Semiconductor integrated circuit with thick gate oxide word line driving circuit
A semiconductor integrated circuit according to one aspect of the present invention may includes a plurality of driving circuits to drive a respective plurality of word lines with either a first voltage supplied from a first power supply or a second voltage supplied from a second power supply in accordance with a control signal, and a plurality of gate transistors in each of which a gate is connected to one of the plurality of word lines, and a connection state between a storage node and a bit line is changed based on the voltage provided to the word line connected to the gate. In the semiconductor integrated circuit, a gate oxide film of each of the plurality of gate transistors is thinner than a gate oxide film of each of transistors constituting the plurality of driving circuits.
1. A semiconductor integrated circuit, comprising:
a memory cell that includes a gate transistor;
a word line that is connected to a gate of the gate transistor;
a bit line that is connected to the memory cell; and
a driving circuit that drives the word line, and includes a transistor that has a gate oxide film thicker than a gate oxide film of the gate transistor,
wherein a range of voltage between the gate and back-gate of the gate transistor is larger than a voltage range of the bit line.
2. The semiconductor integrated circuit according to claim 1 , wherein a voltage difference between the gate and back-gate of the gate transistor in read mode is larger than the voltage range of the bit line.
3. The semiconductor integrated circuit according to claim 1 , further comprises:
a control circuit that controls writing data to the memory cell or reading data from the memory cell,
wherein the range of voltage between the gate and back-gate of the gate transistor is larger than a range of voltage between a power supply voltage and a ground voltage supplied to the control circuit.
4. The semiconductor integrated circuit according to claim 3 , wherein a gate oxide film of a transistor constituting the control circuit is thinner than the gate oxide film of the gate transistor.
5. The semiconductor integrated circuit according to claim 3 , wherein the driving circuit drives the word line with either a first voltage or a second voltage in accordance with a control signal, a voltage difference between the first and second voltages is larger than a voltage difference between the power supply voltage and the ground voltage supplied to the control circuit.
6. The semiconductor integrated circuit according to claim 5 , wherein either of the first and second voltages being higher is higher than the power supply voltage of the control circuit.
7. The semiconductor integrated circuit according to claim 5 , wherein either of the first and second voltages being lower is lower than the ground voltage of the control circuit.
8. The semiconductor integrated circuit according to claim 3 , wherein the gate oxide film of the gate transistor has substantially the same thickness as a gate oxide film of a transistor constituting the control circuit.
9. The semiconductor integrated circuit according to claim 8 , wherein the voltage range of the bit line has substantially the same as the range of voltage between a power supply voltage and a ground voltage supplied to the control circuit.