Reverse-conducting semiconductor device
View Patent ↗A reverse-conducting semiconductor device (RC-IGBT) including a freewheeling diode and an insulated gate bipolar transistor (IGBT), and a method for making the RC-IGBT are provided. A first layer of a first conductivity type is created on a collector side before a second layer of a second conductivity type is created on the collector side. An electrical contact in direct electrical contact with the first and second layers is created on the collector side. A shadow mask is applied on the collector side, and a third layer of the first conductivity type is created through the shadow mask. At least one electrically conductive island, which is part of a second electrical contact in the finalized RC-IGBT, is created through the shadow mask. The island is used as a mask for creating the second layer, and those parts of the third layer which are covered by the island form the second layer.
1. A reverse-conducting semiconductor device, comprising:
a wafer, part of the wafer constituting a base layer which is of a first conductivity type;
a freewheeling diode arranged on the wafer; and
a punch-through insulated gate bipolar transistor arranged on the wafer, wherein:
the insulated gate bipolar transistor comprises an emitter side and a collector side arranged opposite of the emitter side;
a first electrical contact is arranged on the emitter side, and a second electrical contact is arranged on the collector side;
at least one third layer of a first or second conductivity type, and at least one second layer of a different conductivity type than the conductivity type of the third layer are arranged on the collector side, the at least one second and third layers being arranged alternately in the insulated gate bipolar transistor;
a second electrical contact is arranged on the collector side, the second electrical contact being in direct electrical contact with the at least one second and third layers;
the at least one second layer is arranged in a first plane parallel to the collector side;
the at least one third layer is arranged in a second plane parallel to the collector side, the second plane being arranged farther from the emitter side than the first plane;
the first plane and the second plane are spaced from each other by at least a thickness of the at least one third layer;
a buffer layer of the first conductivity type is arranged between the base layer and the at least one second and third layers,
wherein none of the at least one second and third layers is an overcompensated layer, and
wherein the first plane and the second plane are spaced from each other by a distance between 50 nm up to 2 μm.
2. A converter comprising a reverse-conducting semiconductor device according to claim 1 .
3. The reverse-conducting semiconductor device according to claim 1 , wherein the first plane and the second plane are spaced from each other by a distance up to 1 μm.
4. The reverse-conducting semiconductor device according to claim 1 , wherein the at least one of the second and third layers which is of the second conductivity type has a higher doping concentration than the at least one of the second and third layers which is of the first conductivity type.