IP Library Granted Patent US 9,156,194
Granted Patent B2
US 9,156,194 · App. 13/831,358 · Granted Oct 13, 2015

Digital 3D fabrication using multi-layered mold

Inventors: Tse Nga Ng (Palo Alto, CA); JengPing Lu (Fremont, CA); Eugene M. Chow (Fremont, CA); Timothy David Stowe (Alameda, CA); Janos Veres (San Jose, CA); Philipp H. Schmaelzle (Los Altos, CA)
Assignee: Palo Alto Research Center Incorporated
B29C33/3835B29C33/3842B29C33/448B29C67/0051B29C67/0055B29C33/005B29C2033/385
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Quick Facts
Patent No.
US 9,156,194
App. No.
13/831,358
Granted
Oct 13, 2015
Kind
B2
Abstract

A replica 3D structure is fabricated inside a multi-layered mold by patterning each mold layer to define a void/opening that matches a corresponding cross section of the structure's peripheral surface, and filling the patterned opening of each layer with a structural material (i.e., before depositing a subsequent layer of mold material). The mold material (e.g., photoresist or another dissolvable sacrificial material) is blanket deposited (e.g., by slot-die, spray coating) and then patterned using a laser or a printed mask. Each layer of modeling material (e.g., polymer, ceramic or metal, or a combination thereof) is electro-plated or otherwise deposited on the previously formed modeling material layer. High vertical resolution is achieved by utilizing relatively thin mold layers. The mold layer deposition, patterning and modeling material deposition is repeated until the replica 3D structure is entirely formed inside the multi-layered mold, and then the mold is dissolved or otherwise removed.

Claims (36)

1. A method for fabricating a three dimensional (3D) structure, the method comprising:

sequentially depositing a plurality of mold material layers such that each of said plurality of mold material layers has a corresponding thickness, and such that the plurality of mold material layers collectively form a multi-layer mold;

individually patterning each of the plurality of mold material layers in accordance with a digital description such that each said mold material layer defines a void portion; and

sequentially depositing a modeling material into each said void portion before depositing a subsequent mold material layer of said plurality of mold material layers such that said modeling material deposited into an associated said void portion forms a substantially two-dimensional modeling material portion that fills said associated void portion and has the same thickness as an associated said mold material layer defining said associated void portion, whereby said sequentially formed substantially two-dimensional modeling material portions disposed in said plurality of mold material layers collectively form said 3D structure.

2. The method of claim 1 , wherein sequentially depositing said plurality of mold material layers comprises depositing photoresist.

3. The method of claim 1 , wherein sequentially depositing said plurality of mold material layers comprises depositing a dissolvable sacrificial material.

4. The method of claim 1 , wherein sequentially depositing said plurality of mold material layers comprises one of roll coating, spray coating and slot-die.

5. The method of claim 1 , wherein sequentially depositing said plurality of mold material layers comprises depositing a first said mold material layer having a first thickness, and subsequently depositing a second said mold material layer over said first mold material layer having a second thickness that is different from said first thickness.

6. The method of claim 1 , wherein individually patterning each of the plurality of mold material layers comprises generating said void portion by removing a portion of each said mold material layer that is entirely surrounded by a retained portion of said each mold material layer.

7. The method of claim 1 , wherein individually patterning each of the plurality of mold material layers comprises:

directing a laser beam onto a target portion of said mold material layer;

exposing said mold material layer such that said target portion of said mold material layer becomes developed; and

removing said developed target portion of said mold material layer, thereby forming said void portion.

8. The method of claim 1 , wherein individually patterning each of the plurality of mold material layers comprises directing a laser beam onto a portion of said mold material layer such that said laser beam ablates said portion of the mold material layer, thereby forming said void portion.

9. The method of claim 1 , wherein individually patterning each of the plurality of mold material layers material comprises:

printing a mask material onto each of the plurality of mold material layers to form a printed mask that defines an opening disposed over a target portion of said mold material layer;

exposing said mold material layer to UV light such that said target portion is developed;

removing said printed mask material; and

removing said developed target portion of said mold material layer, thereby forming said void portion.

10. The method of claim 1 , wherein depositing said modeling material portion comprises electroplating said modeling material inside said associated void portion.

11. The method of claim 1 , wherein depositing said modeling material portion comprises depositing one of a polymer, a ceramic and a metal material into said associated void portion.

12. The method of claim 1 , wherein depositing said modeling material portion into each said void portion comprises depositing a first modeling material portion into a first void portion defined in a first mask material layer, and depositing a second modeling material portion into a second void portion defined in a second mask material layer, wherein said second modeling material portion has a different composition from said first modeling material portion.

13. The method of claim 1 , further comprising annealing said deposited modeling material portions.

14. The method of claim 13 , wherein depositing said modeling material portion into each said void portion comprises depositing a first modeling material portion into a first void portion defined in a first mask material layer, and depositing a second modeling material portion into a second void portion defined in a second mask material layer, and

wherein said annealing comprises annealing said first modeling material portion before depositing said second modeling material portion.

15. The method of claim 13 ,

wherein depositing said modeling material portion into each said void portion comprises depositing a first modeling material portion into a first void portion defined in a first mask material layer, and depositing a second modeling material portion into a second void portion defined in a second mask material layer, and

wherein said annealing comprises simultaneously annealing said first and second modeling material portions.

16. The method of claim 1 , further comprising visually inspecting at least one of said deposited modeling material portions before depositing a subsequent mold material layer.

17. The method of claim 1 , further comprising removing said multi-layered mold from said fabricated 3D structure.

18. The method of claim 1 , further comprising disposing said mold material and said modeling material onto a continuous-loop structure.

19. A method for fabricating a three dimensional (3D) mesoscale structure using a digital description of a 3D object, the method comprising:

depositing a layer of a mold material having a predetermined thickness in the range of 1 μm and 100 μm;

patterning the layer of said mold material using a portion of the digital description such that the layer defines a void portion having a size corresponding to a cross section of said 3D mesoscale structure;

depositing a modeling material into said void portion such that said modeling material forms a corresponding substantially two-dimensional section of said fabricated 3D mesoscale structure having the predetermined thickness of the mold material layer; and

repeating said depositing and patterning until a plurality of said patterned mold material layers, each including a corresponding substantially two-dimensional section having an associated predetermined thickness in the range of 1 μm and 100 μm, form a multi-layered mold that substantially encases a contiguous series of said substantially two-dimensional sections collectively forming said fabricated 3D mesoscale structure.

Assignments (10)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 6, 2025
From: XEROX CORPORATION
To: GENESEE VALLEY INNOVATIONS, LLC
Reel/Frame 073842/0479 →
SECOND LIEN NOTES PATENT SECURITY AGREEMENT Recorded Jul 2, 2025
From: XEROX CORPORATION
To: U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 071785/0550 →
FIRST LIEN NOTES PATENT SECURITY AGREEMENT Recorded Apr 11, 2025
From: XEROX CORPORATION
To: U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 070824/0001 →
SECURITY INTEREST Recorded Feb 13, 2024
From: XEROX CORPORATION
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 066741/0001 →
TERMINATION AND RELEASE OF SECURITY INTEREST IN PATENTS RECORDED AT RF 064760/0389 Recorded Feb 13, 2024
From: CITIBANK, N.A., AS COLLATERAL AGENT
To: XEROX CORPORATION
Reel/Frame 068261/0001 →
SECURITY INTEREST Recorded Nov 20, 2023
From: XEROX CORPORATION
To: JEFFERIES FINANCE LLC, AS COLLATERAL AGENT
Reel/Frame 065628/0019 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REMOVAL OF US PATENTS 9356603, 10026651, 10626048 AND INCLUSION OF US PATENT 7167871 PREVIOUSLY RECORDED ON REEL 064038 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Jun 28, 2023
From: PALO ALTO RESEARCH CENTER INCORPORATED
To: XEROX CORPORATION
Reel/Frame 064161/0001 →
SECURITY INTEREST Recorded Jun 22, 2023
From: XEROX CORPORATION
To: CITIBANK, N.A., AS COLLATERAL AGENT
Reel/Frame 064760/0389 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 20, 2023
From: PALO ALTO RESEARCH CENTER INCORPORATED
To: XEROX CORPORATION
Reel/Frame 064038/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 14, 2013
From: NG, TSE NGA; LU, JENGPING; CHOW, EUGENE M.; STOWE, TIMOTHY DAVID; VERES, JANOS; SCHMAELZLE, PHILIPP H.
To: PALO ALTO RESEARCH CENTER INCORPORATED
Reel/Frame 030007/0788 →
Continuity (1)
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