Plasmon resonance based strain gauge

1. A strain gauge comprising:

a medium that is deformable; and

a plurality of discrete plasmon supporting structures arranged with the medium to create one or more plasmon resonances that change with deformation of the medium so that a color of light scattered from the strain gauge visibly changes with the deformation of the medium.

2. The strain gauge of claim 1 , wherein the medium is a surface of or is attached to a surface of an object that is subject to strain to be observed.

3. The strain gauge of claim 1 , wherein the discrete plasmon supporting structures include:

a plurality of discrete plasmon supporting structures that have a first size; and

a plurality of discrete plasmon supporting structures that have a second size that is larger than the first size.

4. The strain gauge of claim 1 , wherein the plasmon supporting structures comprise a conductive material and provide the strain gauge with a measurable electrical resistance that depends on deformation of the medium.

5. The strain gauge of claim 1 , wherein the discrete plasmon supporting structures are arranged in a hierarchical array that provides multiple spacing length scales including a spacing length scale less than 50 nm.

6. A strain gauge comprising:

a medium that is deformable; and

a plurality of discrete plasmon supporting structures arranged with the medium to create one or more plasmon resonances that change with deformation of the medium and provide the strain gauge with an optical characteristic that depends on the deformation of the medium, wherein the discrete plasmon supporting structures are arranged to form a hierarchical structure that includes:

a plurality of first assemblies of the discrete plasmon supporting structures, wherein the plasmon supporting structures have first separations within the first assemblies; and

one or more second assemblies containing the first assemblies, wherein the first assemblies have second separations within the one or more second assemblies.

7. The strain gauge of claim 6 , wherein:

a first of the one or more plasmon resonance that has a first optical characteristic that depends on the first separations; and

a second of the one or more plasmon resonances has a second optical characteristic that depends on the second separations.

8. The strain gauge of claim 6 , wherein the one or more second assemblies comprises a plurality of the second assembles arranged in an array with third separations, wherein:

the first separations are less than about 50 nm;

the second separations are more than 100 nm; and

the third separations are larger than the second separations and cause a diffraction pattern that depends on deformation of the medium.

9. The strain gauge of claim 7 , wherein each of the first optical characteristic and the second optical characteristic is selected from a group consisting of a frequency, an amplitude, and a width of a feature that the one or more plasmon resonances create in a spectral distribution of light scattered from the strain gauge.

10. The strain gauge of claim 6 , further comprising a lighting system that is controllable to switch between illuminating the discrete plasmon supporting structures with light having a first polarization corresponding to a first symmetry axis of an arrangement of the discrete plasmon supporting structures and illuminating the discrete plasmon supporting structures with light having a second polarization corresponding to a second symmetry axis of the arrangement of the discrete plasmon supporting structures.

11. The strain gauge of claim 6 , further comprising:

an optical sensor; and

a controller coupled to the optical sensor and configured to derive a measurement result from measurements that the optical sensor provides of output light from the discrete plasmon supporting structures.

12. The strain gauge of claim 11 , wherein the optical sensor is operable to separately measure light having first and second polarizations, wherein the first polarization corresponds to a first symmetry axis of an arrangement of the discrete plasmon supporting structures and the second polarization corresponds to a second symmetry axis of the arrangement of the discrete plasmon supporting structures.

13. A strain gauge comprising:

a medium that is deformable; and

a plurality of discrete plasmon supporting structures arranged with the medium to create one or more plasmon resonances that change with deformation of the medium and provide the strain gauge with an optical characteristic that depends on the deformation of the medium, wherein the plasmon supporting structures comprise a ferromagnetic material and provide the strain gauge with a measurable magnetic characteristic that depends on deformation of the medium.

14. The strain gauge of claim 13 , further comprising:

an optical sensor;

a magnetic sensor; and

a controller to derive a measurement result using a measurement of the optical characteristic from the optical sensor and a measurement of the magnetic characteristic from the magnetic sensor.

15. A measuring method comprising:

providing a plurality of discrete plasmon supporting structures on an object and arranged to create a plasmon resonance that depends on deformation of the object; and

observing, with a naked eye, a change in an optical characteristic of the object to detect a deformation of the object, wherein the optical characteristic observed is caused by the plasmon resonance.

16. The method of claim 15 , wherein observing the change in the optical characteristic comprises visually observing a change in color of light scattered from the object.

17. A measuring method comprising:

providing a plurality of discrete plasmon supporting structures on an object and arranged to create a plasmon resonance that depends on deformation of the object;

observing a change in optical characteristics of the object to detect a deformation of the object, wherein the optical characteristic observed is caused by the plasmon resonance;

measuring a secondary characteristic that the discrete plasmon supporting structures provide across an area of the object, wherein the secondary characteristic is one of an electrical resistance and a magnetic characteristic; and

using the secondary characteristic measured in determination of the deformation of the object.

18. The method of claim 17 , wherein observing the change comprises measuring and analyzing a spectral content of light reflected from the plasmon supporting structures.