IP Library Granted Patent US 10,000,854
Granted Patent B2
US 10,000,854 · App. 13/817,187 · Granted Jun 19, 2018

Method for preventing elution of Bi from copper alloy

Inventor: Tomoyuki Ozasa (Yamanashi, JP)
Assignee: KITZ CORPORATION
C23F1/18B24C3/322C23F1/00E03B7/006
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,000,854
App. No.
13/817,187
Granted
Jun 19, 2018
Kind
B2
Abstract

Provided is a method for preventing the elution of Bi from copper alloy, in which the elution of Bi is prevented in leadless copper-alloy plumbing equipment and the like containing a trace of lead and a predetermined amount of Bi. The present invention relates to a method for preventing the elution of Bi from copper alloy in which at least Bi present on the surface of copper alloy containing Bi is selectively removed by preferentially dissolving Bi in a 4 to 20 mass % concentration of nitric acid while suppressing Cu dissolution. Furthermore, elution of Pb is suppressed using a 10-20 mass % concentration of nitric acid. In this case, by removing at least Bi present on the surface of copper alloy containing Bi using nitric acid and then treating the surface of the copper alloy by shot-blasting corrosive products, such as oxides, produced from the nitric acid are removed, and gloss is imparted to the surface.

Claims (6)

1. A method for preventing elution of Bi from copper alloy containing at least Bi and Pb having a surface thereof on which Bi and Pb is present, comprising treating the surface of the copper alloy with nitric acid having a concentration of 1.325 to 2.038 mol/L and subjecting the surface of the copper alloy to shot-blasting,

wherein the treatment suppresses dissolution of Cu and preferentially dissolves Bi and Pb,

wherein at least some of the Bi and at least some of the Pb is removed selectively,

wherein the shot-blasting removes corrosive products that are oxides produced from the nitric acid and imparts gloss to the surface,

wherein the shot-blasting is performed in a range of depths of void parts formed on the surface of the copper alloy as a result of removing at least some of the Bi using the nitric acid to suppress exposure of Bi present inward of the copper alloy, and

wherein the shot-blasting blocks the void parts formed on the surface of the copper alloy as a result of removing at least some of the Bi using the nitric acid to suppress exposure of Bi present inward of the copper alloy.

Assignments (2)
CHANGE OF ASSIGNEE ADDRESS Recorded Feb 15, 2024
From: KITZ CORPORATION
To: KITZ CORPORATION
Reel/Frame 066600/0551 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 19, 2013
From: OZASA, TOMOYUKI
To: KITZ CORPORATION
Reel/Frame 029832/0181 →
Priority Claims (1)
JP 2010-187598 · Aug 24, 2010 · national
Continuity (1)
Related Publication 20130142691A1 · Jun 6, 2013