Lasers with beam-shape modification
View Patent ↗A beam control structure for semiconductor lasers that allows modification of the shape of a beam allowing, for example, higher coupling into an optical fiber. The structure may comprise one or more of a tilted patio, a staircase, a reflective roof, and a reflective sidewall.
1. A semiconductor chip, comprising:
a substrate having a surface; and
an epitaxial laser on the surface of said substrate, said epitaxial laser having an etched facet;
wherein said substrate extends outwardly from said etched facet to form a patio comprising an exposed reflective surface and a plurality of steps formed therein, wherein each subsequent step outwardly from said etched facet extends further into said substrate in a direction substantially normal to the surface of said substrate such that light emitted from said laser is reflected off the exposed reflective surface of at least one of the plurality of steps to modify a vertical far field of said laser, and wherein each of said the plurality of steps is clear of obstacles that may interfere with said light emitted from said laser.
2. The semiconductor chip of claim 1 , further comprising at least one reflective sidewall extending outwardly from said etched facet, each sidewall having a reflective surface substantially perpendicular to a surface plane of said patio.
3. The semiconductor chip of claim 2 , further comprising a roof disposed opposite from said patio extending outwardly from said etched facet, said roof having a reflective surface opposing the surface of said patio.
4. The semiconductor chip of claim 1 , further comprising a reflective coating deposited on said patio.
5. The semiconductor chip of claim 1 , wherein said substrate is selected from the group comprising InP, GaAs, and GaN.
6. A semiconductor chip, comprising:
a substrate;
an epitaxial laser on said substrate, said epitaxial laser having an etched facet;
a patio extending outwardly from said etched facet, said patio having an exposed reflective surface and a plurality of steps formed therein, each subsequent step outwardly from said etched facet extending further into said substrate; and
a roof extending outwardly from said etched facet, said roof having an exposed reflective surface opposing said reflective surface of said patio;
wherein light emitted from said laser is reflected off the exposed reflective surfaces of said roof and at least one of the plurality of steps to modify a vertical far field of said laser.
7. The semiconductor chip of claim 6 , further comprising at least one reflective sidewall extending outwardly from said etched facet, each sidewall having a reflective surface substantially perpendicular to said reflective surface of said patio.
8. The semiconductor chip of claim 6 , wherein said substrate is selected from the group comprising InP, GaAs, and GaN.
9. A semiconductor chip, comprising:
a substrate;
an epitaxial laser on a surface of said substrate, said epitaxial laser having an etched facet, said etched facet having a surface at an angle other than 90° to said surface of said substrate such that a laser beam generated by said epitaxial laser impinges on said etched facet below a critical angle of said etched facet; and
a structure adjacent said etched facet, said structure having at least two opposing reflective surfaces extending outwardly from said etched facet.
10. The semiconductor chip of claim 9 , wherein said structure further comprises a tilted patio having a reflective surface.
11. The semiconductor chip of claim 10 , wherein said at least two opposing reflective surfaces comprises at least two reflective sidewalls, each sidewall having a reflective surface substantially perpendicular to said reflective surface of said patio.
12. The semiconductor chip of claim 11 , wherein each sidewall is separated from said etched facet with a gap.
13. The semiconductor chip of claim 9 , wherein said structure further comprises a staircase containing a plurality of steps having reflective surfaces, each subsequent step outwardly from said etched facet extending further into said substrate.
14. The semiconductor chip of claim 13 , wherein said at least two opposing reflective surfaces comprises at least two reflective sidewalls, each sidewall having a reflective surface substantially perpendicular to said reflective surfaces of said steps.
15. The semiconductor chip of claim 14 , wherein each sidewall is separated from said etched facet with a gap.
16. The semiconductor chip of claim 9 , wherein said substrate is selected from the group comprising InP, GaAs, and GaN.
17. A hybrid assembly, comprising:
a base with an exposed reflective surface of a patio having a downwards staircase with a plurality of steps, each subsequent step extending further into said base; and
a laser with an active layer and at least one etched facet, wherein said laser is mounted on said base;
wherein said at least one facet is positioned adjacent to said exposed reflective surface such that light emitted from said laser is reflected off the exposed reflective surface of at least one of the plurality of steps to modify a vertical far field of said laser, and wherein each of said the plurality of steps is clear of obstacles that may interfere with said light emitted from said laser.
18. The hybrid assembly of claim 17 , wherein said base is either AlN or Si.
19. The hybrid assembly of claim 17 , further comprising a reflective structure adjacent said etched facet.
20. The hybrid assembly of claim 17 , wherein said laser is formed from a laser structure epitaxially deposited on a substrate selected from the group comprising InP, GaAs, and GaN.
21. The hybrid assembly of claim 17 , wherein said base further includes a stopper against which said laser is positioned on said base.