IP Library Granted Patent US 9,353,449
Granted Patent B2
US 9,353,449 · App. 13/876,684 · Granted May 31, 2016

Method for producing NbON film

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Quick Facts
Patent No.
US 9,353,449
App. No.
13/876,684
Granted
May 31, 2016
Kind
B2
Abstract

The NbON film of the present invention is a NbON film in which a photocurrent is generated by light irradiation. The NbON film of the present invention is desirably a single-phase film. The hydrogen generation device ( 600 ) of the present invention includes: an optical semiconductor electrode ( 620 ) including a conductor ( 621 ) and the NbON film ( 622 ) of the present invention disposed on the conductor ( 621 ); a counter electrode ( 630 ) connected electrically to the conductor ( 621 ); a water-containing electrolyte ( 640 ) disposed in contact with a surface of the NbON film ( 622 ) and a surface of the counter electrode ( 630 ); and a container ( 610 ) containing the optical semiconductor electrode ( 620 ), the counter electrode ( 630 ), and the electrolyte ( 640 ). In this device, hydrogen is generated by irradiating the NbON film ( 622 ) with light.

Claims (8)

1. A method for producing a NbON film, the method comprising the steps of:

(I) vaporizing R 1 N═Nb(NR 2 R 3 ) 3 (where R 1 , R 2 , and R 3 are each independently an alkyl group); and

(II) bringing, into contact with a heated substrate, the vaporized R 1 N═Nb(NR 2 R 3 ) 3 and at least one selected from oxygen and water vapor,

wherein in the step (II), the substrate is heated to a temperature that is equal to or higher than a boiling point of the R 1 N═Nb(NR 2 R 3 ) 3 and is equal to or lower than a decomposition temperature of the R 1 N═Nb(NR 2 R 3 ) 3 ,

wherein the temperature of the substrate is 400° C. or less, and

the content of compound phases other than the NbON compound phase in the NbON film is 10 at. % or less.

2. The method for producing a NbON film according to claim 1 , wherein R 1 is a tertiary butyl group (—C(CH 3 ) 3 ), and R 2 and R 3 are each independently a straight-chain alkyl group (—C n H 2n+1 , where n is an integer of 1 or more).

3. The method for producing a NbON film according to claim 2 , wherein R 2 and R 3 are selected from the group consisting of methyl and ethyl.

Assignments (3)
CORRECTIVE ASSIGNMENT TO CORRECT THE ERRONEOUSLY FILED APPLICATION NUMBERS 13/384239, 13/498734, 14/116681 AND 14/301144 PREVIOUSLY RECORDED ON REEL 034194 FRAME 0143. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Dec 24, 2020
From: PANASONIC CORPORATION
To: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
Reel/Frame 056788/0362 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 10, 2014
From: PANASONIC CORPORATION
To: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
Reel/Frame 034194/0143 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 18, 2013
From: NOMURA, TAKAIKI; SUZUKI, TAKAHIRO; MIYATA, NOBUHIRO; HATO, KAZUHITO
To: PANASONIC CORPORATION
Reel/Frame 030820/0730 →