Liquid deposition photolithography
Systems and methods for liquid deposition photolithography are described. In particular, some embodiments relate to systems and methods for using photolithography to control the 2D structure of a thin layer of material (e.g., photopolymer) using various masks, projection optics and materials. In one or more embodiments, this thin layer can be manipulated by micro-fluidic techniques such that it can be formed, patterned and post-processed in a liquid environment, vastly simplifying the creation of multi-layer structures. Multiple layers are rapidly built up to create thick structures of possibly multiple materials that are currently challenging to fabricate by existing methods.
1. A method of liquid deposition photolithography comprising:
inserting a layer of photo-sensitive liquid between a structure and an optical window, wherein the structure is on a base platform;
projecting an optical pattern through the optical window to modify properties of the layer of the photo-sensitive liquid to pattern the layer;
moving the base platform relative to the optical window by a precise distance to thereby make room for a subsequent next layer;
repeating the above steps a plurality of times to build the structure layer by layer; and
releasing, at least once while repeating the above steps, a chemical inhibitor to create a layer of material precursors that is not photo-sensitive between the optical window and the photo-sensitive liquid.
2. The method of liquid deposition photolithography of claim 1 , wherein the properties of the layer being modified include liquid/solid phase, density, index, or chemical composition.
3. The method of liquid deposition photolithography of claim 1 , further comprising adjusting the optical pattern for each layer.
4. The method of liquid deposition photolithography of claim 1 , further comprising adjusting the layer of material precursors before inserting the next layer of photo-sensitive liquid.
5. The method of liquid deposition photolithography of claim 1 , further comprising transporting, via laminar flow, a non-photosensitive layer directly adjacent to the optical window.
6. The method of liquid deposition photolithography of claim 1 , wherein the optical pattern is generated by a spatial light modulator.
7. The method of liquid deposition photolithography of claim 1 , wherein the structure includes a customized refractive index.
8. A method of liquid deposition photolithography comprising:
selecting a photo-sensitive liquid to build a layer of a structure on a base platform;
inserting a layer of the photo-sensitive liquid within an exposure chamber between an optical window and a mold for creating the structure;
releasing a radical inhibitor to maintain a layer of material precursors adjacent to the optical window, wherein the layer of material precursors is not photo-sensitive;
modifying the properties of the layer of the photo-sensitive liquid to pattern the layer, wherein modifying the properties include projecting an optical pattern through the optical window; and
adjusting a position or orientation of the base platform in accordance with a trajectory profile before repeating the above steps a plurality of times to build the structure layer by layer.
9. The method of liquid deposition photolithography of claim 8 , further comprising coating the mold with a chemical release agent using photo-nanoimprint lithography.
10. The method of liquid deposition photolithography of claim 8 , further comprising maintaining a constant thickness of the layer of material precursors.
11. The method of liquid deposition photolithography of claim 8 , wherein an interior side of the optical window is used to shape the structure.
12. A method of liquid deposition photolithography comprising:
inserting a layer of photo-sensitive liquid between a structure on a base platform and an optical window;
projecting an optical pattern through the optical window to modify properties of the layer of the photo-sensitive liquid to pattern the layer;
moving the base platform relative to the optical window by a precise distance to thereby make room for a subsequent next layer;
repeating the above steps a plurality of times to build the structure layer by layer; and
transporting, via laminar flow, a non-photosensitive layer directly adjacent to the optical window.
13. The method of liquid deposition photolithography of claim 12 , wherein the properties of the layer being modified include liquid/solid phase, density, index, or chemical composition.
14. The method of liquid deposition photolithography of claim 12 , further comprising adjusting the optical pattern for each layer.
15. The method of liquid deposition photolithography of claim 12 , further comprising releasing a chemical inhibitor to create a layer of material precursors that is not photo-sensitive between the optical window and the photo-sensitive liquid.
16. The method of liquid deposition photolithography of claim 15 , further comprising adjusting the layer of material precursors before inserting the next layer of photo-sensitive liquid.
17. The method of liquid deposition photolithography of claim 12 , wherein the optical pattern is generated by a spatial light modulator.
18. The method of liquid deposition photolithography of claim 12 , wherein the structure includes a customized refractive index.