Solar cell

1. A solar cell comprising:

a crystalline silicon semiconductor substrate of a first conductive type;

an emitter region having a second conductive type different from the first conductive type and at a first surface of the crystalline silicon semiconductor substrate, wherein the emitter region forms a p-n junction along with the crystalline silicon semiconductor substrate;

a silicon carbide layer directly on a second surface opposite the first surface of the crystalline silicon semiconductor substrate configured to form a first charge accumulation layer in the second surface of the crystalline silicon semiconductor substrate, and having a first impurity doping concentration of the first conductive type, the first charge accumulation layer to accumulate charge caused by a difference in band gap between the crystalline silicon semiconductor substrate and the silicon carbide layer;

a first electrode on the first surface of the crystalline silicon semiconductor substrate and coupled to the emitter region;

a heavily doped region under the first electrode and containing impurities of a second conductive type at a doping concentration higher than the crystalline semiconductor substrate and a second charge accumulation layer;

a second electrode on the second surface of the crystalline silicon semiconductor substrate and coupled to the crystalline silicon semiconductor substrate;

a surface field region partially in the second surface of the crystalline silicon semiconductor substrate and having a second impurity doping concentration of the first conductive type higher than the first impurity doping concentration of the silicon carbide layer; and

an anti-reflection part on the emitter region,

wherein the silicon carbide layer has a plurality of openings and the second electrode contacts the surface field region through the plurality of openings of the silicon carbide layer,

wherein a conduction band average energy level of the crystalline silicon semiconductor substrate is higher than a conduction band average energy level of the silicon carbide layer, and

wherein an amount of impurities contained of the silicon carbide layer is 1×10 18 /cm 3 to 5×10 20 /cm3, and

wherein the emitter region is formed of a silicon carbide to form the second charge accumulation layer in the first surface of the crystalline silicon semiconductor substrate to accumulate charge caused by a difference in band gap between the crystalline silicon semiconductor substrate and the emitter region.

2. The solar cell of claim 1 , wherein the anti-reflection part is between the emitter region and the first electrode and includes a transparent conductive material.

3. The solar cell of claim 1 , the heavily doped region between the first surface of the crystalline silicon semiconductor substrate and the first electrode and includes impurities of the second conductive type at a concentration higher than the emitter region.

4. The solar cell of claim 1 , further comprising a passivation region between the emitter region and the crystalline silicon semiconductor substrate.

5. The solar cell of claim 1 , wherein a conduction band energy level of the crystalline silicon semiconductor substrate decreases toward a junction surface between the crystalline silicon semiconductor substrate and the silicon carbide layer,

wherein a conduction band energy level of the silicon carbide layer increases toward the junction surface,

wherein the conduction band energy level of the crystalline silicon semiconductor substrate at the junction surface is lower than the conduction band energy level of the silicon carbide layer at the junction surface, and

wherein an energy valley on which electrons are accumulated is in the junction surface.

6. The solar cell of claim 1 , wherein the silicon carbide layer has a thickness of 10 nm to 100 nm.

7. The solar cell of claim 1 , wherein the first conductive type is an n-type, and the second conductive type is a p-type.

8. The solar cell of claim 1 , wherein the anti-reflection part includes a first anti-reflection layer including aluminum oxide having a thickness of 5 nm 10 nm on the emitter region and a second anti-reflection layer including silicon nitride having a thickness of 70 nm 80 nm on the first anti-reflection.

9. The solar cell of claim 1 , wherein the first surface of the crystalline silicon semiconductor substrate has a textured surface and the second surface opposite to the first surface has a flat surface.