Doped piezoelectric resonator
Mechanical resonators including doped piezoelectric active layers are described. The piezoelectric active layer(s) of the mechanical resonator may be doped with a dopant type and concentration suitable to increase the electromechanical coupling coefficient of the active layer. The increase in electromechanical coupling coefficient may all for improved performance and smaller size mechanical resonators than feasible without using the doping.
1. A device, comprising:
a piezoelectric resonator comprising a piezoelectric active layer formed of a first material and configured to vibrate in response to an actuation signal, wherein the piezoelectric active layer comprises a dopant having a concentration between approximately 15% and 35% in the first material and configured to increase a piezoelectric coupling coefficient of the piezoelectric active layer; and
a circuit coupled to the piezoelectric resonator, the circuit having an impedance, wherein the piezoelectric resonator has a motional resistance approximately matching the impedance of the circuit.
2. The device of claim 1 , wherein the dopant is Scandium.
3. The device of claim 1 , wherein the first material is Aluminum Nitride (AlN).
4. The device of claim 1 , wherein the circuit is an oscillator circuit, and wherein the piezoelectric resonator is configured to provide a frequency reference signal for the oscillator circuit.
5. The device of claim 1 , wherein the device forms at least part of a frequency filter.
6. The device of claim 1 , wherein the device forms at least part of a duplexer.
7. The device of claim 1 , further comprising at least one electrode configured to tune a resonance frequency of the piezoelectric resonator.
8. The device of claim 1 , further comprising a multi-layer temperature compensation structure coupled to the piezoelectric active layer.
9. The device of claim 8 , wherein the temperature compensation structure comprises at least one layer with positive temperature coefficient of frequency (TCF).
10. The device of claim 9 , wherein the temperature compensation structure also comprises at least one layer with negative TCF.
11. The device of claim 10 , wherein the temperature compensation structure comprises one layer with negative TCF sandwiched between two layers with positive TCF.
12. The device of claim 11 , wherein a layer with positive TCF of the temperature compensation structure is formed of silicon dioxide.
13. The device of claim 11 , wherein the at least one layer with negative TCF is silicon.
14. The device of claim 1 , wherein the dopant is configured to change a resonance frequency of at least one resonance mode of the piezoelectric resonator.
15. The device of claim 14 , wherein the dopant is used to tune the resonance frequency.
16. The device of claim 1 , wherein the piezoelectric resonator comprises multiple layers in a stack configuration.
17. The device of claim 16 , wherein the stack configuration contains at least one layer having a temperature coefficient of frequency with a sign opposite to that of the piezoelectric active layer.
18. The device of claim 1 , wherein the piezoelectric resonator is a piezoelectric lamb wave resonator configured to support lamb waves.