REFLECTIVE SUBSTRATE AND METHOD OF MANUFACTURING THE SAME
A reflective substrate, the transmittance of visible light of which is improved, and a method of manufacturing the same. The reflective substrate includes a glass substrate, an oxide or nitride film formed on the glass substrate, and vanadium dioxide (VO 2 ) film formed on the oxide or nitride film.
1 . A reflective substrate comprising:
a base substrate; and
a thermochromic thin film formed on the base substrate,
wherein the thermochromic thin film comprises a thermochromic material and a dopant doped into the thermochromic material such that a phase transition temperature of the thermochromic thin film is lower than a phase transition temperature of the thermochromic material.
2 . The reflective substrate of claim 1 , wherein the thermochromic material comprises one selected from the group consisting of vanadium dioxide (VO 2 ), titanium oxide (III) (Ti 2 O 3 ), niobium oxide (NbO 2 ) and nickel sulfide (NiS).
3 . The reflective substrate of claim 1 , wherein the thermochromic material comprises vanadium dioxide (VO 2 ), and
wherein the dopant comprises one selected from the group consisting of molybdenum (Mo), tungsten (W), chromium (Cr), nickel (Ni) and zirconium (Zr).
4 . The reflective substrate of claim 3 , wherein the thermochromic thin film comprises the vanadium dioxide (VO 2 ) doped with 3 at % or more of the tungsten (W).
5 . The reflective substrate of claim 1 , further comprising an oxide or nitride thin film between the base substrate and the thermochromic thin film.
6 . The reflective substrate of claim 5 , wherein the oxide or nitride thin film comprises at least one selected from the group consisting of silicon dioxide (SiO 2 ), aluminum oxide (Al 2 O 3 ), niobium pentoxide (Nb 2 O 5 ), titanium dioxide (TiO 2 ), and silicon nitride (Si 3 N 4 ).
7 . The reflective substrate of claim 5 , wherein a thickness of the oxide or nitride thin film ranges from 30 nm to 80 nm.
8 . A method of manufacturing a reflective substrate comprising forming a thermochromic thin film as recited in claim 1 on a base substrate.
9 . The reflective substrate of claim 8 , wherein the thermochromic thin film is formed using a sputtering target that comprises the thermochromic material doped with the dopant.
10 . The reflective substrate of claim 8 , wherein the thermochromic thin film is formed using a sputtering target that comprises the thermochromic material and a sputtering target that comprises the dopant.