PEC biasing technique for LEDs
View Patent ↗Each LED in an array of LEDs mounted on a submount wafer has at least a first semiconductor layer exposed and connected to a first electrode of each LED. The submount wafer has a first metal portion bonded to the first electrode of each LED for providing an energization current to each LED. The submount wafer also has a second metal portion running along and proximate to the first metal portion but not electrically connected to the first metal portion. The second metal portion may be interdigitated with the first metal portion. The second metal portion is connected to a bias voltage. When the wafer is immersed in an electrically conductive solution for electrochemical (EC) etching of the exposed first semiconductor layer, the solution electrically connects the second metal portion to the first metal portion for biasing the first semiconductor layer during the EC etching.
1. A method for fabricating a light emitting diode (LED) structure comprising:
providing a plurality of LEDs, each LED comprising at least a first semiconductor layer, the first semiconductor layer being exposed and connected to a first electrode of each LED;
providing a submount wafer having a first metal portion electrically connected to the first electrode of each LED for providing an energization current to each LED, the submount wafer having a second metal portion proximate to the first metal portion but not electrically connected to the first metal portion;
immersing at least the first semiconductor layer in a solution for electrochemical (EC) etching, the solution having a conductance that electrically connects the second metal portion to the first metal portion; and
biasing the second metal portion with a first biasing voltage to bias the first semiconductor layer during the EC etching for etching the first semiconductor layer.
2. The method of claim 1 wherein performing EC etching comprises immersing at least the first semiconductor layer in a base solution, applying UV light to the first semiconductor layer, and biasing the base solution with a second biasing voltage to create an electric field between the base solution and the first semiconductor layer.
3. The method of claim 1 wherein the first biasing voltage is ground potential.
4. The method of claim 1 wherein the second metal portion is separated from the first metal portion by a gap between about 10 microns to 300 microns.
5. The method of claim 1 wherein the second metal portion is interdigitated with the first metal portion.
6. The method of claim 1 wherein at least some of the LEDs are connected in series, the method further comprising testing the LEDs in series by coupling a current between terminal electrodes of the LEDs in series.
7. The method of claim 1 wherein the plurality of LEDs are flip-chips.
8. The method of claim 1 further comprising performing the PEC etching by etching the first semiconductor layer to roughen a surface of the first semiconductor layer.
9. The method of claim 1 further comprising singulating the submount wafer, including electrically isolating the second metal portion, the singulating not cutting any portion of the first metal portion.
10. The method of claim 1 further comprising:
electroplating the first metal portion prior to the step of immersing by coupling a plating biasing voltage to the first metal portion via a first interconnector; and
disconnecting the interconnector from the first metal portion prior to the step of immersing.
11. A light emitting diode (LED) structure comprising:
an LED comprising at least a first semiconductor layer, the first semiconductor layer connected to a first electrode of the LED; and
a submount having a first metal portion electrically connected to the first electrode of the LED for providing an energization current to the LED, the submount having a second metal portion running along and proximate to the first metal portion but not electrically connected to the first metal portion,
the second metal portion being electrically isolated from the LED, the second metal portion being configured for biasing the first semiconductor layer during an electrochemical (EC) etch of the first semiconductor layer, whereby a solution for the EC etch electrically connects the second metal portion to the first metal portion for coupling a bias voltage to the first metal portion.
12. The structure of claim 11 wherein the second metal portion is interdigitated with the first metal portion.
13. The structure of claim 11 wherein the second metal portion is separated from the first metal portion by a gap between about 10 microns to 300 microns.
14. The structure of claim 11 wherein the submount has been singulated from a submount wafer, wherein the singulation electrically isolated the second metal portion from other portions of the wafer.
15. The structure of claim 11 wherein the first semiconductor layer is an N-type layer that has been subjected to the EC etch.