Base-layer consisting of two materials layer with extreme high/low index in low-e coating to improve the neutral color and transmittance performance
View Patent ↗Low emissivity coated panels can be fabricated using a base layer having a low refractive index layer on a high refractive index layer. The low refractive index layer can have refractive index less than 1.5, and can include MgF 2 , CaF 2 , SiO 2 , or BO. The high refractive index layer can have refractive index greater than 2.3, and can include TiO x , NbO x , or BiO x . The multilayer base structure can allow color tuning with enhanced transmission, for example, as compared to similar structures having single layer base layer.
1. A low emissivity panel, comprising:
a transparent substrate;
a first layer formed directly on the substrate,
wherein the first layer comprises silicon-zirconium nitride;
a second layer formed directly on the first layer,
wherein the second layer has an index of refraction greater than 2.3,
wherein the second layer comprises bismuth oxide,
wherein the second layer has a thickness between 10 and 15 nm;
a third layer formed directly on the second layer,
wherein the third layer has an index of refraction less than 1.5,
wherein the third layer comprises boron oxide, magnesium fluoride, calcium fluoride, silicon oxide, or a combination thereof,
wherein the third layer has a thickness between 12 and 20 nm;
a fourth layer formed directly on the third layer,
wherein the fourth layer comprises zinc oxide, doped zinc oxide, tin oxide, or doped tin oxide; and
a fifth layer formed directly on the fourth layer,
wherein the fifth layer comprises silver, gold, or copper and is operable as an infrared reflective layer.
2. The low emissivity panel of claim 1 wherein the first layer has a thickness between 11 and 13 nm, and the second layer has a thickness between 16 and 18 nm.
3. The low emissivity panel of claim 1 wherein the fourth layer comprises zinc oxide.
4. The low emissivity panel of claim 1 further comprising
a barrier layer formed directly on the fifth layer, wherein the barrier layer comprises nickel, titanium, chromium, or a combination thereof.
5. A low emissivity panel, comprising:
a transparent substrate, wherein the transparent substrate comprises glass;
a first layer formed directly on the substrate,
wherein the first layer comprises silicon-zirconium nitride;
a second layer formed directly on the first layer,
wherein the second layer has an index of refraction greater than 2.3,
wherein the second layer comprises titanium oxide, niobium oxide, or bismuth oxide,
wherein the second layer has a thickness between 10 and 15 nm;
a third layer formed directly on the second layer,
wherein the third layer has an index of refraction less than 1.5,
wherein the third layer comprises calcium fluoride,
wherein third layer has a thickness between 12 and 20 nm;
a fourth layer formed directly on the third layer,
wherein the fourth layer comprises zinc oxide, doped zinc oxide, tin oxide, or doped tin oxide; and
a fifth layer formed directly on the fourth layer,
wherein the fifth layer comprises silver, gold, or copper and is operable as an infrared reflective layer.
6. The low emissivity panel of claim 5 wherein the fourth layer has a thickness of 10 nm.
7. The low emissivity panel of claim 5 wherein the second layer comprises bismuth oxide.
8. The low emissivity panel of claim 5 wherein the fourth layer comprises silver.