Low molecular weight carbosilanes, precursors thereof, and methods of preparation
View Patent ↗A series of silicon compounds are provided, which are excellent precursors to small carbosilanes, such as 1,3,5-trisilapentane, 2,4,6-trisilaheptane, tris(silylmethyl)silane and tetrakis(silylmethyl)silane. A method of preparing a carbosilane involves forming a Grignard, lithium, or metallic reagent from a halomethyltrialkoxysilane, reacting the Grignard, lithium, or metallic reagent with a dihalodihydridosilane, a trihalohydridosilane, a tetrahalosilane, a dialkoxydihydridosilane, a trialkoxyhydridosilane, or a tetraalkoxysilane to yield a carbosilane precursor, and reducing the precursor to form the carbosilane.
1. A carbosilane having formula (IX):
wherein X 1 and X 2 are each independently selected from the group consisting of hydrogen, methyl, and CH 2 SiR, wherein R is H 3 or H 2 CH 3 , and wherein X 3 is CH 2 SiH 3 .
2. The carbosilane according to claim 1 , wherein X 1 =X 2 =CH 2 SiH 3 and the carbosilane has formula (XII):
3. The carbosilane according to claim 1 , wherein X 1 =X 2 =H and the carbosilane has formula (VI):
4. The carbosilane according to claim 1 , wherein X 1 =H, X 2 =CH 2 SiH 3 and the carbosilane has formula (VII):
5. The carbosilane according to claim 1 , wherein X 1 =H, X 2 =CH 3 and the carbosilane has formula (VIII):
6. A carbosilane having formula (XI):
7. A silicon compound having formula (II):
wherein R 1 , R 4 and R 11 are linear or branched alkoxy groups having one to about eight carbon atoms, R 2 , R 3 , R 5 , R 6 , R 9 , and R 12 are each independently selected from the group consisting of isopropyl, isobutyl, and tert-butyl groups, and R 10 is selected from the group consisting of hydrogen, chlorine, bromine, methoxy, and ethoxy groups.
8. The silicon compound according to claim 7 , wherein R 1 , R 4 and R 11 are isopropoxy groups, R 2 , R 3 , R 5 , R 6 , R 9 , and R 12 are each independently selected from the group consisting of isopropyl, isobutyl, and tert-butyl groups, and R 10 is selected from the group consisting of hydrogen, chlorine, bromine, methoxy, and ethoxy groups.
9. The silicon compound according to claim 8 , wherein R 2 , R 3 , R 5 , R 6 , R 9 , and R 12 are isopropyl groups.
10. The silicon compound according to claim 7 , wherein R 1 , R 4 and R 11 are isobutoxy groups, R 2 , R 3 , R 5 , R 6 , R 9 , and R 12 are each independently selected from the group consisting of isopropyl, isobutyl, and tert-butyl groups, and R 10 is selected from the group consisting of hydrogen, chlorine, bromine, methoxy, and ethoxy groups.
11. The silicon compound according to claim 7 , wherein R 1 , R 4 and R 11 are methoxy groups, R 2 , R 3 , R 5 , R 6 , R 9 , and R 12 are each independently selected from the group consisting of isopropyl, isobutyl, and tert-butyl groups, and R 10 is selected from the group consisting of hydrogen, chlorine, bromine, methoxy, and ethoxy groups.
12. The silicon compound according to claim 7 , wherein R 1 , R 4 and R 11 are ethoxy groups, R 2 , R 3 , R 5 , R 6 , R 9 , and R 12 are each independently selected from the group consisting of isopropyl, isobutyl, and tert-butyl groups, and R 10 is selected from the group consisting of hydrogen, chlorine, bromine, methoxy, and ethoxy groups.