IP Library Granted Patent US 8,889,433
Granted Patent B2
US 8,889,433 · App. 13/835,355 · Granted Nov 18, 2014

Spin hall effect assisted spin transfer torque magnetic random access memory

Inventors: John K. De Brosse (Colchester, VT); Luqiao Liu (Croton-on-Hudson, NY); Daniel Worledge (Cortlandt Manor, NY)
Assignee: International Business Machines Corporation
H01L43/065H01L43/14
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Quick Facts
Patent No.
US 8,889,433
App. No.
13/835,355
Granted
Nov 18, 2014
Kind
B2
Abstract

Embodiments are directed to providing a spin hall effect (SHE) assisted spin transfer torque magnetic random access memory (STT-MRAM) device by coupling a magnetic tunnel junction (MTJ) to a SHE material, and coupling the SHE material to a transistor. Embodiments are directed to a spin transfer torque magnetic random access memory (STT-MRAM) device comprising: a magnetic tunnel junction (MTJ) coupled to a spin hall effect (SHE) material, and a transistor coupled to the SHE material.

Claims (12)

1. A method for providing a spin hall effect (SHE) assisted spin transfer torque magnetic random access memory (STT-MRAM) device comprising:

coupling a magnetic tunnel junction (MTJ) to a SHE material;

coupling the SHE material to a transistor, such that a source of the transistor abuts the SHE material; and

misaligning the SHE material and the transistor in order to cause a current that flows through the MTJ to flow in one direction in the SHE material to provide a SHE torque;

wherein one edge of the transistor is aligned to an edge of the SHE material, while an other edge of the transistor is aligned to an edge of the MTJ.

2. The method of claim 1 , wherein the SHE material is implemented as a wire and has a thickness in the range of one nanometer to ten nanometers, inclusive.

3. The method of claim 1 , wherein the SHE material comprises bismuth.

4. The method of claim 1 , wherein the MTJ comprises an in-plane dipole field layer and a nonmagnetic spacer.

5. The method of claim 4 , wherein the in-plane dipole field layer is coupled to the nonmagnetic spacer, and wherein the nonmagnetic spacer is coupled to a reference layer of the MTJ.

6. The method of claim 1 , wherein the transistor comprises a field effect transistor (FET), and wherein one of a source and a drain of the FET is coupled to the SHE material.

7. The method of claim 1 , wherein the MTJ comprises an in-plane magnetic field and a nonmagnetic spacer, and wherein the in-plane magnetic field is provided by a dipole field from an in-plane magnetized ferromagnetic (FM) layer, and wherein the in-plane magnetized FM layer is coupled to the nonmagnetic spacer.

8. The method of claim 7 , wherein the nonmagnetic spacer is coupled to a reference layer of the MTJ.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 15, 2013
From: DE BROSSE, JOHN K.; LIU, LUQIAO; WORLEDGE, DANIEL
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 030014/0065 →
Continuity (1)
Related Publication 20140264511A1 · Sep 18, 2014