into the platform;
coating, after etching the binary diffractive surface relief pattern, the binary diffractive surface relief pattern with a conforming metal layer; and
suspending, after coating the binary diffractive surface relief pattern with a conforming metal, the platform over a substrate for tilting the platform about a first axis,
wherein the binary diffractive surface relief pattern comprises a plurality of ridges comprising sidewalls and separated by trenches, the plurality of ridges and the trenches having rectangular or trapezoidal cross-sections.
22. The method of claim 21 , wherein the etching comprises reactive ion etching.
23. The method of claim 21 , wherein the sidewalls are coated with the conforming metal layer to a thickness of at least 20 nm.
24. The method of claim 21 , wherein the suspending comprises photolithographic definition and release of the platform for suspending over the substrate.