IP Library Granted Patent US 8,731,366
Granted Patent B2
US 8,731,366 · App. 13/797,908 · Granted May 20, 2014

D1451 radiation curable supercoatings for single mode optical fiber

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Quick Facts
Patent No.
US 8,731,366
App. No.
13/797,908
Granted
May 20, 2014
Kind
B2
Abstract

The first aspect of the instant claimed invention is a method of formulating radiation curable Supercoatings for application to an optical fiber used in a telecommunications network. A Multi-layer Film Drawdown Method useful in the Method of formulating radiation curable Supercoatings is also described and claimed. Single mode Optical fibers coated with specific radiation curable Supercoatings are also described and claimed.

Claims (97)

1. A method of making a single-mode optical fiber that has a primary coating layer that is in contact with the outer surface of the optical fiber and a secondary coating layer that is in contact with the outer surface of the primary coating layer, the method comprising the steps of:

forming the primary coating layer by curing a composition selected from the group of formula compositions wherein the composition of the Primary Coating layer, prior to curing, is obtained by curing a composition selected from the group consisting of formulations compositions (i), (ii), (iii), (iv), (v) and (vi); wherein said formulations compositions (i), (ii), (iii), (iv), (v) and (vi) are defined as follows:

(i) 58.50 wt. % of an oligomer prepared by reaction of: 51.68 wt. % of polypropylene glycol, MW=4200, 0.09 wt. % of 2,6-di-tert-butyl-p-cresol, 4.76 wt. % of isophorone diisocyanate, 0.03 wt. % of dibutyl tin dilaurate, and 1.94 wt. % of 2-hydroxyethyl acrylate;

1.50 wt. % of bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide;

0.60 wt. % of hindered phenol antioxidant;

0.10 wt. % of bis(1-octyloxy-2,2,6,6-tetramethyl-4-piperidyl)sebacate;

34.05 wt. % of ethoxylated nonyl phenol acrylate;

1.00 wt. % of bisphenol A ethoxylated diacrylate;

3.00 wt. % of 2-phenoxyethyl acrylate;

0.75 wt. % of trimethylolpropane tri(3-mercaptopropionate);

and 0.50 wt. % of y-mercaptopropyltrimethoxysilane;

(ii) 50.01 wt. % of an oligomer prepared by reaction of: 45.78 wt. % of polypropylene glycol, MW=4200, 0.01 wt. % of acrylic acid, 99%, 0.04 wt. % of 2,6-di-tert-butyl-4-methylphenol, 2.92 wt. % of monomeric toluene diisocyanate, and 1.24 wt. % of 2-hydroxyethyl acrylate;

0.50 wt. % of hindered phenol antioxidant;

46.29 wt. % of ethoxylated (4) nonyl phenol acrylate, MW=450;

0.91 wt. % of bisphenol A ethoxylated diacrylate;

0.10 wt. % of bis(1-octyloxy-2,2,6,6-tetramethyl-4-piperidyl)sebacate;

1.20 wt. % of bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide;

0.0 wt. % of 2,4,6 trimethylbenzoyldiphenylphocphine oxide type photoinitiator;

and 0.99 wt. % of y-mercaptopropyltrimethoxysilane;

(iii) 65.00 wt. % of an oligomer prepared by reaction of: 57.47 wt. % of polypropylene glycol, MW=4200, 0.1 wt. % of 2,6-di-tert-butyl-4-methylphenol, 5.25 wt. % of isophorone diisocyanate, 0.03 wt. % of dibutyl tin dilaurate, and 2.15 wt. % of 2-hydroxyethyl acrylate;

21.55 wt. % of ethoxylated (4) nonyl phenol acrylate, MW=450;

9 wt. % of 2-phenoxyethyl acrylate;

1 wt. % of bisphenol A ethoxylated diacrylate;

1.5 wt. % of bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide;

0.0 wt. % of 2,4,6 trimethylbenzoyldiphenylphosphine oxide type photoinitiator;

0.6 wt. % of hindered phenol antioxidant;

0.1 wt. % of bis(1-octyloxy-2,2,6,6-tetramethyl-4-piperidyl)sebacate;

and 1.25 wt. % of y-mercaptopropyltrimethoxysilane;

(iv) 55.91 wt. % of an oligomer prepared by reaction of: 3.38 wt. % of 2,4-toluene diisocyanate, 0.05 wt. % of 2,6-di-tert-butyl-p-cresol, 0.01 wt. % of acrylic acid, 1.46 wt. % of 2-hydroxyethyl acrylate, 50.10 wt. % of polypropylene glycol, MW=4200, and 0.03 wt. % of dibutyltin dilaurate, 40.29 wt. % ethoxylated nonyl phenol acrylate;

1.50 wt. % of bisphenol A ethoxylate diacrylate;

1.70 wt. % of 2,4,6-trimethylbenzoyldiphenylphosphine oxide type photoinitiator;

0.50 wt. % of hindered phenol antioxidant;

0.10 wt. % of bis(1-octyloxy-2,2,6,6-tetramethyl-4-piperidyl)sebacate;

and 0.90 wt. % of y-mercaptopropyltrimethoxysilane;

(v) 47.56 wt. % of an oligomer prepared by reaction of: 91.54 wt. %, by weight of the oligomer, of polypropylene glycol, MW=4200, 0.02 wt. %, by weight of the oligomer, of acrylic acid, 99%, 0.08 wt. %, by weight of the oligomer, of 2,6-di-tert-butyl-4-methyl phenol, 5.83 wt. %, by weight of the oligomer, of monomeric toluene diisocyanate, 0.05 wt. %, by weight of the oligomer, of dibutyltin dilaurate, and 2.48 wt. %, by weight of the oligomer, of 2-hydroxyethyl acrylate;

0.85 wt. % of ethoxylated bisphenol A acrylate;

44.09 wt. % of ethoxylated nonyl phenol acrylate;

5.00 wt. % of 2,4,6-trimethylbenzoyl ethoxy phenyl phosphine oxide;

1.00 wt. % of bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide;

0.47 wt. % of hindered phenol antioxidant;

0.09 wt. % of bis(1-octyloxy-2,2,6,6-tetramethyl-4-piperidyl)sebacate;

and 0.94 wt. % of ˜, -mercaptopropyltrimethoxysilane;

and (vi) 47.05 wt. % of an oligomer prepared by reaction of: 91.54 wt. %, by weight of the oligomer, of polypropylene glycol, MW=4200, 0.02 wt. %, by weight of the oligomer, of acrylic acid, 99%, 0.08 wt. %, by weight of the oligomer, of 2,6-di-tert-butyl-4-methyl phenol, 5.83 wt. %, by weight of the oligomer, of monomeric toluene diisocyanate, 0.05 wt. %, by weight of the oligomer, of dibutyltin dilaurate, and 2.48 wt. %, by weight of the oligomer, of 2-hydroxyethyl acrylate;

0.84 wt. % of ethoxylated bisphenol A acrylate;

43.62 wt. % of ethoxylated nonyl phenol acrylate;

5.00 wt. % of 2,4,6-trimethylbenzoyl ethoxy phenyl phosphine oxide;

2.00 wt. % of bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide;

0.47 wt. % of hindered phenol antioxidant;

0.09 wt. % of bis(1-octyloxy-2,2,6,6-tetramethyl-4-piperidyl)sebacate;

and 0.93 wt. % of 7-mercaptopropyltrimethoxysilane; and

forming the secondary coating layer by curing a composition selected from the group of formula compositions wherein the composition of the Secondary Coating layer, prior to curing, is obtained by curing a composition selected from the group consisting of the formulations of group compositions (a), (b), (c) and (d); wherein said formulations compositions (a), (b), (c) and (d) are defined as follows:

(a) 28.78 wt. % of an oligomer prepared by reaction of: 21.26 wt. %, by weight of the oligomer, of an 80/20 blend of the 2,4- and 2,6-isomer of toluene diisocyanate, 0.05 wt. %, by weight of the oligomer, of 2,6-di-tert-butyl-4-methyl phenol, 14.18 wt. %, by weight of the oligomer, of 2-hydroxyethyl acrylate, 0.05 wt. %, by weight of the oligomer, of dibutyltin dilaurate, and 64.46 wt. %, by weight of the oligomer, of polypropylene glycol, MW=1000;

38.42 wt. % of difunctional bisphenol A-based epoxy acrylate oligomer;

7.2 wt. % of isobornyl acrylate;

8.15 wt. % of 2-phenoxyethyl acrylate;

5.76 wt. % of tripropylene glycol diacrylate;

4.27 wt. % of 1,6-hexanediol diacrylate;

2.43 wt. % of a blend, wherein said blend consists essentially of 35 wt. % of aromatic acid acrylate half ester and 65 wt. % of ethoxylated trimethylolpropane triacrylate;

1 wt. % of 2,4,6-trimethylbenzoyldiphenylphosphine oxide type photoinitiator;

0 wt. % of bis(2,4,6 trimethylbenzoyl)phenylphosphine oxide;

3 wt. % of 1-hydroxycyclohexyl-phenyl ketone;

0.5 wt. % of hindered phenol antioxidant;

0.33 wt. % of a blend, wherein said blend consists essentially of 40 to 70 wt. % of dimethyl, methyl(propyl(poly(ethylene oxide) (propylene oxide))acetate)siloxane, 30 to 60 wt. % of poly(ethylene oxide propylene oxide) monoallyl ether acetate, and less than 9 wt. % of polyether polyol acetate;

and 0.17 wt. % of dimethyl, methyl(propyl(poly(ethylene oxide))acetate) siloxane;

(b) 30.00 wt. % of an oligomer prepared by reaction of: 21.26 wt. %, by weight of the oligomer, of an 80/20 blend of the 2,4- and 2,6-isomer of toluene diisocyanate, 0.05 wt. %, by weight of the oligomer, of 2,6-di-tert-butyl-4-methyl phenol, 14.18 wt. %, by weight of the oligomer, of 2-hydroxyethyl acrylate, 0.05 wt. %, by weight of the oligomer, of dibutyltin dilaurate, and 64.46 wt. %, by weight of the oligomer, of polypropylene glycol, MW=1000;

40.00 wt. % of epoxy diacrylate;

7.5 wt. % of isobornyl acrylate;

8.5 wt. % of 2-phenoxyethyl acrylate;

6 wt. % of tripropylene glycol diacrylate;

4.5 wt. % of 1,6-hexanediol diacrylate;

0.5 wt. % of hindered phenol antioxidant;

0.0 wt. % of bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide;

0.5 wt. % of 2,4,6-trimethylbenzoyldiphenylphosphine oxide type photoinitiator;

2 wt. % of 1-hydroxycyclohexyl-phenyl ketone;

0.33 wt. % of a blend, wherein said blend consists essentially of a blend of 40 to 70 wt. % of dimethyl, methyl(propyl(poly(ethylene oxide) (propylene oxide))acetate)siloxane, 30 to 60 wt. % of poly(ethylene oxide propylene oxide) monoallyl ether acetate, and less than 9 wt. % of polyether polyol acetate;

and 0.17 wt. % of dimethyl, methyl(propyl(poly(ethylene oxide))acetate) siloxane;

(c) 20.27 wt. % of an oligomer prepared by reaction of: 21.26 wt. %, by weight of the oligomer, of an 80/20 blend of the 2,4- and 2,6-isomer of toluene diisocyanate, 0.05 wt. %, by weight of the oligomer, of 2,6-di-tert-butyl-4-methyl phenol, 14.18 wt. %, by weight of the oligomer, of 2-hydroxyethyl acrylate, 0.05 wt. %, by weight of the oligomer, of dibutyltin dilaurate, and 64.46 wt. %, by weight of the oligomer, of polypropylene glycol, MW=1000;

50.00 wt. % of epoxy diacrylate;

1.06 wt. % of 2,4,6-trimethylbenzoyldiphenylphosphine oxide type photoinitiator;

0.80 wt. % of 1-hydroxycyclohexyl phenyl ketone;

0.50 wt. % of 2,6-di-tert-butyl-4-methylphenol;

1.06 wt. % of a blend of 70 wt. % of oligo[2-hydroxy-2-methyl-1-[4(1-methyl-vinyl)phenyl]propanone] and 30 wt. % of 2-hydroxy-2-methyl-1-phenylpropanone;

15.00 wt. % of tripropylene glycol diacrylate;

9.80 wt. % of 1,6-hexanediol diacrylate;

0.50 wt. % of ethoxylated (4) nonyl phenol acrylate, MW=450;

0.68 wt. % of a blend, wherein said blend consists essentially of 40 to 70 wt. % of dimethyl, methyl(propyl(poly(ethylene oxide) (propylene oxide))acetate)siloxane, 30 to 60 wt. % of poly(ethylene oxide propylene oxide) monoallyl ether acetate, and less than 9 wt. % of polyether polyol acetate;

and 0.33 wt. % of dimethyl, methyl(propyl(poly(ethylene oxide))acetate) siloxane;

and (d) 28.1 wt. % of an oligomer prepared by reaction of: 21.26 wt. %, by weight of the oligomer, of an 80/20 blend of the 2,4- and 2,6-isomer of toluene diisocyanate, 0.05 wt. %, by weight of the oligomer, of 2,6-di-tert-butyl-4-methyl phenol, 14.18 wt. %, by weight of the oligomer, of 2-hydroxyethyl acrylate, 0.05 wt. %, by weight of the oligomer, of dibutyltin dilaurate, and 64.46 wt. %, by weight of the oligomer, of polypropylene glycol, MW=1000;

37.4 wt. % of a difunctional bisphenol A-based epoxy acrylate oligomer;

5.2 wt. % of 1,6-hexanediol diacrylate;

10.3 wt. % of ethoxylated 4 bisphenol A diacrylate;

14.75 wt. % of 2-phenoxyethyl acrylate;

0.75 wt. % of 2,4,6-trimethylbenzoyldiphenylphosphine oxide type photoinitiator;

2.5 wt. % of 1-hydroxcyclohexyl phenyl ketone;

0.5 wt. % of hindered phenol antioxidant;

and 0.33 wt. % of a blend, wherein said blend consists essentially of 40 to 70 wt. % of dimethyl, methyl(propyl(poly(ethylene oxide) (propylene oxide))acetate)siloxane, 30 to 60 wt. % of poly(ethylene oxide propylene oxide) monoallyl ether acetate, and less than 9 wt. % of polyether polyol acetate;

and 0.17 wt. % of dimethyl, methyl(propyl(poly(ethylene oxide))acetate) siloxane.

Assignments (4)
CHANGE OF CORPORATE ADDRESS Recorded Mar 30, 2022
From: COVESTRO (NETHERLANDS) B.V.
To: COVESTRO (NETHERLANDS) B.V.
Reel/Frame 059546/0570 →
CHANGE OF NAME Recorded Jul 2, 2021
From: MS HOLDING B.V.
To: COVESTRO (NETHERLANDS) B.V.
Reel/Frame 056756/0513 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 25, 2021
From: DSM IP ASSETS B.V.
To: MS HOLDING B.V.
Reel/Frame 056726/0106 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 12, 2013
From: WU, XIAOSONG; SCHMID, STEVEN ROBERT; BISHOP, TIMOTHY EDWARD; ZIMMERMAN, JOHN MONROE; CATTRON, WENDELL WAYNE; MURPHY, EDWARD JOSEPH; SHAH, PRATIK
To: DSM IP ASSETS B.V.
Reel/Frame 030202/0907 →