IP Library Granted Patent US 9,371,234
Granted Patent B2
US 9,371,234 · App. 13/810,144 · Granted Jun 21, 2016

Method for producing graphene at a low temperature, method for direct transfer of graphene using same, and graphene sheet

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Quick Facts
Patent No.
US 9,371,234
App. No.
13/810,144
Granted
Jun 21, 2016
Kind
B2
Abstract

The present invention relates to a method for forming graphene at a low temperature, to a method for direct transfer of graphene using same, and to a graphene sheet. The method for forming graphene at a low temperature comprises supplying a carbon-source-containing gas to a metal catalyst layer for graphene growth formed on a substrate, and forming graphene at a low temperature of 500° C. or less by means of inductively coupled plasma-chemical vapor deposition (ICP-CVD).

Claims (17)

1. A method of producing graphene comprising:

loading a substrate into a deposition chamber using a first roll-to-roll process;

forming a metal catalyst layer on the substrate in the deposition chamber;

loading the substrate from the deposition chamber into an inductively coupled plasma-chemical vapor deposition (ICP-CVD) chamber using a second roll-to-roll process after the metal catalyst layer is formed on the substrate;

supplying carbon source-containing gas to the substrate in the ICP-CVD chamber; and

forming, within the ICP-CVD chamber, graphene on the metal catalyst layer formed on the substrate from the carbon source-containing gas, at a low temperature of 500° C. or less by inductively coupled plasma-chemical vapor deposition (ICP-CVD).

2. The producing method of claim 1 ,

wherein the substrate is loaded in sequence from the deposition chamber into the ICP-CVD chamber by using a load-locked chamber.

3. The producing method of claim 1 , wherein the substrate has transparency or flexibility, or transparency and flexibility.

4. The producing method of claim 1 , wherein the substrate is a polymer sheet containing a polymer compound having π-electrons or includes the polymer sheet.

5. The producing method of claim 1 , further including:

cooling the graphene.

6. The producing method of claim 1 , wherein the metal catalyst layer for growing graphene is patterned.

7. The producing method of claim 1 , further including:

separating the graphene in a sheet form from the substrate by removing the metal catalyst layer after the graphene is formed.

8. The producing method of claim 7 , wherein the metal catalyst layer for growing graphene is removed through an etching process using an etching solution including an acid, a salt FeCl 3 or combinations thereof.

9. The producing method of claim 8 , wherein the metal catalyst layer for growing graphene is removed through a roll-to-roll process.

Assignments (5)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 18, 2020
From: HANWHA AEROSPACE CO., LTD.
To: VERSARIEN PLC
Reel/Frame 054688/0978 →
CHANGE OF NAME Recorded Jun 15, 2018
From: HANWHA TECHWIN CO., LTD.
To: HANWHA AEROSPACE CO., LTD.
Reel/Frame 046366/0429 →
CHANGE OF NAME Recorded Jul 30, 2015
From: SAMSUNG TECHWIN CO., LTD.
To: HANWHA TECHWIN CO., LTD.
Reel/Frame 036233/0470 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 21, 2013
From: SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION
To: GRAPHENE SQUARE INC.
Reel/Frame 031649/0835 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 22, 2013
From: HONG, BYUNG HEE; AHN, JONG-HYUN; YOO, JI BEOM; BAE, SU KANG; JUNG, MYUNG HEE; JANG, HOUK; LEE, YOUNGBIN; KIM, SANG JIN
To: SUNGKYUNKWAN UNIVERSITY FOUNDATION FOR CORPORATE COLLABORATION; SAMSUNG TECHWIN CO.,LTD.
Reel/Frame 030065/0389 →