IP Library Granted Patent US 9,034,468
Granted Patent B2
US 9,034,468 · App. 13/884,603 · Granted May 19, 2015

Diamond-like carbon

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Quick Facts
Patent No.
US 9,034,468
App. No.
13/884,603
Granted
May 19, 2015
Kind
B2
Abstract

Embodiments presented herein relate generally to the formation of diamond-like carbon, forms of diamond-like carbon and/or carbon dioxide fixation.

Claims (38)

1. A method of producing diamond-like carbon, the method comprising:

providing a volume of gas comprising carbon dioxide; and

performing a non-thermal plasma process on the carbon dioxide to produce diamond-like carbon, wherein the plasma process is performed with an input voltage of 10-200V, a frequency of 50-1000 Hz, and at a temperature of 17-50° C.

2. The method of claim 1 , wherein the volume of gas comprises a polluted volume of gas.

3. The method of claim 2 , wherein the polluted volume of gas is obtained from an exhaust.

4. The method of claim 2 , wherein the polluted volume of gas is an exhaust from burning a fossil fuel.

5. The method of claim 1 , wherein the carbon dioxide within the volume of gas is an undesired pollutant within the volume of gas.

6. The method of claim 1 , wherein the carbon dioxide was not added to the volume of gas from a source of pure carbon dioxide.

7. The method of claim 1 , wherein the non-thermal plasma process does not involve physical vapor deposition, chemical vapor deposition, or electrochemical liquid deposition.

8. The method of claim 1 , wherein the diamond-like carbon is produced on a metal electrode.

9. The method of claim 8 , wherein the metal electrode comprises at least one of silicon, metal alloy, and diamond.

10. A method for fixation of carbon from carbon dioxide gas, the method comprising:

providing a volume of gas comprising carbon dioxide; and

performing a non-thermal plasma process to deposit at least some of the carbon dioxide on an electrode, thereby fixing carbon dioxide.

11. The method of claim 10 , wherein the non-thermal plasma process occurs at atmospheric pressure.

12. The method of claim 10 , wherein the non-thermal plasma process is performed at a temperature of 17 degrees Centigrade to 50 degrees Centigrade.

13. The method of claim 10 , wherein the volume of gas consists essentially of carbon dioxide.

14. The method of claim 10 , wherein the non-thermal plasma process occurs at a temperature of equal to or less than 150 degrees Centigrade.

15. The method of claim 10 , wherein the non-thermal plasma process occurs at a pressure of equal to or higher than 100 Torr.

16. A method for reducing carbon dioxide from a volume of polluted gas, the method comprising:

providing a volume of polluted gas that comprises carbon dioxide;

providing at least one conductive structure; and

removing at least part of the carbon dioxide by depositing the carbon dioxide as diamond-like carbon on the conductive structure, thereby reducing carbon dioxide from the volume of polluted gas.

17. The method of claim 16 , wherein the diamond-like carbon is produced on the conductive structure.

18. The method of claim 16 , wherein the conductive structure has a shape of at least one of mesh, foil, or wire.

19. A diamond-like carbon (DLC) composition comprising:

diamond-like carbon powder and at least one non-thermal plasma processed pollutant.

20. A diamond-like carbon (DLC) coated electrode, the electrode comprising:

at least one conductive electrode;

a diamond-like carbon material deposited on the at least one electrode; and

at least one pollutant deposited on the at least one electrode.

21. The method of claim 20 , wherein the electrode comprises at least one of silicon, metal alloy, and diamond.

22. The composition of claim 20 , wherein the pollutant is at least one of a compound comprising a carbonyl group, a SOx or a NOx.

23. An exhaust system comprising:

an inlet for an exhaust gas;

an outlet for the exhaust gas;

at least one chamber fluidly connected to the inlet and the outlet, wherein the chamber is configured for generating a non-thermal plasma; and

at least one electrode within the chamber by which the non-thermal plasma can be generated.

Assignments (3)
RELEASE OF SECURITY INTEREST Recorded Jul 31, 2019
From: CRESTLINE DIRECT FINANCE, L.P.
To: EMPIRE TECHNOLOGY DEVELOPMENT LLC
Reel/Frame 049924/0794 →
SECURITY INTEREST Recorded Jan 29, 2019
From: EMPIRE TECHNOLOGY DEVELOPMENT LLC
To: CRESTLINE DIRECT FINANCE, L.P.
Reel/Frame 048373/0217 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 14, 2013
From: WANG, YUN-HAI; CHEN, QING-YUN; LI, XIANG-LIN; ZHAO, JING-LIAN
To: XI'AN JIAOTONG UNIVERSITY
Reel/Frame 030412/0203 →