Homoadamantane derivatives, process for preparing same, and photoresist compositions
View Patent ↗A compound represented by the following formula (I), wherein R 1 is a hydrogen atom, a halogen atom, a methyl group or a trifluoromethyl group.
1. A compound represented by the following formula
wherein R 1 is a hydrogen atom or a methyl group.
2. A method for producing the compound according to claim 1 , comprising reacting 5-oxo-4-oxa-5-homoadamantan-2-ol represented by the following formula (A) with a (meth)acrylic acid compound or its derivative.
3. The production method according to claim 1 , wherein the 5-oxo-4-oxa-5-homoadamantan-2-ol is reacted with methacrylic anhydride.
4. A (meth)acrylic polymer obtained by polymerizing one or more compounds of formula (I) according to claim 1 .
5. A positive photoresist composition comprising the (meth)acrylic polymer according to claim 4 and a photoacid generator.
6. A method for forming a resist pattern comprising:
forming a photoresist film on a substrate comprising the positive photoresist composition according to claim 5 ;
selectively exposing the photoresist film to light; and
subjecting the photoresist film which has been selectively exposed to light to an alkaline development treatment to form a resist pattern.
7. The (meth)acrylic polymer according to claim 4 , which is a homopolymer.
8. The (meth)acrylic polymer according to claim 4 , which is a copolymer.
9. The (meth)acrylic polymer according to claim 4 , obtained by polymerizing said one or more compounds of formula (I) and at least one additional polymerizable monomer.
10. The (meth)acrylic polymer according to claim 9 , obtained by polymerizing said one or more compounds of formula (I) and two additional polymerizable monomers.
11. The (meth)acrylic polymer according to claim 10 , wherein the two additional polymerizable monomers are Monomer A and Monomer B having the following structures:
12. The compound according to claim 1 , wherein R 1 is a hydrogen atom.
13. The compound according to claim 1 , wherein R 1 is a methyl group.
14. The (meth)acrylic polymer according to claim 11 , wherein a content of a repeating unit derived from the compound represented by formula (I) in the (meth)acrylic polymer is 25 to 75 mol %.