Cleaning liquid for semiconductor device substrates and method of cleaning substrate for semiconductor devices

1. A cleaning liquid, comprising components (A) to (D):

(A) at least one of a polycarboxylic acid and a hydroxycarboxylic acid;

(B) a sulfonic acid type anionic surfactant;

(C) a carboxylic acid type anionic surfactant; and

(D) water;

wherein:

component (C) is a compound of formula (1) or a salt thereof:

R—O-(AO) m —(CH 2 ) n —COOH  (1)

R is a linear or branched alkyl group having 5 to 20 carbon atoms;

AO is at least one of an oxyethylene group and an oxypropylene group;

m is 3 to 30; and

n is 1 to 6.

2. The cleaning liquid according to claim 1 , wherein component (A) is a compound that has two or more carboxyl groups and one or more hydroxy groups.

3. The cleaning liquid according to claim 1 , wherein component (A) is a compound having 2 to 10 carbon atoms.

4. The cleaning liquid according to claim 1 , wherein component (A) is at least one member selected from the group consisting of citric acid, tartaric acid, malic acid, and lactic acid.

5. The cleaning liquid according to claim 1 , wherein component (B) is at least one member selected from the group consisting of an alkylsulfonic acid, a salt of an alkylsulfonic acid, an alkylbenzenesulfonic acid, a salt of an alkylbenzenesulfonic acid, an alkyldiphenyl ether disulfonic acid, a salt of an alkyldiphenyl ether disulfonic acid, an alkylmethyltauric acid, a salt of an alkylmethyltauric acid, a sulfosuccinic acid diester, and a salt of a sulfosuccinic acid diester.

6. The cleaning liquid according to claim 1 , wherein:

a content of component (A) is 5 to 30% by mass;

a content of component (B) is 0.01 to 10% by mass; and

a content of component (C) is 0.01 to 10% by mass.

7. The cleaning liquid according to claim 1 , wherein:

a content of component (A) is 0.03 to 3% by mass;

a content of component (B) is 0.0001 to 1% by mass; and

a content of component (C) is 0.0001 to 1% by mass.

8. The cleaning liquid according to claim 1 , wherein a mass ratio of component (B) to component (C) [component (B)/component (C)] is in a range of 1/15 to 1.5/1.

9. The cleaning liquid according to claim 1 , wherein, when colloidal silica having a primary-particle diameter of 80 nm is added to the cleaning liquid and the cleaning liquid is diluted to a water/cleaning liquid ratio of 40 by mass, the cleaning liquid has a zeta potential of −30 my or lower.

10. A method of cleaning a substrate for a semiconductor device, comprising:

applying the cleaning liquid according to claim 1 to the substrate.

11. The method of cleaning a substrate for a semiconductor device according to claim 10 , wherein:

the substrate comprises Cu wiring and a low-dielectric constant insulating film on a substrate surface; and

the substrate is a substrate that has been subjected to chemical mechanical polishing.

12. The cleaning liquid according to claim 1 , wherein the compound of general formula (1) is a polyoxyethylene alkyl ether acetic acid.