ELECTROMECHANICAL SYSTEMS HAVING SIDEWALL BEAMS
This disclosure provides systems, methods and apparatus for electromechanical systems having sidewalls beams. In one aspect, a device includes a substrate having a first electrode and a second electrode, and a movable shuttle monolithically integrated with the substrate, and having a first wall, a second wall, and a base. The first and second walls each have a first dimension at least four times larger than a second dimension. The first and second walls define substantially parallel vertical sides of the shuttle, and the base is positioned orthogonally to the first and second walls and forms a horizontal bottom of the shuttle, providing structural support to the first and second walls. The first wall and the first electrode define a first capacitor, and the second wall and the second electrode define a second capacitor.
1 . A device comprising:
a substrate having a first electrode and a second electrode; and
a movable shuttle monolithically integrated with the substrate, and having a first wall, a second wall, and a base,
wherein the first and second walls each have a first dimension at least four times larger than a second dimension,
wherein the first and second walls define substantially parallel vertical sides of the shuttle, and the base is positioned orthogonally to the first and second walls and forms a horizontal bottom of the shuttle, and
wherein the first wall and the first electrode define a first capacitor, and the second wall and the second electrode define a second capacitor.
2 . The device of claim 1 , wherein the base provides structural support to the first and second walls and limits movement of the first and second walls.
3 . The device of claim 1 , wherein
the first wall faces the first electrode in a first direction and the second wall faces the second electrode in a second opposite direction, to provide a differential capacitor sensor.
4 . The device of claim 1 , wherein
the substrate includes an insulator selected from the group comprising at least one of glass, fused silica, an insulating ceramic, and a polymeric insulator.
5 . The device of claim 1 , wherein
the substrate includes a transparent section, and
the movable shuttle includes a microelectromechanical (MEM) shutter element for modulating light passing through the transparent section of the substrate.
6 . The device of claim 1 , wherein
the movable shuttle includes a transducer of a component selected from a group comprising at least one of an accelerometer, a speaker, a microphone, and a pressure sensor.
7 . The device of claim 1 , further comprising a tether beam monolithically integrated with the substrate and configured to hold the movable shuttle relative to the substrate.
8 . The device of claim 1 , further comprising a microelectricalmechanical systems (MEMS) gyroscope array monolithically integrated with the substrate and configured to measure an orientation of the device.
9 . The device of claim 1 , further comprising:
a display;
a processor that is configured to communicate with the display, the processor being configured to process image data; and
a memory device that is configured to communicate with the processor.
10 . The device of claim 9 , further comprising:
a driver circuit configured to send at least one signal to the display; and
a controller configured to send at least a portion of the image data to the driver circuit.
11 . The device of claim 9 , further comprising:
an image source module configured to send the image data to the processor, wherein the
image source module comprises at least one of a receiver, transceiver, and transmitter.
12 . The device of claim 9 , further comprising:
an input device configured to receive input data and to communicate the input data to the processor.
13 . A method of manufacturing an electromechanical device, comprising:
providing a substrate having a first electrode and a second electrode; and
monolithically forming a movable shuttle on the substrate, wherein forming the shuttle includes
forming a first wall and a second wall, each defining a vertical side of the shuttle and each having a first dimension at least four times larger than a second dimension, and
forming a base positioned orthogonally to the first and second walls and defining a horizontal bottom of the shuttle, wherein the first and second walls are coupled to the base to form a corrugated structure,
wherein the first wall and the first electrode define a first capacitor, and the second wall and the second electrode define a second capacitor.
14 . The method of claim 13 , wherein
forming the first wall includes forming the first wall to face the first electrode in a first direction, and
forming the second wall includes forming the second wall to face the second electrode in a second opposite direction,
wherein the method further comprises
configuring the first and the second capacitors to provide a differential capacitor sensor.
15 . The method of claim 13 , wherein monolithically forming the movable shuttle includes providing a MEM shutter element for modulating light passing through a transparent section of the substrate.
16 . The method of claim 13 , wherein monolithically forming the movable shuttle includes providing a transducer of a component selected from a group consisting of an accelerometer, a speaker, a microphone, and a pressure sensor.
17 . The method of claim 13 , further comprising providing a tether beam monolithically integrated with the substrate and configured to hold the movable shuttle relative to the substrate.
18 . The method of claim 13 , wherein providing the substrate includes providing an insulator selected from the group comprising at least one of glass, fused silica, an insulating ceramic, and a polymeric insulator.
19 . A display comprising:
a substrate having a first electrode and a second electrode;
a plurality of microelectromechanical system (MEMS) shutters disposed on the substrate and configured to modulate light; and
a movable shuttle monolithically integrated with the substrate, and having a first wall, a second wall, and a base, wherein the first and second walls each have a first dimension at least four times larger than a second dimension, and wherein the first wall, the second wall, and the base are coupled to substantially define a U-shape, and
wherein the first wall and the first electrode define a first capacitor, and the second wall and the second electrode define a second capacitor.
20 . The display of claim 19 , wherein
the movable shuttle includes a transducer of a component selected from a group comprising at least one of an accelerometer, a speaker, a microphone, a tilt sensor, and a pressure sensor.
21 . The display of claim 19 , wherein
the first and second walls define parallel vertical sides of the shuttle,
the base is positioned orthogonally to the first and second walls, and
the base provides support to the first and second walls and limits movement of the first and second walls.
22 . The display of claim 19 , wherein
the first wall faces the first electrode in a first direction and the second wall faces the second electrode in a second opposite direction, to provide a differential capacitor sensor.
23 . The display of claim 19 , wherein
the substrate includes an insulator selected from the group comprising at least one of glass, fused silica, an insulating ceramic, and a polymeric insulator.
24 . The display of claim 19 , further comprising a tether beam monolithically integrated with the substrate and configured to hold the movable shuttle relative to the substrate.
25 . The display of claim 19 , further comprising a MEMS gyroscope array disposed on the substrate and configured to measure an orientation of the display, the MEMS gyroscope array including at least one gyroscope incorporating the movable shuttle.