Semiconductor device having mesh-pattern wirings
View Patent ↗Disclosed herein is a device that includes: first lines formed on a first wiring layer extending in a first direction; second lines formed on a second wiring layer extending in a second direction; and conductor plugs connecting the first lines to the second lines such that the first and second lines form a mesh-structure wiring. The first lines include first enlarged portions at intersection positions where the first and second lines cross to each other, a width in the second direction of the first enlarged portions is wider than a line width of the first lines at other than the intersection position. The second lines include second enlarged portions at the intersection positions, a width in the first direction of the second enlarged portions is wider than a line width of the second lines at other than the intersection position.
1. A semiconductor device comprising:
a first wiring layer defined on a main surface of a semiconductor substrate;
a second wiring layer defined above the first wiring layer;
an interlayer insulation layer formed between the first and second wiring layers;
first and second lines extending along in a first direction on the first wiring layer;
third and fourth lines extending along in a second direction crossing the first direction on the second wiring layer; and
a plurality of conductor plugs penetrating through the interlayer insulation film, wherein
the first line in the first wiring layer includes a first connection region and a first non-connection region, the third line in the second wiring layer includes a second connection region and a second non-connection region, the second connection region in the second wiring layer overlapping the first connection region in the first wiring layer,
the plurality of conductor plugs is disposed in the interlayer insulating layer between the first and second connection regions and electrically couples the first and second connection regions,
a distance between the first connection region and the second line is smaller than a distance between the first non-connection region and the second line, and
a distance between the second connection region and the fourth line is smaller than a distance between the second non-connection region and the fourth line, wherein one of the first and second connection regions is formed into a polygon having five or more sides.
2. The semiconductor device as claimed in claim 1 , wherein
the first connection region includes a first main region positioned on an extended portion of the first non-connection region in the first direction and a first enlarged region positioned in a different portion from the extended portion of the first non-connection region in the first direction, and
at least a part of the conductor plug is connected to the first enlarged region.
3. The semiconductor device as claimed in claim 2 , wherein
the second connection region includes a second main region positioned on an extended portion of the second non-connection region in the second direction and a second enlarged region positioned in a different portion from the extended portion of the second non-connection region in the second direction, and
at least the part of the conductor plug is connected between the first enlarged region and the second enlarged region.
4. The semiconductor device as claimed in claim 1 , wherein both the first and third lines are power-supply lines.
5. The semiconductor device as claimed in claim 4 , wherein both the second and fourth lines are signal lines.
6. The semiconductor device as claimed in claim 1 , further comprising a plurality of standard cells formed on the semiconductor substrate, wherein
a plurality of the first lines are provided, and
a wiring pitch of the plurality of first lines in the second direction is substantially equal to a width of the plurality of standard cells in the second direction.
7. The semiconductor device as claimed in claim 1 , wherein a plurality of the conductor plugs are provided.
8. A semiconductor device comprising:
a plurality of first lines formed on a first wiring layer extending in a first direction;
a plurality of second lines formed on a second wiring layer different from the first wiring layer and extending in a second direction that crosses the first direction; and
a plurality of conductor plugs each connecting an associated one of the first lines on the first wiring layer to an associated one of the second lines on the second wiring layer such that the first and second lines form a mesh-structure wiring, wherein:
the first lines include first enlarged portions at connection positions where the first and second lines cross to each other, a width in the second direction of the first enlarged portions is wider than a line width of the first lines at other than the connection position, and
the second lines include second enlarged portions at the connection positions, a width in the first direction of the second enlarged portions is wider than a line width of the second lines at other than the connection position, wherein at least one of the first and second enlarged portions is formed into a polygon having five or more sides.
9. The semiconductor device as claimed in claim 8 , wherein the first and second enlarged portions overlap with each other and are connected through a plurality of conductor plugs.
10. The semiconductor device as claimed in claim 8 , wherein the first and second lines include a power-supply line.
11. The semiconductor device as claimed in claim 8 , wherein
the first lines are power-supply lines, and
the first wiring layer includes a plurality of third lines that are narrower than the first lines.
12. The semiconductor device as claimed in claim 8 , wherein at least one of the first and second enlarged portions includes a concave portion at least on one of the sides that constitute the polygon.
13. The semiconductor device as claimed in claim 8 , wherein the mesh-structure wiring is formed above a logic circuit formation region.
14. A semiconductor device comprising:
a plurality of first lines formed on a first wiring layer extending in a first direction;
a plurality of second lines formed on a second wiring layer extending in a second direction that crosses the first direction; and
a plurality of conductor plugs each connecting an associated one of the first lines to an associated one of the second lines such that the first and second lines form a mesh structure wiring,
wherein the first lines include a first polygonal portion that is formed into a polygon having five or more sides at intersection positions where the first and second lines cross to each other.
15. The semiconductor device as claimed in claim 14 , wherein the second lines include a second polygonal portion that is formed into a polygon having five or more sides at the intersection positions.
16. The semiconductor device as claimed in claim 15 , wherein the first polygonal portion and the second polygonal portion are overlap with each other, and are connected through a plurality of conductor plugs.
17. The semiconductor device as claimed in claim 15 , wherein at least one of the first and second polygonal portions includes a concave portion at least on one of the sides that constitute the polygon.
18. The semiconductor device as claimed in claim 14 , wherein the first and second lines include a power-supply line.
19. The semiconductor device as claimed in claim 14 , wherein
the first lines are power-supply lines, and
the first wiring layer includes a plurality of third lines that are narrower than the first lines.
20. The semiconductor device as claimed in claim 14 , wherein the mesh-structure wiring is formed above a logic circuit formation region.