Exposure apparatus, method of forming patterned layer, method of forming patterned photoresist layer, active device array substrate and patterned layer
View Patent ↗An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.
1. A patterned layer comprising a plurality of pixel electrodes arranged in array, each of the pixel electrodes comprising a plurality of strip patterns arranged in different extension directions, the patterned layer having a plurality of first regions and a plurality of second regions, wherein an area of the first regions is greater than an area of the second regions, a line width/spacing ratio of the pixel electrodes in the first regions is L 1 /S 1 , the second regions comprise a plurality of compensation regions distributed, a line width/spacing ratio of the pixel electrodes distributed in the compensation regions is L 2 /S 2 , a line width/spacing ratio of the pixel electrodes distributed inside the second region and outside of the compensation regions is L 3 /S 3 , and the line width/spacing ratio L 2 /S 2 is smaller than the line width/spacing ratio L 3 /S 3 .
2. The patterned layer as claimed in claim 1 , wherein the pixel electrodes are polymer stabilized alignment pixel electrodes.
3. The patterned layer as claimed in claim 1 , wherein a range of the line width/spacing ratio L 1 /S 1 is about 1.4-3.
4. The patterned layer as claimed in claim 1 , wherein a range of the line width/spacing ratio L 2 /S 2 is about 0.7-1.3.
5. The patterned layer as claimed in claim 1 , wherein a range of the line width/spacing ratio L 3 /S 3 is about 1.4-3.
6. The patterned layer as claimed in claim 1 , wherein the compensation regions are distributed randomly in the second regions.