Optical isolator capable of creating a large buffer area for optical beams and methods of manufacturing and using the same
View Patent ↗An optical isolator capable of creating a larger safe buffer area for optical beam(s) and a manufacturing method thereof are disclosed. The optical isolator includes a sandwich type wafer, a first polarizer, a Faraday rotator and a second polarizer. The first polarizer works as the incident plane of the FSI (free space isolator), while the second polarizer works as the outgoing plane of the FSI. The direction in which the second polarizer passes the polarized beam is at a 45° angle with respect to the first polarizer. The manufacturing method includes marking the edge of the second polarizer. FSIs processed by this method provide a larger buffer area for the optical beam(s) and/or a lower manufacturing cost, even though the size of the FSI is unchanged.
1. An optical isolator, comprising:
a) a sandwich-type optical wafer, comprising:
i) a first polarizer that functions as an incident plane to an optical beam;
ii) a Faraday rotator; and
iii) a second polarizer that functions as an outgoing plane to the optical beam, wherein the second polarizer has an edge with a mark thereon and an area smaller than that of the first polarizer, and the mark is a part removed from an edge of the second polarizer, and one side of the edge of the second polarizer flanks or is aligned with the Faraday rotator; and
b) a magnet adjacent to an edge of the sandwich-type optical wafer.
2. The optical isolator of claim 1 , wherein the first polarizer has a larger buffer area for an incoming optical beam than an otherwise identical optical isolator with an identical mark on the first polarizer, and the buffer area is an area including edges of the first polarizer outside an area of the incident beam.
3. The optical isolator of claim 1 , wherein the first polarizer passes the optical beam to the Faraday isolator at a first polarization angle, and the second polarizer passes the optical beam through at a 45° angle with respect to the first polarization angle.
4. The optical isolator of claim 3 , wherein the first polarizer is a 0-degree polarizer, while the second polarizer is a 45-degree polarizer.
5. The optical isolator of claim 3 , wherein the first polarizer is a 45-degree polarizer, while the second polarizer is a 0-degree polarizer.
6. The optical isolator of claim 1 , wherein the area of the second polarizer is smaller than that of the Faraday rotator.
7. The optical isolator of claim 1 , wherein the second polarizer has a smaller area than the first polarizer.
8. The optical isolator of claim 7 , wherein the area of the second polarizer differs from an area of the first polarizer by an area of the mark.
9. The optical isolator of claim 1 , wherein the part removed from the edge of the second polarizer is in a buffer area of the second polarizer.
10. The optical isolator of claim 9 , wherein the part removed from the edge of the second polarizer is removed from the edge of the optical isolator adjacent to the magnet.
11. The optical isolator of claim 1 , further comprising a laser providing the optical beam, and a condenser lens between the laser and the sandwich-type optical wafer.
12. A method of manufacturing an optical isolator, comprising:
a) marking a second polarizer in a manner reducing a peripheral area of the second polarizer;
b) adhering, mounting, affixing, stacking or otherwise placing (i) a first polarizer onto a first surface of a Faraday rotator and (ii) the second polarizer onto a second surface of the Faraday rotator opposite to the first surface of the Faraday rotator; and
c) mounting the first polarizer, the Faraday rotator, and the second polarizer in a free space isolator between opposed isolator plates so that the incident optical beam(s) pass through the first polarizer, the Faraday rotator, and the second polarizer in sequence.
13. The method according to claim 12 , wherein the first polarizer functions as an incident plane of the optical isolator.
14. The method according to claim 12 , wherein the second polarizer functions as an outgoing plane of the optical isolator.
15. The method according to claim 12 , wherein the second polarizer passes a polarized beam through at a 45° angle with respect to an angle through which the first polarizer passes an incident beam.
16. The method according to claim 12 , having a larger buffer area for an incoming optical beam than an otherwise identical optical isolator with an identical mark on the first polarizer.
17. The method according to claim 12 , wherein the first polarizer is a 0-degree polarizer, and the second polarizer is a 45-degree polarizer.
18. The method according to claim 12 , wherein the first polarizer is a 45-degree polarizer, and the second polarizer is a 0-degree polarizer.
19. The method according to claim 12 , wherein the mark is made on an upper edge or a lower edge of the second polarizer.
20. The method according to claim 12 , wherein the second polarizer has a smaller area than the first polarizer.