IP Library Granted Patent US 8,963,415
Granted Patent B2
US 8,963,415 · App. 13/821,327 · Granted Feb 24, 2015

Organic EL element, display panel, and display device

View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 8,963,415
App. No.
13/821,327
Granted
Feb 24, 2015
Kind
B2
Abstract

An organic EL element comprises: a transparent electrode; a reflective electrode opposite the transparent electrode; and a light-emitting layer having a film thickness of 20 nm to 200 nm, between the electrodes. The reflective electrode is a layered film of: a metal film including Al as a main component and having a film thickness of at least 43 nm; and a Ni film, whose film thickness d satisfies: 0 nm<d <5 nm, layered with respect to an entirety of a surface, facing the light-emitting layer, of the metal film, without interposition of an oxide layer that covers the surface of the metal film entirely. A surface of the layered film facing the light-emitting layer has an average roughness Ra satisfying: 0.6 nm≦Ra<2.0 nm and a maximum height difference Rmax satisfying: 5 nm≦Rmax<20 nm.

Claims (64)

1. An organic EL element, comprising:

a transparent electrode;

a reflective electrode opposite the transparent electrode; and

a light-emitting layer between the transparent electrode and the reflective electrode, the light-emitting layer having a film thickness of 20 nm to 200 nm, wherein

the reflective electrode is a layered film of:

a metal film including Al as a main component, the metal film having a film thickness of at least 43 nm; and

a Ni film layered with respect to the metal film at surfaces thereof including a surface of the metal film facing the light-emitting layer and external side surfaces of the metal film, without interposition of an oxide layer that covers the surfaces of the metal film,

a film thickness d of the Ni layer satisfies: 0 nm <d <5 nm,

an average roughness Ra of a surface of the layered film facing the light-emitting layer satisfies: 0.6 nm ≦Ra <2.0 nm,

a maximum height difference Rmax of the surface of the layered film satisfies: 5 nm ≦Rmax <20 nm, and

the external side surfaces of the metal film do not face the light-emitting layer.

2. The organic EL element of claim 1 , wherein the maximum height difference Rmax satisfies: 5 nm <Rmax <17 nm.

3. The organic EL element of claim 1 , wherein the reflective electrode is provided in plurality, the organic EL element further comprising

a bank defining a plurality of apertures each corresponding to one of the reflective electrodes, wherein

the light-emitting layer is provided in plurality such that each light-emitting layer is positioned inside a corresponding one of the apertures, and

both end portions of each reflective electrode are covered by the bank at least in one cross-sectional direction through the reflective electrode.

4. The organic EL element of claim 1 , wherein oxide films are formed on the surface of the metal film facing the light-emitting layer as discrete islands or as portions of a discontinuous film.

5. The organic EL element of claim 1 , further comprising

a transparent conductive film between the reflective electrode and the light-emitting layer.

6. The organic EL element of claim 5 , wherein

the transparent conductive film comprises ITO, IZO, or a metal oxide other than ITO or IZO.

7. The organic EL element of claim 1 , further comprising

a charge injection layer between the reflective electrode and the light-emitting layer.

8. The organic EL element of claim 7 further comprising

a charge transport layer between the charge injection layer and the light-emitting layer.

9. The organic EL element of claim 7 , wherein

the charge injection layer is a layer that comprises a metal oxide, a metal nitride, or a metal oxynitride.

10. The organic EL element of claim 7 , wherein

the charge injection layer is a layer that comprises tungsten oxide or molybdenum oxide.

11. A display panel comprising the organic EL element of claim 1 .

12. The organic EL element of claim 1 , wherein

the Ni film is a continuous film covering the surfaces of the metal film including the surface facing the light-emitting layer and the external side surfaces.

13. An organic EL element, comprising:

a transparent electrode;

a reflective electrode opposite the transparent electrode; and

a light-emitting layer between the transparent electrode and the reflective electrode, the light-emitting layer having a film thickness of 20 nm to 200 nm, wherein

the reflective electrode is a layered film of:

a metal film including Al as a main component, the metal film having a film thickness of at least 43 nm; and

a Ni film layered with respect to the metal film at surfaces thereof including surface of the metal film facing the light-emitting layer and external side surfaces of the metal film, without interposition of an oxide layer that covers the surfaces of the metal film,

a film thickness d of the Ni layer satisfies: 0 nm <d <5 nm,

an average roughness Ra of a surface of the layered film facing the light-emitting layer satisfies: 0.6 nm ≦Ra <2.0 nm,

a maximum height difference Rmax of the surface of the layered film satisfies: 5 nm ≦Rmax <20 nm, and

the Ni film is a film of Ni deposited through electroless plating processing.

14. A display panel having a plurality of pixels, comprising:

a reflective electrode for each of the plurality of pixels;

a bank defining an aperture corresponding to the reflective electrode;

a light-emitting layer positioned inside the aperture; and

a transparent electrode above the light-emitting layer, wherein

the bank covers both end portions of the reflective electrode at least in one cross-sectional direction through the reflective electrode,

the reflective electrode is a layered film of:

a metal film including Al as a main component, the metal film having a film thickness of at least 43 nm; and

a Ni film layered with respect to the metal film at surfaces thereof including a surface of the metal film facing the light-emitting layer and external side surfaces of the metal film, without interposition of an oxide layer that covers the surfaces of the metal film,

a film thickness d of the Ni layer satisfies: 0 nm <d <5 nm,

an average roughness Ra of the surface of the metal film satisfies: 0.6 nm ≦Ra <2.0 nm,

a maximum height difference Rmax of the surface of the metal film satisfies: 5 nm ≦Rmax <20 nm, and

the external side surfaces of the metal film do not face the light-emitting layer.

15. The display panel of claim 14 , wherein

the aperture is provided in plurality so as to correspond one-to-one with a plurality of reflective electrodes.

16. The display panel of claim 14 , wherein

the plurality of reflective electrodes are arranged so as to form a plurality of lines, and

the aperture is provided in plurality so as to correspond one-to-one with the plurality of lines of the plurality of reflective electrodes.

17. A display device comprising the display panel of claim 14 .

18. The display panel of claim 14 , wherein

the Ni film is a continuous film covering the surfaces of the metal film including the surface facing the light-emitting layer and the external side surfaces.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 12, 2015
From: PANASONIC CORPORATION
To: JOLED INC
Reel/Frame 035187/0483 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 23, 2013
From: SUGANO, KOU; YAMADA, RYUUTA
To: PANASONIC CORPORATION
Reel/Frame 030470/0565 →