Analysis apparatus for high energy particle and analysis method using the same
Provided is an analysis apparatus for a high energy particle and an analysis method for a high energy particle. The analysis apparatus for the high energy particle includes a scintillator generating photons with each unique wavelength by the impinging with a plurality of kinds of accelerated high energy particles, a parallel beam converting unit making the photons proceed in parallel to one another, a diffraction grating panel making the photons proceeding in parallel to one another enter at a certain angle, and refracting the photons at different angles depending on each unique wavelength, and a plurality of sensing units arranged on positions where the photons refracted at different angles from the diffraction grating panel reach in a state of being spatially separated, and detecting each of the photons.
1. An analysis apparatus comprising:
a scintillator generating photons with unique wavelengths by the impinging with a plurality of kinds of accelerated particles;
a parallel beam converting unit making the photons proceed in parallel to one another;
a diffraction grating panel making the photons proceeding in parallel to one another enter at a certain angle, and refracting the photons at different angles depending on each unique wavelength; and
a plurality of sensing units spatially separated and arranged at positions where the photons refracted at different angles from the diffraction grating panel reach, and detecting each of the photons.
2. The analysis apparatus of claim 1 , wherein the diffraction grating panel comprises a diffraction grating on which 500 to 2,000 linear patterns per 1 mm are arranged in parallel to one another.
3. The analysis apparatus of claim 2 , wherein the linear patterns are metallic or insulating materials.
4. The analysis apparatus of claim 1 , wherein the scintillator comprises a plurality of components that respond to each of the plurality of kinds of the accelerated particles.
5. The analysis apparatus of claim 4 , wherein the components are 2-dimensionally arranged and each of the components forms one cell.
6. The analysis apparatus of claim 5 , wherein the cell is formed by a semiconductor processing technique or a material deposition technique and the cells have a regular arrangement.
7. The analysis apparatus of claim 5 , wherein the cell is formed by sintering, and the cells have an irregular arrangement.
8. The analysis apparatus of claim 1 , wherein the plurality of kinds of accelerated particles includes a proton, an electron, and a gamma particle.
9. The analysis apparatus of claim 1 , wherein the accelerated particles are generated in a synchrotron.
10. An analysis method for a high comprising:
impinging a plurality of kinds of accelerated particles with a scintillator to generate a plurality of kinds of photons with unique wavelengths;
making the photons enter a diffraction grating at a certain angle to refract the photons at different angles depending on each unique wavelength; and
detecting the photons refracted and separated at different angles spatially from the diffraction grating, by using a plurality of sensing units, respectively.
11. The analysis method of claim 10 , wherein the plurality of sensing units detect each photon and analyze the number and energy of the accelerated particles qualitatively and quantitatively.
12. The analysis method of claim 10 , further comprising making the photons proceed in parallel to one another to allow the photons to enter the diffraction grating at a certain angle.
13. The analysis method of claim 10 , wherein the diffraction grating panel comprises a diffraction grating on which 500 to 2,000 linear patterns per 1 mm are arranged in parallel to one another.
14. The analysis method of claim 13 , wherein the linear patterns are metallic or insulating materials.
15. The analysis method of claim 10 , wherein the scintillator comprises a plurality of components that respond to each of the plurality of kinds of accelerated particles.
16. The analysis method of claim 15 , wherein the components are 2-dimensionally arranged and each of the components forms one cell.
17. The analysis method of claim 16 , wherein the cell is formed by a semiconductor processing technique or a material deposition technique and the cells have a regular arrangement.
18. The analysis method of claim 16 , wherein the cell is formed by sintering, and the cells have an irregular arrangement.
19. The analysis method of claim 10 , wherein the plurality of kinds of accelerated particles includes a proton, an electron, and a gamma particle.
20. The analysis method of claim 10 , wherein the accelerated particles are generated in a synchrotron.