IP Library Granted Patent US 9,174,433
Granted Patent B2
US 9,174,433 · App. 13/774,683 · Granted Nov 3, 2015

Method and apparatus for load-locked printing

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Quick Facts
Patent No.
US 9,174,433
App. No.
13/774,683
Granted
Nov 3, 2015
Kind
B2
Abstract

The disclosure relates to a method and apparatus for preventing oxidation or contamination during a circuit printing operation. The circuit printing operation can be directed to OLED-type printing. In an exemplary embodiment, the printing process is conducted at a load-locked printer housing having one or more of chambers. Each chamber is partitioned from the other chambers by physical gates or fluidic curtains. A controller coordinates transportation of a substrate through the system and purges the system by timely opening appropriate gates. The controller may also control the printing operation by energizing the print-head at a time when the substrate is positioned substantially thereunder.

Claims (51)

1. A method for depositing an organic material on a substrate, the method comprising the steps of:

receiving the substrate at an inlet chamber;

sealing the inlet chamber;

providing the inlet chamber with a substantially nitrogen environment;

floating the substrate using a gas bearing;

directing at least a portion of the substrate to a print-head chamber and, while floating the substrate using a combination of pressure and vacuum, discharging a quantity of the organic material from a discharge nozzle onto the portion of the substrate;

directing the substrate to an outlet chamber;

partitioning the print-head chamber from the outlet chamber; and

unloading the substrate from the outlet chamber.

2. The method of claim 1 , further comprising executing at least one intermediate processing step on the substrate before directing at least a portion of the substrate to the print-head chamber.

3. The method of claim 2 , wherein said at least one intermediate processing step comprises registering the substrate relative to a print-head of the print-head chamber.

4. The method of claim 1 , wherein a conveying mechanism is used to carry out said step of directing the substrate.

5. The method of claim 1 , wherein said discharging step forms a patterned film on the substrate.

6. A method for depositing an organic material on a substrate, the method comprising the steps of:

receiving the substrate at an inlet chamber;

sealing the inlet chamber;

providing the inlet chamber with a substantially chamber-gas environment, the chamber gas being substantially inert to the organic material;

floating the substrate using a gas bearing;

directing at least a portion of the substrate to a print-head chamber and, while floating the substrate using a combination of pressure and vacuum, discharging a quantity of the organic material from a discharge nozzle onto the portion of the substrate, forming a patterned film thereon;

directing the substrate to an outlet chamber; and,

unloading the substrate from the outlet chamber.

7. The method of claim 6 , wherein said chamber gas comprises a substantially pure gas selected from the group consisting of clean dry air, nitrogen, argon, hydrogen, helium, or any combination of the foregoing.

8. The method of claim 6 , further comprising executing at least one intermediate processing step on the substrate before directing at least a portion of the substrate to the print-head chamber.

9. The method of claim 8 , wherein said at least one intermediate processing step comprises registering the substrate relative to a print-head of the print-head chamber.

10. The method of claim 6 , wherein a conveying mechanism is used to carry out said step of directing the substrate.

11. A method for depositing an organic material on a substrate, the method comprising the steps of:

receiving the substrate at an inlet chamber;

sealing the inlet chamber;

providing the inlet chamber with a substantially inert-gas environment;

floating the substrate using a gas bearing;

directing at least a portion of the substrate to a print-head chamber and, while floating the substrate using a combination of pressure and vacuum, discharging a quantity of the organic material from a discharge nozzle onto the portion of the substrate, forming a patterned film thereon;

directing the substrate to an outlet chamber; and,

unloading the substrate from the outlet chamber.

12. The method of claim 11 , further comprising executing at least one intermediate processing step on the substrate before directing at least a portion of the substrate to the print-head chamber.

13. The method of claim 12 , wherein said at least one intermediate processing step comprises registering the substrate relative to a print-head of the print-head chamber.

14. The method of claim 11 , wherein a conveying mechanism is used to carry out said step of directing the substrate.

15. The method of claim 11 , wherein said substantially inert-gas environment is comprised of nitrogen.

16. A method for depositing an organic material on a substrate, the method comprising the steps of:

providing a housing comprising a plurality of chambers, including a first chamber, a second chamber, and a print-head chamber;

introducing the substrate into the housing;

providing at least one of the chambers with a substantially non-oxidizing environment;

floating the substrate in at least one of the chambers using a gas bearing;

directing at least a portion of the substrate to the print-head chamber and, while floating the substrate using a combination of pressure and vacuum, discharging a quantity of the organic material from a discharge nozzle onto the portion of the substrate;

directing the substrate away from the print-head chamber;

partitioning the print-head chamber from at least one of the other chambers; and

removing the substrate from the housing.

17. The method of claim 16 , further comprising executing at least one intermediate processing step on the substrate before directing at least a portion of the substrate to the print-head chamber.

18. The method of claim 17 , wherein said at least one intermediate processing step comprises registering the substrate relative to a print-head of the print-head chamber.

19. The method of claim 16 , wherein, during said discharging step, said partitioning step isolates the environments of the print-head chamber and the first chamber from each other.

20. The method of claim 16 , wherein a conveying mechanism is used to carry out said step of directing the substrate.

21. The method of claim 16 , wherein said discharging step forms a patterned film on the substrate.

Assignments (7)
SECURITY INTEREST Recorded Apr 19, 2022
From: KATEEVA CAYMAN HOLDING, INC.
To: HB SOLUTION CO., LTD.
Reel/Frame 059727/0111 →
SECURITY INTEREST Recorded Mar 17, 2022
From: KATEEVA, INC.; KATEEVA CAYMAN HOLDING, INC.
To: SINO XIN JI LIMITED
Reel/Frame 059382/0053 →
SECURITY AGREEMENT Recorded Jan 23, 2020
From: KATEEVA, INC.
To: SINO XIN JI LIMITED
Reel/Frame 051682/0212 →
RELEASE OF SECURITY INTEREST Recorded Jan 22, 2020
From: EAST WEST BANK, A CALIFORNIA BANKING CORPORATION
To: KATEEVA, INC.
Reel/Frame 051664/0802 →
SECURITY INTEREST Recorded Apr 4, 2019
From: KATEEVA, INC.
To: EAST WEST BANK
Reel/Frame 048806/0639 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 14, 2015
From: MADIGAN, CONOR
To: KATEEVA, INC.
Reel/Frame 036329/0099 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 4, 2013
From: SOMEKH, SASS; VRONSKY, ELIYAHU
To: KATEEVA, INC.
Reel/Frame 030148/0639 →