Mask for near-field lithography and fabrication the same

1. A method for forming a nanopatterned cylindrical photomask, comprising:

forming a master pattern on a master substrate, wherein the master pattern includes nanometer scale features;

forming a layer of an elastomer material on a surface of a transparent cylinder;

transferring the master pattern from the master to the layer of elastomer material on the surface of the cylinder.

2. The method of claim 1 , wherein the master substrate is a flat rigid substrate.

3. The method of claim 1 , wherein the master substrate is made of a flexible material.

4. The method of claim 1 wherein transferring the master pattern from the master to the layer of elastomer material on the surface of the cylinder includes “plate-to-cylinder” nanoimprint lithography, optical lithography in a standard contact or near-field configurations, bond detach or decal transfer lithography, micro-contact printing, nanotransfer printing, and scanning beam interference lithography.

5. The method of claim 1 , wherein transferring the master pattern from the master to the layer of elastomer material on the surface of the cylinder includes continuously rotating the cylinder during a lithography process that uses the master as a lithography mask.

6. The method of claim 1 , wherein transferring the master pattern from the master to the layer of elastomer material on the surface of the cylinder includes or “step-and-rotate” mode in which lithography is done one section of cylinder at a time with a subsequent rotational step between lithographic processes.

7. The method of claim 1 , wherein transferring the master pattern from the master to the layer of elastomer material on the surface of the cylinder includes a nanoimprint lithography technique in a “plate-to-cylinder” configuration.

8. The method of claim 7 wherein the nanoimprint lithography technique includes contacting the cylinder with a nanostructured substrate master having a relief profile to imprint the relief profile into the elastomer material on the surface of the cylinder.

9. The method of claim 8 , further comprising curing an imprinted part of the elastomer material on the surface of the cylinder.

10. The method of claim 1 , wherein transferring the master pattern from the master to the layer of elastomer material on the surface of the cylinder includes using contact optical lithography.

11. The method of claim 1 , wherein transferring the master pattern from the master to the layer of elastomer material on the surface of the cylinder includes using a bond-detach lithography technique.

12. The method of claim 11 , wherein the bond-detach lithography technique includes forming the master pattern in a metal layer on a substrate having an oxide layer deposited or grown on it, activating the elastomer and the oxide layer by exposure to plasma, UV, ozone, or corona discharge, contacting exposed portions of the activated oxide layer and activated elastomer such that they bond together while metal coated portions of the oxide layer do not, and rotating the cylinder to pull bonded portions of the elastomer from the cylinder.

13. A method for forming a nanopatterned cylindrical photomask, comprising:

forming a pattern on an elastomer substrate, wherein the pattern includes nanometer scale features;

laminating the patterned elastomer substrate to a surface of a cylinder.

14. The method of claim 13 , wherein the nanopatterned elastomer is made slightly longer than a circumference of the cylinder so that the film slightly overlaps itself at its ends when attached to the cylinder.

15. The method of claim 13 , further comprising filling a seam between ends of the elastomer film on the cylinder with the pattern.

16. The method of claim 13 , wherein the elastomer film is coated with a thin metallic coating and the nanostructure pattern is formed in the metallic coating, wherein the elastomer is attached to the cylinder such that the elastomer is between the cylinder and the nanostructure pattern formed in the metallic coating, whereby the photomask is a plasmonic mask.

17. The method of claim 13 , wherein the elastomer film includes two or more layers.

18. The method of claim 17 , wherein the two or more layers include a relatively thick and soft first layer and a relatively thin and stiff second layer, wherein the first layer is between the first and second layers are laminated to the surface of the cylinder such that the first layer is between the surface of the cylinder and the second layer, wherein the nanostructure pattern is formed in the second layer.

19. The method of claim 13 , wherein forming the pattern on the elastomer substrate includes forming a small master having a pattern corresponding to a portion of the pattern to be formed on the elastomer substrate, transferring the pattern on the small onto one or more submasters, using the submaster as a mold to imprint the pattern onto the elastomer substrate.

20. The method of claim 19 , wherein patterning the submaster(s) is done by stamp-and-step method.

21. The method of claim 20 , wherein a size of the submaster is chosen to be slightly larger than a step between fields, so that a small overlap in patterns provides a continuous gap-free pattern on the elastomer substrate.

22. The method of claim 13 , wherein forming the pattern on the elastomer substrate includes using interference lithography to pattern an elastomer sheet and generating a secondary replica the material used to form the elastomer substrate.