Magneto-resistance effect element, and method for manufacturing the same
View Patent ↗A magneto-resistance effect element, including a fixed magnetization layer of which a magnetization is substantially fixed in one direction, a free magnetization layer of which a magnetization is rotated in accordance with an external magnetic field and which is formed opposite to the fixed magnetization layer, a spacer layer including a current confining layer with an insulating layer and a conductor to pass a current through the insulating layer in a thickness direction thereof, a thin film layer, and a functional layer.
1. A magneto-resistance effect element, comprising:
a bottom electrode;
a first fixed magnetization layer formed on or above the bottom electrode, the first fixed magnetization layer having a magnetization substantially fixed in one direction;
a magnetic coupling layer formed on the first fixed magnetization layer;
a second fixed magnetization layer formed on the magnetic coupling layer, the second fixed magnetization layer having a magnetization substantially fixed in one direction;
a free magnetization layer formed opposite to the second fixed magnetization layer, the free magnetization layer having a magnetization rotated in accordance with an external magnetic field;
a spacer layer disposed between the second fixed magnetization layer and the free magnetization layer, the spacer layer including a current confining layer, the current confining layer having an insulating layer and a conductor to pass a current through the insulating layer in a thickness direction thereof, the insulating layer including oxide, nitride or oxynitride;
a functional layer formed in or on the second fixed magnetization layer, the functional layer containing at least one element selected from the group consisting of Si, Mg, B, and Al; and
a top electrode formed on or above the free magnetization layer, the top electrode being configured to pass electric current in combination with the bottom electrode.
2. The magneto-resistance effect element as set forth in claim 1 ,
wherein the functional layer contains Si.
3. The magneto-resistance effect element as set forth in claim 1 ,
wherein a thickness of the functional layer is within 0.1 to 10 nm.
4. The magneto-resistance effect element as set forth in claim 1 ,
wherein the spacer layer includes a metallic layer formed so as to be adjacent to the current confining layer and at least one of the second fixed magnetization layer and the free magnetization layer.
5. The magneto-resistance effect element as set forth in claim 4 ,
wherein the metallic layer includes at least one element selected from the group consisting of Cu, Ag, and Au.
6. The magneto-resistance effect element as set forth in claim 1 ,
wherein the conductor of the current confining layer mainly contains at least one element selected from the group consisting of Cu, Ag, and Au.
7. The magneto-resistance effect element as set forth in claim 1 ,
wherein at least one of the second fixed magnetization layer and/or the free magnetization layer contains Fe.
8. The magneto-resistance effect element as set forth in claim 7 ,
wherein an Fe composition in a region of the second fixed magnetization layer and/or the free magnetization layer remote from the spacer layer by 1 nm or less is set to 10% or more.
9. The magneto-resistance effect element as set forth in claim 7 ,
wherein an Fe composition in a region of the second fixed magnetization layer and/or the free magnetization layer remote from the spacer layer by 1 nm or less is set to 40% or more.
10. A magnetic head, comprising a magneto-resistance effect element as set forth in claim 1 .
11. A magnetic recording/reproducing device, comprising the magnetic head as set forth in claim 10 and a magnetic recording medium.
12. A magnetic memory, comprising a magneto-resistance effect element as set forth in claim 1 .
13. A magneto-resistance effect element, comprising:
a bottom electrode;
a first fixed magnetization layer formed on or above the bottom electrode, the first fixed magnetization layer having a magnetization substantially fixed in one direction;
a magnetic coupling layer formed on the first fixed magnetization layer;
a second fixed magnetization layer formed on the magnetic coupling layer, the second fixed magnetization layer having a magnetization substantially fixed in one direction;
a spacer layer including a first metallic layer, a current confining layer, and a second metallic layer subsequently stacked therein on the second fixed magnetization layer,
the first metallic layer containing at least one element selected from the group consisting of Cu, Ag, and Au,
the current confining layer having an insulating layer and a conductor to pass a current through the insulating layer in a thickness direction thereof, the insulating layer including oxide, nitride or oxynitride, the conductor containing at least one element selected from the group consisting of Cu, Al, and Au,
the second metallic layer containing at least one element selected from the group consisting of Cu, Ag, and Au;
a free magnetization layer formed on the spacer layer, the free magnetization layer having a magnetization rotated in accordance with an external magnetic field;
a functional layer formed in or on the second fixed magnetization layer, the functional layer containing at least one element selected from the group consisting of Si, Mg, B, and Al; and
a top electrode formed on or above the free magnetization layer, the top electrode being configured to pass electric current in combination with the bottom electrode,
wherein an Fe composition in a region of the second fixed magnetization layer and/or the free magnetization layer remote from the spacer layer by 1 nm or less is set to 10% or more.
14. The magneto-resistance effect element as set forth in claim 13 ,
wherein the Fe composition in the region of the second fixed magnetization layer and/or the free magnetization layer remote from the spacer layer by 1 nm or less is set to 40% or more.
15. A magneto-resistance effect element, comprising:
a bottom electrode;
a first fixed magnetization layer formed on or above the bottom electrode, the first fixed magnetization having a magnetization substantially fixed in one direction;
a magnetic coupling layer formed on the first fixed magnetization layer;
a second fixed magnetization layer formed on the magnetic coupling layer, the second fixed magnetization layer having a magnetization substantially fixed in one direction;
a free magnetization layer formed opposite to the second fixed magnetization layer, the free magnetization layer having a magnetization rotated in accordance with an external magnetic field;
an insulating spacer layer disposed between the second fixed magnetization layer and the free magnetization layer, the insulating spacer layer passing a tunnel current therethrough;
a functional layer formed in or on the second fixed magnetization layer, the functional layer containing at least one element selected from the group consisting of Si, Mg, B, and Al; and
a top electrode formed on or above the free magnetization layer, the top electrode being configured to pass electric current in combination with the bottom electrode.
16. The magneto-resistance effect element as set forth in claim 15 ,
wherein a thickness of the functional layer is within 0.1 to 10 nm.
17. The magneto-resistance effect element as set forth in claim 16 ,
wherein at least one of the second fixed magnetization layer and/or the free magnetization layer contains Fe.
18. The magneto-resistance effect element as set forth in claim 17 ,
wherein an Fe composition in a region of the second fixed magnetization layer and/or the free magnetization layer remote from the spacer layer by 1 nm or less is set to 10% or more.
19. The magneto-resistance effect element as set forth in claim 17 ,
wherein an Fe composition in a region of the second fixed magnetization layer and/or the free magnetization layer remote from the spacer layer by 1 nm or less is set to 40% or more.